Patents by Inventor Dennis R. Hollars
Dennis R. Hollars has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20100276282Abstract: A method of manufacturing improved thin-film solar cells entirely by sputtering includes a high efficiency back contact/reflecting multi-layer containing at least one barrier layer consisting of a transition metal nitride. A copper indium gallium diselenide (Cu(InXGa1-X)Se2) absorber layer (X ranging from 1 to approximately 0.7) is co-sputtered from specially prepared electrically conductive targets using dual cylindrical rotary magnetron technology. The band gap of the absorber layer can be graded by varying the gallium content, and by replacing the gallium partially or totally with aluminum. Alternately the absorber layer is reactively sputtered from metal alloy targets in the presence of hydrogen selenide gas. RF sputtering is used to deposit a non-cadmium containing window layer of ZnS. The top transparent electrode is reactively sputtered aluminum doped ZnO. A unique modular vacuum roll-to-roll sputtering machine is described.Type: ApplicationFiled: July 13, 2010Publication date: November 4, 2010Applicant: MiaSoleInventor: Dennis R. Hollars
-
Publication number: 20090145746Abstract: A method of manufacturing improved thin-film solar cells entirely by sputtering includes a high efficiency back contact/reflecting multi-layer containing at least one barrier layer consisting of a transition metal nitride. A copper indium gallium diselenide (Cu(InxGa1-x)Se2) absorber layer (X ranging from 1 to approximately 0.7) is co-sputtered from specially prepared electrically conductive targets using dual cylindrical rotary magnetron technology. The band gap of the absorber layer can be graded by varying the gallium content, and by replacing the gallium partially or totally with aluminum. Alternately the absorber layer is reactively sputtered from metal alloy targets in the presence of hydrogen selenide gas. RF sputtering is used to deposit a non-cadmium containing window layer of ZnS. The top transparent electrode is reactively sputtered aluminum doped ZnO. A unique modular vacuum roll-to-roll sputtering machine is described.Type: ApplicationFiled: January 16, 2009Publication date: June 11, 2009Inventor: Dennis R. Hollars
-
Patent number: 7544884Abstract: A method of manufacturing improved thin-film solar cells entirely by sputtering includes a high efficiency back contact/reflecting multi-layer containing at least one barrier layer consisting of a transition metal nitride. A copper indium gallium diselenide (Cu(InxGa1-x)Se2) absorber layer (X ranging from 1 to approximately 0.7) is co-sputtered from specially prepared electrically conductive targets using dual cylindrical rotary magnetron technology. The band gap of the absorber layer can be graded by varying the gallium content, and by replacing the gallium partially or totally with aluminum. Alternately the absorber layer is reactively sputtered from metal alloy targets in the presence of hydrogen selenide gas. RF sputtering is used to deposit a non-cadmium containing window layer of ZnS. The top transparent electrode is reactively sputtered aluminum doped ZnO. A unique modular vacuum roll-to-roll sputtering machine is described.Type: GrantFiled: October 25, 2004Date of Patent: June 9, 2009Assignee: MiasoleInventor: Dennis R. Hollars
-
Patent number: 6974976Abstract: A method of manufacturing improved thin-film solar cells entirely by sputtering includes a high efficiency back contact/reflecting multi-layer containing at least one barrier layer consisting of a transition metal nitride. A copper indium gallium diselenide (Cu(InXGa1?X)Se2) absorber layer (X ranging from 1 to approximately 0.7) is co-sputtered from specially prepared electrically conductive targets using dual cylindrical rotary magnetron technology. The band gap of the absorber layer can be graded by varying the gallium content, and by replacing the gallium partially or totally with aluminum. Alternately the absorber layer is reactively sputtered from metal alloy targets in the presence of hydrogen selenide gas. RF sputtering is used to deposit a non-cadmium containing window layer of ZnS. The top transparent electrode is reactively sputtered aluminum doped ZnO. A unique modular vacuum roll-to-roll sputtering machine is described.Type: GrantFiled: September 24, 2003Date of Patent: December 13, 2005Assignee: MiasoleInventor: Dennis R. Hollars
-
Publication number: 20040067014Abstract: An optical wavelength division multiplexer and de-multiplexer device, and a method of aligning components thereof. The device includes a base plate and a series of free-space optical components including collimators, narrow band filters, and reflective mirrors mounted to the base plate. The free-space light beam is reflected off of each narrow band filter in a serial manner, whereby narrow bands of light matching the filter are focused into output optical fibers. Each component may be individually adjusted and fixed to the base plate by computer-controlled robotics, a pair of rotating servo tables, a light detector and a wavelength detector, to achieve accurate optical alignment and provide compensation among the components. Special mounting components including convex pedestals, ring support structures, concave mounting plates, and mounting blocks with through-holes are used to fix the position and angle of the various optical components.Type: ApplicationFiled: October 4, 2002Publication date: April 8, 2004Inventors: Dennis R. Hollars, Paul T. Alexander, Kenneth Nelson, Randy Dorn
-
Publication number: 20040063320Abstract: A method of manufacturing improved thin-film solar cells entirely by sputtering includes a high efficiency back contact/reflecting multi-layer containing at least one barrier layer consisting of a transition metal nitride. A copper indium gallium diselenide (Cu(InXGa1-X) )Se2) absorber layer (X ranging from 1 to approximately 0.7) is co-sputtered from specially prepared electrically conductive targets using dual cylindrical rotary magnetron technology. The band gap of the absorber layer can be graded by varying the gallium content, and by replacing the gallium partially or totally with aluminum. Alternately the absorber layer is reactively sputtered from metal alloy targets in the presence of hydrogen selenide gas. RF sputtering is used to deposit a non-cadmium containing window layer of ZnS. The top transparent electrode is reactively sputtered aluminum doped ZnO. A unique modular vacuum roll-to-roll sputtering machine is described.Type: ApplicationFiled: September 24, 2003Publication date: April 1, 2004Inventor: Dennis R. Hollars
-
Publication number: 20030206688Abstract: An optical wavelength division multiplexer and de-multiplexer, for single or multi-mode fiber optic communications, includes a base plate that serves as a miniature optical bench, and a series of free-space optical components including collimators, narrow band filters, and highly efficient reflective mirrors mounted to the base plate. The free-space light beam is reflected off of each narrow band filter in a serial manner, whereby narrow bands of light matching the filter are focused into output optical fibers. Each component may be individually adjusted by computer-controlled robotics to achieve accurate optical alignment and provide compensation among the components. The angle of incidence of the light signals at the filters is kept below 10 degrees for DWDM applications, and below about 14 degrees for CWDM applications to minimize polarization dispersion loss. A simplified sealing system provides robust protection from environmental hazards, while further reducing costs and improving manufacturing yields.Type: ApplicationFiled: May 3, 2002Publication date: November 6, 2003Inventors: Dennis R. Hollars, Paul T. Alexander, Rodrick G. Cross, Randy Dorn, Kenneth Nelson, Robert B. Zubeck
-
Patent number: 6488824Abstract: A sputtering apparatus and method for high rate deposition of electrically insulating and semiconducting coatings with substantially uniform stoichiometry. At least one set of vertically mounted, dual and triple rotatable cylindrical (or planar) magnetrons with associated vacuum pumps, form semi-isolated sputtering modules. The sputtering modules can be independently controlled for the sequential deposition of layers of similar or different materials. Constant voltage operation of AC power with an optional reactive gas flow feedback loop maintains constant coating stoichiometry during small changes in pumping speed caused by substrate motion. The coating method is extremely stable over long periods (days) of operation, with the film stoichiometry being selectable by the voltage control point.Type: GrantFiled: July 14, 2000Date of Patent: December 3, 2002Assignee: Raycom Technologies, Inc.Inventors: Dennis R. Hollars, Martin P. Rosenblum, Carl T. Petersen
-
Patent number: 6365010Abstract: A sputtering apparatus and method for high rate deposition of electrically insulating and semiconducting coatings with substantially uniform stoichiometry. Vertically mounted, dual rotatable cylindrical magnetrons with associated vacuum pumps form semi-isolated sputtering modules, which can be independently controlled for the sequential deposition of layers of similar or different materials. Constant voltage operation of AC power with an optional reactive gas flow feedback loop maintains constant coating stoichiometry during small changes in pumping speed caused by substrate motion. The coating method is extremely stable over long periods (days) of operation, with the film stoichiometry being selectable by the voltage control point. The apparatus may take the form of a circular arrangement of modules for batch coating of wafer-like substrates, or the modules may be arranged linearly for the coating of large planar substrates.Type: GrantFiled: September 16, 1999Date of Patent: April 2, 2002Assignee: ScivacInventor: Dennis R. Hollars
-
Patent number: 6231732Abstract: A cylindrical carriage sputtering system for disk, wafer, and flat panel substrates (20) comprising a cylindrical shaped vacuum sealed passageway formed by two concentric inner (11) and outer hollow cylinders (12), along with a top and a bottom sealing flange (13, 14). A central hollow cylinder (15), disposed between the inner (11) and outer cylinder (12), includes substrate-carrying openings and serves as a cylindrical carriage which substantially fills the sealed passageway and is rotatable in predetermined steps. Novel substrate processing devices (16) for deposition, heating, and cooling are attached around the circumference of the inner and outer cylindrical walls. Vacuum pumps are located between substrate processing devices (16). The openings in the cylindrical carriage are each fitted with thermally isolated substrate holders (19) for supporting a multiplicity of substrates (20).Type: GrantFiled: September 2, 1999Date of Patent: May 15, 2001Assignee: SciVacInventors: Dennis R. Hollars, Robert B. Zubeck
-
Patent number: 6156171Abstract: An apparatus in accordance with the present invention provides a single or multi-layer coating to the surface of a plurality of substrates. The apparatus may include a plurality of buffer and sputtering chambers, and an input end and an output end, wherein said substrates are transported through said chambers of said apparatus at varying rates of speed such that the rate of speed of a pallet from said input end to said output end is a constant for each of said plurality of pallets.Type: GrantFiled: April 9, 1993Date of Patent: December 5, 2000Assignee: Seagate Technology, Inc.Inventors: Dennis R. Hollars, Delbert F. Waltrip, Robert B. Zubeck, Josef Bonigut, Robert M. Smith, Gary L. Payne
-
Patent number: 5995342Abstract: A low-noise toroidal thin film head ("TFH") device has low coil resistance and inductance, especially suitable for very high magnetic recording areal densities and channel frequencies. The length of a toroidal coil turn is only about 20-30% that of the length of an average turn in the conventional planar spiral coil design. This allows either reduction of the device thermal noise (by about 6 dB) and/or increase of the device operational frequency bandwidth (by a factor of 3-5). The toroidal coil coupling efficiency between each turn and the magnetic core is practically 100%, thereby improving the write and read-back efficiencies. In one embodiment a non-via large back-closure contact area is provided between the bottom and top magnetic poles along their entire back-side width, and all other open branches and loose ends in the magnetic circuit are eliminated. The magnetic core has a gradual, smooth toroidal (or a horse-shoe) shape with no loose ends, nooks, crevices, or sharp corners.Type: GrantFiled: June 24, 1997Date of Patent: November 30, 1999Assignee: Torohead, Inc.Inventors: Uri Cohen, Dennis R. Hollars
-
Patent number: 5972184Abstract: A high throughput sputtering apparatus which provides a single or multi-layer coating to the surface of a plurality of substrates. The apparatus comprises a plurality of buffer and sputtering chambers which include an input end and an output end. The substrates are transported through the chambers at varying rates of speed such that the rate of speed of a pallet from the input end to the output end is a constant for each of the pallets.Type: GrantFiled: April 9, 1993Date of Patent: October 26, 1999Assignee: Seagate Technology, Inc.Inventors: Dennis R. Hollars, Delbert F. Waltrip, Robert B. Zubeck, Josef Bonigut, Robert M. Smith, Gary L. Payne
-
Patent number: 5830331Abstract: A hydrogenated carbon film for magnetic thin film recording media is manufactured by alternating current magnetron sputtering in an atmosphere containing argon and a hydrocarbon gas. Targets mounted side-by-side cyclically sputter and discharge charge buildup according to an alternating current. Shielding between the targets directs electrons toward the anode at a given time.Type: GrantFiled: September 23, 1994Date of Patent: November 3, 1998Assignee: Seagate Technology, Inc.Inventors: Taesun E. Kim, Hyung J. Lee, Yao-Tzung R. Shih, John C. Bruno, Robert B. Zubeck, Dennis R. Hollars
-
Patent number: 5814196Abstract: An apparatus in accordance with the present invention provides a single or multi-layer coating to the surface of a plurality of substrates. The apparatus may include a plurality of buffer and sputtering chambers, and an input end and an output end, wherein said substrates are transported through said chambers of said apparatus at varying rates of speed such that the rate of speed of a pallet from said input end to said output end is a constant for each of said plurality of pallets.Type: GrantFiled: April 8, 1993Date of Patent: September 29, 1998Assignee: Conner Peripherals, Inc.Inventors: Dennis R. Hollars, Delbert F. Waltrip, Robert B. Zubeck, Josef Bonigut, Robert M. Smith, Gary L. Payne
-
Patent number: 5753092Abstract: A sputtering system comprising three concentric cylinders. The inner and outer cylinders, along with top and bottom sealing flanges, form an annular chamber with cylindrical walls. A central cylinder, disposed between the inner and outer cylinders, includes substrate-carrying openings and serves as a cylindrical carriage which substantially fills the annular chamber passageway and is rotatable in predetermined steps relative to the chamber. Substrate processing devices for deposition, etching, heating, and cooling arc attached around the circumference of the inner and/or outer cylinders. Vacuum pumps are located between substrate processing devices. The openings in the cylindrical carriage are each fitted with a substrate holder for supporting a multiplicity of substrates. Entrance and exit vacuum load-locks are provided for transferring substrates into and out of the system. The system is designed for substrate processing temperatures of 1000.degree. C. and above.Type: GrantFiled: August 26, 1996Date of Patent: May 19, 1998Assignee: Velocidata, Inc.Inventors: Dennis R. Hollars, Robert B. Zubeck
-
Patent number: 5703740Abstract: A low-noise toroidal thin film head ("TFH") device has low coil resistance and inductance, especially suitable for very high magnetic recording areal densities and channel frequencies. The length of a toroidal coil turn is only about 20-30% that of the length of an average turn in the conventional planar spiral coil design. This allows either reduction of the device thermal noise (by about 6 dB) and/or increase of the device operational frequency bandwidth (by a factor of 3-5). The toroidal coil coupling efficiency between each turn and the magnetic core is practically 100%, thereby improving the write and read-back efficiencies. In one embodiment a non-via large back-closure contact area is provided between the bottom and top magnetic poles along their entire back-side width, and all other open branches and loose ends in the magnetic circuit are eliminated. The magnetic core has a gradual, smooth toroidal (or a horse-shoe) shape with no loose ends, nooks, crevices, or sharp corners.Type: GrantFiled: October 7, 1996Date of Patent: December 30, 1997Assignee: Velocidata, Inc.Inventors: Uri Cohen, Dennis R. Hollars
-
Patent number: 5683561Abstract: An apparatus in accordance with the present invention provides a single or multi-layer coating to the surface of a plurality of substrates. The apparatus may include a plurality of buffer and sputtering chambers, and an input end and an output end, wherein said substrates are transported through said chambers of said apparatus at varying rates of speed such that the rate of speed of a pallet from said input end to said output end is a constant for each of said plurality of pallets.Type: GrantFiled: November 2, 1995Date of Patent: November 4, 1997Assignee: Conner Peripherals, Inc.Inventors: Dennis R. Hollars, Delbert F. Waltrip, Robert B. Zubeck, Josef Bonigut, Robert M. Smith, Gary L. Payne, Kenneth Lee, David B. Pearce
-
Patent number: 5473431Abstract: A device for accurately measuring flying heights of a read/write head in a disk drive down to zero microinches using interferometry, wherein the flying height of the head above the disk surface is calculated by directing white light to the under side of a rotating disk. An interference pattern is obtained by reflecting a first portion of the light off of the top surface of the disk and reflecting a second portion of the light off of the underside of the read/write head, and then recombining the first and second portions of light. The interference pattern is then input to a spectrophotometer, which creates an intensity profile from which the flying height of the read/write head above the disk may be calculated. A spacer layer is provided on the upper surface of the disk to increase the phase difference of the first and second portions of light, thereby allowing clear interpretation of the interference pattern at extremely low flying heights.Type: GrantFiled: April 29, 1993Date of Patent: December 5, 1995Assignee: Conner Peripherals, Inc.Inventors: Dennis R. Hollars, David P. Danson
-
Patent number: 4421622Abstract: A degradable substrate surface (e.g. a glass sheet covered by a pure metal film) is overcoated with an oxide film deposited by high rate reactive sputtering in the presence of hydrogen to avoid degradation of the substrate. The addition of hydrogen to the sputtering chamber atmosphere substantially eliminates degradation of pure metal films, etc. which would otherwise be damaged during the reactive sputtering of an oxide overcoat. The method is disclosed for producing low emissivity symmetrical three layer coatings formed on a substrate by high rate sputtering with the intermediate layer formed by a conductive silver film and the adjacent layers formed from stoichiometric tin oxide films.Type: GrantFiled: September 20, 1982Date of Patent: December 20, 1983Assignee: Advanced Coating Technology, Inc.Inventor: Dennis R. Hollars