Patents by Inventor Deok Yun Kim

Deok Yun Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9278864
    Abstract: Provided is a method for preparing monosilane, more particularly a method for economically preparing monosilane, which is useful for the composition of a thin semiconductor structure and multipurpose high-purity polycrystalline silicon, by preparing monosilane with high purity and high yield using trialkoxysilane.
    Type: Grant
    Filed: October 2, 2013
    Date of Patent: March 8, 2016
    Assignees: OCI COMPANY LTD., INSTITUTE OF ION-PLASMA AND LASER TECHNOLOGIES
    Inventors: Taek Joong Kim, Yong Il Kim, Kyung Yeol Kim, Deok Yun Kim, Ashurov Khatam, Salikhov Shavkat, Rotshteyn Vladimir, Ashurova Khekayat, Kurbanov Aziz, Abdisaidov Ilyos, Azizov Sultan, Ashurov Rustam
  • Patent number: 9156861
    Abstract: The present invention relates to a method for preparing SiH(OR3)-type trialkoxysilane (wherein, R is a C1-C3 methyl, ethyl, propyl or isopropyl group), and more specifically, the method comprises the steps of: preventing the oxidation of a silicon surface by pulverizing raw silicon material in a solvent environment without contact with the air so that the initial induction period of the direct synthesis of trialkoxysilane is dramatically reduced; and removing impurities from a reaction environment by continuously selecting a part of the solvent through a membrane filter provided in a reactor body.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: October 13, 2015
    Assignees: OCI COMPANY LTD., INSTITUTION OF ION-PLASMA AND LASER TECHNOLOGIES
    Inventors: Se In Yang, Yong Il Kim, Kyung Yeol Kim, Deok Yun Kim, Ashurov Khatam, Abdurakhmanov Boris, Rotshteyn Vladimir, Salikhov Shavkat, Ashurova Khekayat, Salimboev Akmal, Azizov Sultan, Saidov Sabir
  • Publication number: 20150251916
    Abstract: Provided is a method for preparing monosilane, more particularly a method for economically preparing monosilane, which is useful for the composition of a thin semiconductor structure and multipurpose high-purity polycrystalline silicon, by preparing monosilane with high purity and high yield using trialkoxysilane.
    Type: Application
    Filed: October 2, 2013
    Publication date: September 10, 2015
    Inventors: Taek Joong Kim, Yong Il Kim, Kyung Yeol Kim, Deok Yun Kim, Ashurov Khatam, Salikhov Shavkat, Rotshteyn Vladimir, Ashurova Khekayat, Kurbanov Aziz, Abdisaidov Ilyos, Azizov Sultan, Ashurov Rustam
  • Publication number: 20140364639
    Abstract: The present invention relates to a method for preparing SiH(OR3)-type trialkoxysilane (wherein, R is a C1-C3 methyl, ethyl, propyl or isopropyl group), and more specifically, the method comprises the steps of: preventing the oxidation of a silicon surface by pulverizing raw silicon material in a solvent environment without contact with the air so that the initial induction period of the direct synthesis of trialkoxysilane is dramatically reduced; and removing impurities from a reaction environment by continuously selecting a part of the solvent through a membrane filter provided in a reactor body.
    Type: Application
    Filed: March 30, 2012
    Publication date: December 11, 2014
    Applicant: INSTITUTE OF ION-PLASMA AND LASER TECHNOLOGIES
    Inventors: Se In Yang, Yong Kim, II, Kyung Yeol Kim, Deok Yun Kim, Ashurov Khatam, Abdurakhmanov Boris, Rotshteyn Vladimir, Salikhov Shavkat, Ashurova Khekayat, Salimboev Akmal, Azizov Sultan, Saidov Sabir
  • Patent number: 8158100
    Abstract: The present invention relates to a method for the preparation of hydrogen peroxide through a continuous process, extracting hydrogen peroxide produced from reduction and oxidation of a working solution and recycling the oxidized working solution back to the reduction process, wherein the composition of the working solution, i.e. the composition of 2-alkylanthraquinone and 2-tetrahydroalkylanthraquinone, is optimized to increase the solubility of the quinones and to improve the reaction rate. The working solution comprises 2-alkylanthraquinone, 2-tetrahydroalkylanthraquinone and an organic solvent, wherein 65-95 mol % of the alkyl group of 2-alkylanthraquinone and 2-tetrahydroalkylanthraquinone is amyl and the remaining 5-35 mol % of the alkyl group is ethyl, and the molar ratio of 2-alkylanthraquinone to 2-tetrahydroalkylanthraquinone is from 4:6 to 1:9.
    Type: Grant
    Filed: March 6, 2009
    Date of Patent: April 17, 2012
    Assignee: OCI Company Ltd.
    Inventors: Se In Yang, Kyung Keun Yoo, Yong Il Kim, Tae Hee Shin, Deok Yun Kim, Sun Ki Seo, Rae Sung Chung, Do Sun Baik
  • Publication number: 20100284901
    Abstract: The present invention relates to a method for the preparation of hydrogen peroxide through a continuous process, extracting hydrogen peroxide produced from reduction and oxidation of a working solution and recycling the oxidized working solution back to the reduction process, wherein the composition of the working solution, i.e. the composition of 2-alkylanthraquinone and 2-tetrahydroalkylanthraquinone, is optimized to increase the solubility of the quinones and to improve the reaction rate. The working solution comprises 2-alkylanthraquinone, 2-tetrahydroalkylanthraquinone and an organic solvent, wherein 65-95 mol % of the alkyl group of 2-alkylanthraquinone and 2-tetrahydroalkylanthraquinone is amyl and the remaining 5-35 mol % of the alkyl group is ethyl, and the molar ratio of 2-alkylanthraquinone to 2-tetrahydroalkylanthraquinone is from 4:6 to 1:9.
    Type: Application
    Filed: March 6, 2009
    Publication date: November 11, 2010
    Applicant: OCI COMPANY LTD.
    Inventors: Se In Yang, Kyung Keun Yoo, Yong Il Kim, Tae Hee Shin, Deok Yun Kim, Sun Ki Seo, Rae Sung Chung, Do Sun Baik