Patents by Inventor Dennis R. McKean
Dennis R. McKean has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8220136Abstract: A method for forming a planarized surface for at least one bar of sliders for utilization in a hard disk drive is disclosed. In general, at least one bar of sliders is placed on an adhesive layer. A single thermoplastic layer is then provided above the at least one bar of sliders. The single thermoplastic layer is then heated to a softening temperature such that the single thermoplastic layer will flow between the at least one bar of sliders. The single thermoplastic layer is then cooled to form a planarized surface of both said single thermoplastic layer and said at least one bar of sliders at said adhesive layer.Type: GrantFiled: May 3, 2007Date of Patent: July 17, 2012Assignee: Hitachi Global Storage Technologies Netherlands B. V.Inventors: Cherngye Hwang, Jorge Goitia, Kenneth L. Larson, Dennis R. McKean
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Patent number: 7851138Abstract: Patterning a surface, comprising at least one feature having silicon coupled to a substrate, is described herein. In one embodiment a method is described for patterning a surface which comprises at least one feature having silicon and at least one feature having carbon coupled to a substrate. The surface is coated with 3-(trimethoxysilyl)propyl methacrylate, and a photoresist is applied the 3-(trimethoxysilyl)propyl methacrylate coated surface. The photoresist is imaged and the surface is etched. The photoresist is then removed.Type: GrantFiled: July 19, 2007Date of Patent: December 14, 2010Assignee: Hitachi Global Storage Technologies, Netherlands, B.V.Inventors: Cherngye Hwang, Dennis R. McKean, Gary J. Suzuki
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SYSTEM AND METHOD FOR PATTERNING A MASTER DISK FOR NANOIMPRINTING PATTERNED MAGNETIC RECORDING DISKS
Publication number: 20100147797Abstract: A system and method for patterning a master disk or “stamper” to be used for nanoimprinting magnetic recording disks uses an air-bearing slider that supports an aperture structure within the optical near-field of a resist layer on a rotating master disk substrate. Laser pulses directed to the input side of the aperture are output to the resist layer. The aperture structure includes a metal film reflective to the laser radiation with the aperture formed in it. The aperture has a size less than the wavelength of the incident laser radiation and is maintained by the air-bearing slider near the resist layer to within the radiation wavelength. The timing of the laser pulses is controlled to form a pattern of exposed regions in the resist layer, with this pattern ultimately resulting in the desired pattern of data islands and nondata islands in the magnetic recording disks when they are nanoimprinted by the master disk.Type: ApplicationFiled: February 24, 2010Publication date: June 17, 2010Applicant: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.Inventors: Thomas R. Albrecht, Dennis R. McKean, Gurinder Pal Singh, Henry Hung Yang -
Publication number: 20090023100Abstract: Patterning a surface, comprising at least one feature having silicon coupled to a substrate, is described herein. In one embodiment a method is described for patterning a surface which comprises at least one feature having silicon and at least one feature having carbon coupled to a substrate. The surface is coated with 3-(trimethoxysilyl)propyl methacrylate, and a photoresist is applied the 3-(trimethoxysilyl)propyl methacrylate coated surface. The photoresist is imaged and the surface is etched. The photoresist is then removed.Type: ApplicationFiled: July 19, 2007Publication date: January 22, 2009Inventors: Cherngye Hwang, Dennis R. McKean, Gary J. Suzuki
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Publication number: 20080273270Abstract: A method for forming a planarized surface for at least one bar of sliders for utilization in a hard disk drive is disclosed. In general, at least one bar of sliders is placed on an adhesive layer. A single thermoplastic layer is then provided above the at least one bar of sliders. The single thermoplastic layer is then heated to a softening temperature such that the single thermoplastic layer will flow between the at least one bar of sliders. The single thermoplastic layer is then cooled to form a planarized surface of both said single thermoplastic layer and said at least one bar of sliders at said adhesive layer.Type: ApplicationFiled: May 3, 2007Publication date: November 6, 2008Inventors: Cherngye Hwang, Jorge Goitia, Kenneth L. Larson, Dennis R. McKean
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Patent number: 7396636Abstract: A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature.Type: GrantFiled: August 27, 2004Date of Patent: July 8, 2008Assignee: Hitachi Global Storage Technologies Netherlands, B.V.Inventors: Cherngye Hwang, Kim Y. Lee, Dennis R. McKean, Gary Suzuki
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Patent number: 7209324Abstract: The invention relates generally to the bonding of one or more sliders in styrene and butadiene polymers. More particularly, the invention relates to planarized slider assemblies formed by using debondable solid encapsulants comprised of styrene and butadiene polymers. The invention also relates to methods that use such encapsulants in conjunction with resists to produce magnetic head sliders having patterned air-bearing surfaces.Type: GrantFiled: June 30, 2003Date of Patent: April 24, 2007Assignee: Hitachi Global Storage Netherlands, B.V.Inventors: Phillip J. Brock, Michael W. Chaw, Dan J. Dawson, Craig J. Hawker, James L. Hedrick, Teddie P. Magbitang, Dennis R. McKean, Robert D. Miller, Richard I. Palmisano, Willi Volksen
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Patent number: 7196872Abstract: A slider assembly is provided comprising a plurality of sliders bonded by a debondable solid encapsulant comprised of different first and second polymers The solid encapsulant is comprised of a polymer prepared by polymerizing an encapsulant fluid comprising a homogeneous mixture of first and second constituents. The first constituent is comprised of a first monomer suitable for in situ polymerization to form the first polymer. The second constituent is comprised of the second polymer or a second monomer suitable for in situ polymerization to form the second polymer. The first constituent does not substantially react with the second constituent. Each slider has a surface that is free from the encapsulant. The encapsulant-free surfaces are coplanar to each other. Also provided are methods for forming the assembly and methods for patterning a slider surface using the encapsulant.Type: GrantFiled: April 29, 2004Date of Patent: March 27, 2007Assignee: Hitachi Global Storage Netherlands, B.V.Inventors: Michael W. Chaw, Dan J. Dawson, Craig J. Hawker, James L. Hedrick, Wesley L. Hillman, Teddie P. Magbitang, Dennis R. McKean, Robert D. Miller, Willi Volksen
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Patent number: 7125467Abstract: A process for fabricating sliders where the sliders are held in place during processing by a solid matrix material is described. A thin coating of a release-layer material is applied on the sliders before encapsulation in the matrix material. The release-layer material is polyvinyl alcohol and more preferably high molecular weight polyvinyl alcohol which is highly hydrolyzed. Use of the release-layer of the invention maintains the process resistance while providing the advantage of allowing easier removal of the matrix material after it is no longer needed. The release-layer can be applied to encapsulant materials including epoxies, acrylates, polyimides, silsesquioxanes and others. After the selected fabrication process such as the formation of air-bearing features an appropriate solvent is applied to soften the polyvinyl alcohol film and allow clean debonding of the sliders.Type: GrantFiled: June 30, 2003Date of Patent: October 24, 2006Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Phillip Joe Brock, Michael William Chaw, Dan J. Dawson, Craig J. Hawker, James L. Hedrick, Wesley L. Hillman, Teddie P. Magbitang, Dennis R. McKean, Robert D. Miller, Richard I. Palmisano, Jila Tabib, Mark C. Thurber, Willi Volksen
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Patent number: 7064929Abstract: The invention relates generally to the bonding of one or more sliders in styrene and acrylate polymers. More particularly, the invention relates to planarized slider assemblies formed by using debondable solid encapsulants comprised of styrene and acrylate polymers. The invention also relates to methods that use such encapsulants in conjunction with resists to produce magnetic head sliders having patterned air-bearing surfaces.Type: GrantFiled: June 30, 2003Date of Patent: June 20, 2006Assignee: Hitachi Global Storage Netherlands B.V.Inventors: Dennis R. McKean, Robert D. Miller, Teddie P. Magbitang, James L. Hedrick, Craig J. Hawker, Willi Volksen, Phillip J. Brock, Dan J. Dawson, Michael W. Chaw, Richard I. Palmisano
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Publication number: 20040265545Abstract: The invention relates generally to the bonding of one or more sliders in styrene and acrylate polymers. More particularly, the invention relates to planarized slider assemblies formed by using debondable solid encapsulants comprised of styrene and acrylate polymers. The invention also relates to methods that use such encapsulants in conjunction with resists to produce magnetic head sliders having patterned air-bearing surfaces.Type: ApplicationFiled: June 30, 2003Publication date: December 30, 2004Inventors: Dennis R. McKean, Robert D. Miller, Teddie P. Magbitang, James L. Hedrick, Craig J. Hawker, Willi Volksen, Phillip J. Brock, Dan J. Dawson, Michael W. Chaw, Richard I. Palmisano
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Publication number: 20040265531Abstract: A slider assembly is provided comprising a plurality of sliders bonded by a debondable solid encapsulant. The solid encapsulant is comprised of a silicon-based polymer. Each slider has a surface that is free from the encapsulant. The encapsulant-free surfaces are coplanar to each other. Also provided are methods for forming the assembly and methods for patterning a slider surface using the encapsulant.Type: ApplicationFiled: June 30, 2003Publication date: December 30, 2004Inventors: Dennis R. McKean, Robert D. Miller, Willi Volksen, James L. Hedrick, Craig J. Hawker, Phillip J. Brock, Dan J. Dawson, Teddie P. Magbitang, Michael W. Chaw, Richard I. Palmisano
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Publication number: 20040264050Abstract: The invention relates generally to the bonding of one or more sliders in styrene and butadiene polymers. More particularly, the invention relates to planarized slider assemblies formed by using debondable solid encapsulants comprised of styrene and butadiene polymers. The invention also relates to methods that use such encapsulants in conjunction with resists to produce magnetic head sliders having patterned air-bearing surfaces.Type: ApplicationFiled: June 30, 2003Publication date: December 30, 2004Inventors: Phillip J. Brock, Michael W. Chaw, Dan J. Dawson, Craig J. Hawker, James L. Hedrick, Teddie P. Magbitang, Dennis R. McKean, Robert D. Miller, Richard I. Palmisano, Willi Volksen
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Publication number: 20040266186Abstract: A process for fabricating sliders where the sliders are held in place during processing by a solid matrix material is described. A thin coating of a release-layer material is applied on the sliders before encapsulation in the matrix material. The release-layer material is polyvinyl alcohol and more preferably high molecular weight polyvinyl alcohol which is highly hydrolyzed. Use of the release-layer of the invention maintains the process resistance while providing the advantage of allowing easier removal of the matrix material after it is no longer needed. The release-layer can be applied to encapsulant materials including epoxies, acrylates, polyimides, silsesquioxanes and others. After the selected fabrication process such as the formation of air-bearing features an appropriate solvent is applied to soften the polyvinyl alcohol film and allow clean debonding of the sliders.Type: ApplicationFiled: June 30, 2003Publication date: December 30, 2004Inventors: Phillip Joe Brock, Michael William Chaw, Dan J. Dawson, Craig J. Hawker, James L. Hedrick, Wesley L. Hillman, Teddie P. Magbitang, Dennis R. McKean Milpitas, Robert D. Miller, Richard I. Palmisano, Julia Tabib, Mark C. Thurber, Willi Volksen
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Patent number: 5932113Abstract: A method for preparing the air bearing surface of a slider for etch patterning including the steps of applying a first thin film to a carrier, applying a second thin film to the carrier, the first thin film and the second thin film separated by a recess, each of the first and second thin films having respective first and second air bearing surfaces, applying an adhesive film over the first and second thin films, depositing a fluid in the recess, the fluid held in the recess by the adhesive film, curing the fluid, and removing the adhesive film. The method of the invention may also include coating the first and second air bearing surfaces with an etch mask, developing the etch mask, and patterning the first and second air bearing surfaces.Type: GrantFiled: September 4, 1997Date of Patent: August 3, 1999Assignee: International Business Machines CorporationInventors: Bulent Nihat Kurdi, Dennis R. McKean, Eric Keith Wong
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Patent number: 5807947Abstract: A polymer of (a) an unsubstituted 4-hydroxystyrene monomer and (b) a substituted 4-hydroxystyrene monomer of the formula ##STR1## wherein A, B, C, and D are independently H or C.sub.1 to C.sub.4 alkyl wherein at least one of B and D is C.sub.1 to C.sub.4 alkyl; and wherein said copolymer has a molecular weight of from about 800 to about 100,000; and wherein the mol ratio of monomer (a) to monomer (b) ranges from about 3:1 to about 1:3.Type: GrantFiled: July 20, 1994Date of Patent: September 15, 1998Assignee: Clariant Finance (BVI) LimitedInventors: Richard Vicari, Douglas J. Gordon, William D. Hinsberg, Dennis R. McKean, Carlton G. Willson, Ralph Dammel
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Patent number: 5580602Abstract: An improved process for making thin film magnetic heads using an insulation comprising a polymer, a crosslinking agent, and 4-sulfonate diazonaphthoquinone.Type: GrantFiled: September 1, 1994Date of Patent: December 3, 1996Assignee: International Business Machines CorporationInventors: Dennis R. McKean, Alfred F. Renaldo
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Patent number: 5545307Abstract: A process for patterned electroplating involves the steps of: (i) coating a substrate with a layer of amninoalkylpyridine which acts as an adhesion promoter; (ii) coating the adhesion layer with a radiation sensitive polymeric resist; (iii) imagewise exposing the film to radiation; (iv) developing the image to patternwise expose the substrate; (v) electroplating metal onto the exposed portions of the substrate; and (vi) removing the remaining polymeric film from the substrate.Type: GrantFiled: April 6, 1995Date of Patent: August 13, 1996Assignee: International Business Machines CorporationInventors: Saad K. Doss, Dennis R. McKean, Alfred F. Renaldo, Robert J. Wilson
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Patent number: 5516418Abstract: A process for patterned electroplating involves the steps of: (i) coating a substrate with a layer of hydroxyquinoline which acts as an adhesion promoter; (ii) coating the adhesion layer with a radiation sensitive polymeric resist; (iii) imagewise exposing the film to radiation; (iv) developing the image to patternwise expose the substrate; (v) electroplating metal onto the exposed portions of the substrate; and (vi) removing the remaining polymeric film from the substrate.Type: GrantFiled: June 26, 1995Date of Patent: May 14, 1996Assignee: International Business Machines CorporationInventors: Saad K. Doss, Dennis R. McKean, Alfred F. Renaldo, Robert J. Wilson
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Patent number: 5342727Abstract: A copolymer of (a) an unsubstituted 4-hydroxystyrene monomer and (b) a substituted 4-hydroxystyrene monomer of the formula ##STR1## wherein A, B, C, and D are independently H or C.sub.1 to C.sub.4 alkyl and wherein at least one of B and D is C.sub.1 to C.sub.4 alkyl; and wherein said copolymer has a molecular weight of from about 800 to about 100,000; and wherein the mol ratio of monomer (a) to monomer (b) ranges from about 3:1 to about 1:3.Type: GrantFiled: December 20, 1991Date of Patent: August 30, 1994Assignees: Hoechst Celanese Corp., IBM Corp.Inventors: Richard Vicari, Douglas J. Gordon, William D. Hinsberg, Dennis R. McKean, Carlton G. Willson, Ralph Dammel