Patents by Inventor Dennis Herman, Caspar VAN BANNING
Dennis Herman, Caspar VAN BANNING has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11942340Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: GrantFiled: July 6, 2022Date of Patent: March 26, 2024Assignee: ASML Netherlands B.V.Inventors: Jeroen Gerard Gosen, Te-Yu Chen, Dennis Herman Caspar Van Banning, Edwin Cornelis Kadijk, Martijn Petrus Christianus Van Heumen, Erheng Wang, Johannes Andreas Henricus Maria Jacobs
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Patent number: 11764027Abstract: Systems and methods for cooling an objective lens of a charged-particle beam system are disclosed. According to certain embodiments, the method for cooling an objective lens of a charged-particle beam system comprises receiving a fluid via a fluid input port of a bobbin, circulating the fluid that absorbs heat generated by a plurality of electromagnetic coils of the objective lens, via a plurality of channels distributed in the bobbin, and dispensing the fluid circulated by the plurality of channels via a fluid output port of the bobbin. The bobbin may further comprise a bottom flange proximal to a wafer and a top flange distal from the wafer. The bobbin having the plurality of channels may comprise an additively manufactured monolithic structure.Type: GrantFiled: November 27, 2019Date of Patent: September 19, 2023Assignee: ASML Netherlands B.V.Inventors: Jeroen Gerard Gosen, Sven Antoin Johan Hol, Martijn Petrus Christianus Van Heumen, Dennis Herman Caspar Van Banning, Naseh Hosseini
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Publication number: 20230205101Abstract: An apparatus for use in a metrology process or a lithographic process, the apparatus including: an object support module adapted to hold an object; and a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a first gas direction which is a horizontal direction to cause a net gas flow in the apparatus to be a substantially horizontal gas flow in the first gas direction at least above the object support module.Type: ApplicationFiled: May 27, 2021Publication date: June 29, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Luuc KEULEN, Jeroen Gerard GOSEN, Dennis Herman Caspar VAN BANNING, Sampann ARORA, MichaƩl Johannes Christiaan RONDE, Lucas KUINDERSMA, Youssef Karel Maria DE VOS, Henricus Martinus Johannes VAN DE GROES, Allard Eelco KOOIKER, Wouter Onno PRIL, Johan VAN GEND
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Publication number: 20220415678Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: ApplicationFiled: July 6, 2022Publication date: December 29, 2022Inventors: Jeroen Gerard GOSEN, Te-Yu CHEN, Dennis Herman, Caspar VAN BANNING, Edwin Cornelis KADIJK, Martijn Petrus, Christianus VAN HEUMEN, Erheng WANG, Johannes Andreas, Henricus, Maria JACOBS
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Patent number: 11430678Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: GrantFiled: July 17, 2019Date of Patent: August 30, 2022Assignee: ASML Netherlands B.V.Inventors: Jeroen Gerard Gosen, Te-Yu Chen, Dennis Herman Caspar Van Banning, Edwin Cornelis Kadijk, Martijn Petrus Christianus Van Heumen, Erheng Wang, Johannes Andreas Henricus Maria Jacobs
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Patent number: 11385556Abstract: An apparatus having: a vacuum chamber for enclosing an article support, the article support configured to support an article such that a volume is defined between the article support and the article, the article support including a plurality of supporting protrusions configured to provide a plane of support for the article; a conduit for providing a fluid to the volume such that the fluid provides heat transfer between the article and the article support; and a controller for controlling the fluid supply to the volume, wherein the controller is configured to control a fluid supply unit to start removing the fluid substantially at a time the article reaches a stable temperature.Type: GrantFiled: May 22, 2019Date of Patent: July 12, 2022Assignee: ASML Netherlands B.V.Inventors: Dennis Herman Caspar Van Banning, Jeroen Gerard Gosen
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Patent number: 11158484Abstract: An e-beam inspection tool is disclosed, the tool comprising, an electron optics system configured to generate an electron beam, an object table configured to hold a specimen, a positioning device configured to position the object table, the positioning device comprising an actuator, wherein the positioning device further comprises a heating device configured to generate a heat load and a heat load controller to control the generated heat load at least partly based on an actuator heat load generated in the actuator.Type: GrantFiled: February 28, 2020Date of Patent: October 26, 2021Assignee: ASML Netherlands B.V.Inventors: Dennis Herman Caspar Van Banning, Jeroen Gerard Gosen, Maarten Lambertus Henricus Ter Heerdt, Edwin Cornelis Kadijk
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Publication number: 20210272829Abstract: A stage apparatus including: an object table configured to hold an object; a positioning device configured to position the object table and the object held by the object table; and a remote temperature sensor configured to measure a temperature of the object table and/or the object, wherein the remote temperature sensor comprises a passive temperature sensing element.Type: ApplicationFiled: June 27, 2019Publication date: September 2, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Patriek Adrianus Alphonsus Maria BRUURS, Dennis Herman Caspar VAN BANNING, Jan-Gerard Cornelis VAN DER TOORN, Edwin Cornelis KADIJK
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Publication number: 20210132513Abstract: An apparatus having: a vacuum chamber for enclosing an article support, the article support configured to support an article such that a volume is defined between the article support and the article, the article support including a plurality of supporting protrusions configured to provide a plane of support for the article; a conduit for providing a fluid to the volume such that the fluid provides heat transfer between the article and the article support; and a controller for controlling the fluid supply to the volume, wherein the controller is configured to control a fluid supply unit to start removing the fluid substantially at a time the article reaches a stable temperature.Type: ApplicationFiled: May 22, 2019Publication date: May 6, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Dennis Herman Caspar VAN BANNING, Jeroen Gerard GOSEN
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Publication number: 20200203117Abstract: An e-beam inspection tool is disclosed, the tool comprising, an electron optics system configured to generate an electron beam, an object table configured to hold a specimen, a positioning device configured to position the object table, the positioning device comprising an actuator, wherein the positioning device further comprises a heating device configured to generate a heat load and a heat load controller to control the generated heat load at least partly based on an actuator heat load generated in the actuator.Type: ApplicationFiled: February 28, 2020Publication date: June 25, 2020Inventors: Dennis Herman Caspar VAN BANNING, Jeroen Gerard GOSEN, Maarten Lambertus Henricus TER HEERDT, Edwin Cornelis KADIJK
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Publication number: 20200176215Abstract: Systems and methods for cooling an objective lens of a charged-particle beam system are disclosed. According to certain embodiments, the method for cooling an objective lens of a charged-particle beam system comprises receiving a fluid via a fluid input port of a bobbin, circulating the fluid that absorbs heat generated by a plurality of electromagnetic coils of the objective lens, via a plurality of channels distributed in the bobbin, and dispensing the fluid circulated by the plurality of channels via a fluid output port of the bobbin. The bobbin may further comprise a bottom flange proximal to a wafer and a top flange distal from the wafer. The bobbin having the plurality of channels may comprise an additively manufactured monolithic structure.Type: ApplicationFiled: November 27, 2019Publication date: June 4, 2020Inventors: Jeroen Gosen, Sven Antoin Johan Hol, Martijn Petrus Christianus Van Heumen, Dennis Herman Caspar Van Banning, Naseh Hosseini
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Publication number: 20200027763Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: ApplicationFiled: July 17, 2019Publication date: January 23, 2020Inventors: Jeroen Gerard GOSEN, Te-Yu CHEN, Dennis Herman, Caspar VAN BANNING, Edwin Cornelis KADIJK, Martijn Petrus, Christianus VAN HEUMEN, Erheng WANG, Johannes Andreas, Henricus, Maria JACOBS