Abstract: A coated granular filtration medium is formed by the deposition of an electrolyte layer onto core particles. The electrolyte layer comprises a cationic polyelectrolyte. The coated granular filtration medium provides a synergistic combination of filtration and in situ coagulation that enables efficient, effective, and economical decontamination of industrial and other wastewaters.

Abstract: A coated granular filtration medium is formed by the deposition of an electrolyte layer onto core particles. The electrolyte layer comprises a cationic polyelectrolyte. The coated granular filtration medium provides a synergistic combination of filtration and in situ coagulation that enables efficient, effective, and economical decontamination of industrial and other wastewaters.

Abstract: A method and device for producing an aligned carbon nanotube array. The arrays of aligned carbon nanotubes (CNTs) may be formed by drying liquid dispersions of CNTs on a nanoporous substrate under an applied electrostatic field. The array may be used in a number of applications including electronics, optics, and filtration, including desalination.

Abstract: A method and device for producing an aligned carbon nanotube array. The arrays of aligned carbon nanotubes (CNTs) may be formed by drying liquid dispersions of CNTs on a nanoporous substrate under an applied electrostatic field. The array may be used in a number of applications including electronics, optics, and filtration, including desalination.

Abstract: A method and device for producing an aligned carbon nanotube array. The arrays of aligned carbon nanotubes (CNTs) may be formed by drying liquid dispersions of CNTs on a nanoporous substrate under an applied electrostatic field. The array may be used in a number of applications including electronics, optics, and filtration, including desalination.

Abstract: A method and device for producing an aligned carbon nanotube array. The arrays of aligned carbon nanotubes (CNTs) may be formed by drying liquid dispersions of CNTs on a nanoporous substrate under an applied electrostatic field. The array may be used in a number of applications including electronics, optics, and filtration, including desalination.

Abstract: A method and device for producing an aligned carbon nanotube array. The arrays of aligned carbon nanotubes (CNTs) may be formed by drying liquid dispersions of CNTs on a nanoporous substrate under an applied electrostatic field. The array may be used in a number of applications including electronics, optics, and filtration, including desalination.

Abstract: A layered construction for application to a device or substrate or placement in an enclosed space for use in decontaminating the underlying surface or enclosed space comprises a cathode, an electrolyte layer, an anode and a protective surface layer. A compound that can be electrically decomposed to release on demand and over an extended period of time, an oxidant is included in the layered structure, preferably in the electrolyte layer. Preferred compounds are those which can release halogen ions which react with various different chemical or biological contaminants which may contact the protective layer, destroying, or devitalizing the contaminants.

Abstract: Size reduction of surface features is accomplished by stretching an elastomeric sheet isotropically, coating it with a curable elastomer precursor, impressing a surface pattern into the precursor coating with a mold, curing the precursor coating to form a patterned elastomeric coating on the substrate elastomeric sheet, removing the pattern mold, and then allowing the substrate elastomeric sheet to relax to its original size. The cured patterned coating is forced to contract isotropically by the relaxing elastomeric sheet, creating a new surface pattern whose features will be reduced in size, while retaining the relief of the features.

Abstract: A method of forming a superhydrophobic material (66) includes mixing a hydrophobic material (24) with soluble particles (26) to form a mixture (32). The mixture (32) is cured. A portion of the soluble particles (26) is etched away from the mixture (32) to form the superhydrophobic material (66). A superhydrophobic material forming system (10) includes a mixer (30) that mixes a hydrophobic binder (24) with soluble particles (26) to form the mixture (32). A curing station (16) cures the mixture (32). An applicator (69) applies a solvent (68) to the mixture (32) to etch away a portion of the soluble particles (26) from the mixture (32) to form the superhydrophobic material (66).

Abstract: A method for providing a superhydrophobic surface on a structure, for example aircraft wings, propellers and/or rotors, is set forth. The method includes applying a coating of hydrofluoric acid over a titanium substrate. A voltage is then applied across the titanium substrate so that current flows through the titanium substrate. The current flowing through the titanium substrate causes the hydrofluoric acid to react with the titanium substrate to anodize the titanium substrate. The anodization causes a nanoporous titanium oxide layer to grow across the titanium substrate. The titanium oxide layer includes a plurality of nano-tube structures that, once the remaining hydrofluoric acid is washed away, provide a microscopically rough surface on the titanium substrate. A conformal coating of a hydrophobic compound is then desposited on the microscopically rough surface to create a superhydrophobic surface.

Abstract: A tool for embossing high aspect ratio microstructures is provided, wherein the microstructures provide decreased surface reflection and increased transmission through an optical component. The tool is fabricated by a process that comprises etching columnar pits in a silicon substrate using inductively coupled plasma, followed by reactive ion etching of the columnar pits to create relatively pointed obelisks. The silicon substrate is then preferably rinsed prior to vapor depositing a conductive layer thereon. Finally, a metal is electroformed over the conductive layer to form the embossing tool. The embossing tool is then pressed against an optical coating, for example a polymer sheet, to create microstructures having aspect ratios greater than 5 to 1.

Abstract: A process for embossing high aspect ratio microstructures is provided, wherein the microstructures provide decreased surface reflection and increased transmission through an optical component. The process comprises etching columnar pits in a silicon substrate using inductively coupled plasma, followed by reactive ion etching of the columnar pits to create relatively pointed obelisks. The silicon substrate is then preferably rinsed prior to vapor depositing a conductive layer thereon. Further, a metal is electroformed over the conductive layer to form an embossing tool. The embossing tool is then used to form microstructures, for example in a polymer sheet, having aspect ratios greater than 5 to 1.