Patents by Inventor Dennis Zlotnik

Dennis Zlotnik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOSTABLE COMPOSITIONS COMPRISING PARA-ALKOXYL PHENYL SUBSTITUTED PROPENOIC ACID (APP) COPOLYMER DERIVATIVES
    Publication number: 20240026056
    Abstract: The present disclosure relates, according to some embodiments, to photostable photoactive compositions comprising (a) at least one photoactive compound that develops within itself an excited state energy when subjected to UV radiation and (b) a block copolymer comprising a plurality of blocks, wherein the block copolymer is operable to quench the excited state energy.
    Type: Application
    Filed: August 9, 2023
    Publication date: January 25, 2024
    Inventors: Hui Feng, Shengkui Hu, Dennis Zlotnik
  • Photostable compositions comprising para-alkoxyl phenyl substituted propenoic acid (APP) copolymer derivatives
    Patent number: 11767392
    Abstract: The present disclosure relates, according to some embodiments, to photostable photoactive compositions comprising (a) at least one photoactive compound that develops within itself an excited state energy when subjected to UV radiation and (b) a block copolymer comprising a plurality of blocks, wherein the block copolymer is operable to quench the excited state energy.
    Type: Grant
    Filed: July 23, 2021
    Date of Patent: September 26, 2023
    Assignee: HALLSTAR BEAUTY AND PERSONAL CARE INNOVATIONS COMPANY
    Inventors: Hui Feng, Shengkui Hu, Dennis Zlotnik
  • Photostable Compositions Comprising Para-Alkoxyl Phenyl Substituted Propenoic Acid (APP) Copolymer Derivatives
    Publication number: 20220017675
    Abstract: The present disclosure relates, according to some embodiments, to photostable photoactive compositions comprising (a) at least one photoactive compound that develops within itself an excited state energy when subjected to UV radiation and (b) a block copolymer comprising a plurality of blocks, wherein the block copolymer is operable to quench the excited state energy.
    Type: Application
    Filed: July 23, 2021
    Publication date: January 20, 2022
    Inventors: Hui Feng, Shengkui Hu, Dennis Zlotnik
  • Photostable compositions comprising para-alkoxyl phenyl substituted propenoic acid (APP) copolymer derivatives
    Patent number: 11098149
    Abstract: The present disclosure relates, according to some embodiments, to photostable photoactive compositions comprising (a) at least one photoactive compound that develops within itself an excited state energy when subjected to UV radiation and (b) a block copolymer comprising a plurality of blocks, wherein the block copolymer is operable to quench the excited state energy.
    Type: Grant
    Filed: February 10, 2020
    Date of Patent: August 24, 2021
    Assignee: Hallstar Beauty and Personal Care Innovations Company
    Inventors: Hui Feng, Shengkui Hu, Dennis Zlotnik
  • PHOTOSTABLE COMPOSITIONS COMPRISING PARA-ALKOXYL PHENYL SUBSTITUTED PROPENOIC ACID (APP) COPOLYMER DERIVATIVES
    Publication number: 20200172650
    Abstract: The present disclosure relates, according to some embodiments, to photostable photoactive compositions comprising (a) at least one photoactive compound that develops within itself an excited state energy when subjected to UV radiation and (b) a block copolymer comprising a plurality of blocks, wherein the block copolymer is operable to quench the excited state energy.
    Type: Application
    Filed: February 10, 2020
    Publication date: June 4, 2020
    Inventors: Hui Feng, Shengkui Hu, Dennis Zlotnik
  • Photostable compositions comprising para-alkoxyl phenyl substituted propenoic acid (APP) copolymer derivatives
    Patent number: 10556981
    Abstract: The present disclosure relates, according to some embodiments, to photostable photoactive compositions comprising (a) at least one photoactive compound that develops within itself an excited state energy when subjected to UV radiation and (b) a block copolymer comprising a plurality of blocks, wherein the block copolymer is operable to quench the excited state energy.
    Type: Grant
    Filed: July 7, 2017
    Date of Patent: February 11, 2020
    Assignee: Hallstar Beauty and Personal Care Innovations Company
    Inventors: Hui Feng, Shengkui Hu, Dennis Zlotnik
  • PHOTOSTABLE COMPOSITIONS COMPRISING PARA-ALKOXYL PHENYL SUBSTITUTED PROPENOIC ACID (APP) COPOLYMER DERIVATIVES
    Publication number: 20180009923
    Abstract: The present disclosure relates, according to some embodiments, to photostable photoactive compositions comprising (a) at least one photoactive compound that develops within itself an excited state energy when subjected to UV radiation and (b) a block copolymer comprising a plurality of blocks, wherein the block copolymer is operable to quench the excited state energy.
    Type: Application
    Filed: July 7, 2017
    Publication date: January 11, 2018
    Applicant: HALLSTAR INNOVATIONS CORP.
    Inventors: Hui Feng, Shengkui Hu, Dennis Zlotnik