Abstract: A substrate processing apparatus includes a chamber including an accommodation space, a stage disposed in the accommodation space and provided with a substrate disposed thereon, a deposition part disposed under the stage and spraying at least one deposition material to the substrate, and a measurement part disposed adjacent to the deposition part. The measurement part includes an accommodation portion provided with an opening defined through at least one surface thereof, a light source disposed in the accommodation portion and irradiating a first light, at least one transmission portion disposed in the opening, facing the light source, and receiving the first light, and a reception portion facing the at least one transmission portion and receiving the first light reflected from the at least one deposition material as a second light.

Abstract: An apparatus including a surface heater, the surface heater including a substrate having a surface formed of an electrically insulating material, heating element attached to the surface of the substrate by sintering predetermined powder including lanthanide oxide powder, and a power supply unit configured to supply electricity to the heating element wherein a manufacturing method of the surface heater includes baking the predetermined powder at a baking temperature of 900° C. or lower.

Abstract: Disclosed herein are a surface heater, an electric range having the same, and a manufacturing method thereof. The surface heater includes a substrate including a surface formed of an electrically insulating material, heating element attached to the surface of the substrate by sintering predetermined powder including lanthanide oxide powder, and a power supply unit configured to supply electricity to the heating element. The electric range includes the surface heater. The manufacturing method of the surface heater includes baking the predetermined powder at a baking temperature of 900° C. or lower.