Abstract: A double-sided all-solid-state thin-film lithium battery is provided, which may include a conductive substrate, a first upper electrode layer, a second upper electrode, an upper electrolyte layer, an upper current collecting layer, a first lower electrode layer, a second lower electrode layer, a lower electrolyte layer and a lower current collecting layer. The first upper electrode layer may be disposed at one side of the conductive substrate. The upper electrolyte layer may be disposed between the first and the second upper electrode layer. The upper current collecting layer may be disposed at one side of the second upper electrode layer. The first lower electrode layer may be disposed at the other side of the conductive substrate. The lower electrolyte layer may be disposed between the first and the second lower electrode layer. The lower current collecting layer may be disposed at one side of the second lower electrode layer.

Abstract: The invention is related to a method for forming dendritic silver with periodic structure as light-trapping layer, includes these steps: form a photoresist layer on a conductive substrate, and at least two coherent light beams is provided in using a laser interference lithography apparatus, to form a plurality of particular patterns respectively on the setting-exposure positions of the conductive substrate in sequence till the particular periods pattern formed. Thereafter, form the dendritic silver nanostructure with period pattern on the conductive substrate via electrochemical process, wherein operating voltage is 2V or higher, and electrochemical reaction time is 10 sec or higher.

Abstract: A thin film battery structure includes a substrate, a first current collector layer, a first electrode layer array, an electrolyte layer, a second electrode layer, and a second current collector layer. The first current collector layer is disposed on the substrate and has at least one first current collector bump. The first electrode layer array has at least one first electrode layer, where each first electrode layer is disposed on the first current collector layer, and at least one first current collector bump is embedded inside each first electrode layer. Each first electrode layer is embedded inside the electrolyte layer. The second electrode layer is disposed on the electrolyte layer. The second current collector layer is disposed on the second electrode layer.

Abstract: The invention is related to a method for forming dendritic silver with periodic structure as light-trapping layer, includes these steps: form a photoresist layer on a conductive substrate, and at least two coherent light beams is provided in using a laser interference lithography apparatus, to form a plurality of particular patterns respectively on the setting-exposure positions of the conductive substrate in sequence till the particular periods pattern formed. Thereafter, form the dendritic silver nanostructure with period pattern on the conductive substrate via electrochemical process, wherein operating voltage is 2V or higher, and electrochemical reaction time is 10 sec or higher.

Abstract: A thin film battery structure includes a substrate, a first current collector layer, a first electrode layer array, an electrolyte layer, a second electrode layer, and a second current collector layer. The first current collector layer is disposed on the substrate and has at least one first current collector bump. The first electrode layer array has at least one first electrode layer, where each first electrode layer is disposed on the first current collector layer, and at least one first current collector bump is embedded inside each first electrode layer. Each first electrode layer is embedded inside the electrolyte layer. The second electrode layer is disposed on the electrolyte layer. The second current collector layer is disposed on the second electrode layer.

Abstract: The present invention relates to a microcrystalline silicon thin film solar cell and the manufacturing method thereof, using which not only the crystallinity of a microcrystalline silicon thin film that is to be formed by the manufacturing method can be controlled and adjusted at will and the defects in the microcrystalline silicon thin film can be fixed, but also the device characteristic degradation due to chamber contamination happening in the manufacturing process, such as plasma enhanced chemical vapor deposition (PECVD), can be eliminated effectively.

Abstract: A practical product combining a thin film solar cell component with a residential environment is provided. Being flexible and easy to manufacture on a plane material, a silicon thin film solar cell is combined with a shutter used in residential buildings, thereby extending shutter functions. This module integrates energy saving, power generation and elegant appearance by bringing in a flexible and colored solar cell module that is light and thin and can generate power indoors and outdoors. As buildings are becoming higher nowadays, the area exposed to sunlight increases. Solar shutters have great power generation efficiency potential if used a building. The solar shutters can save energy and reduce CO2 emission when combined with electric products and provide electricity in emergency when combined with a storage device. The thin film solar cell provides components of many colors for customers, thereby providing options for the appearance of the building.

Abstract: The present invention discloses a packaging structure and method for organic light emitting devices, in which the packaging structure comprises a substrate; an OLED device, which disposing on the substrate; a first transparent protection layer, which forming on the OLED device; and a second transparent protection layer, which forming on the first transparent protection layer.

Abstract: The present invention relates to a method for fabricating a thin film formed with a uniform single-size monolayer of spherical AZO nanoparticles. Because of its own advantages in cost and transparency, Al-doped ZnO (AZO) transparent conductive film is becoming the most commonly used transparent conducting oxide (TCO) replacement for solar cells. In this invention, a colloidal chemical means is adopted for enabling a chemical reaction between metal salts, water, and polyhydric alcohols at a room-temperature environment, and thereby, a process for fabricating spherical AZO nanoparticles in a diameter ranged between 100 nm to 400 nm according to different parameter configurations can be achieved while controlling the actual Al/Zn ratio to be ranged between 0.1% to 3%. In addition, a dip coating means is adopted for densely distributing the spherical AZO nanoparticles on a substrate into a monolayer close-packed structure.

Abstract: The present invention discloses a packaging structure and method for organic light emitting devices, in which the packaging structure comprises a substrate; an OLED device, which disposing on the substrate; a first transparent protection layer, which forming on the OLED device; and a second transparent protection layer, which forming on the first transparent protection layer.

Abstract: The present invention provides a solar cell, which has an improved light-trapping structure, wherein the light trapping structure is a single layer of thin film made of a plurality of zinc oxide microballs whose diameter is ranged between 300 nm and 650 nm. In a preferred embodiment, the light trapping layer, being configured with a plurality of microballs made of zinc oxide, is disposed at a position between the front surface of a photovoltaic conversion layer and a front electrode of the solar cell. Since the light-trapping structure is formed directly from the ZnO transparent conductive layer of the solar cell, the types of materials used for constructing the solar cell are reduced.

Abstract: A thin-film photovoltaic device comprising at least: a substrate, a transparent electrode layer, a p-type semiconductor as the ohmic contact layer, an intrinsic semiconductor as the light absorption layer, and a magnesium alloy substituted for the n-type semiconductor as the other ohmic contact layer. A method for manufacturing the thin-film photovoltaic device is also provided in the present invention.

Abstract: A plasma source comprises a vacuum chamber, a plurality of discharge tubes, a plurality of permanent magnets, a plurality of RF antennas, and an RF power distribution circuit. The RF power distribution circuit is electrically coupled to an RF power supply and each of the plurality of RF antennas. The lengths of the transmission paths between each of the plurality of RF antennas and the RF power supply are the same, so that the RF power supply can provide each of discharge tubes with the same RF power.

Abstract: A magnetron sputtering apparatus suitable for coating on a workpiece is provided. The magnetron sputtering apparatus includes a vacuum chamber, a holder, a magnetron plasma source and a high-power pulse power supply set, wherein the magnetron plasma source includes a base, a magnetron controller and a target. A reactive gas is inputted into the vacuum chamber, and the holder supporting the workpiece is disposed inside the vacuum chamber. The magnetron plasma source is disposed opposite to the workpiece, wherein the magnetron controller is disposed in the base, and the target is disposed on the base. The high-power pulse power supply set is coupled to the vacuum chamber, the magnetron plasma source and the holder, and a high voltage pulse power is inputted to the magnetron plasma source to generate plasma to coat a film on the surface of the workpiece.

Abstract: Disclosed is a method for growing a microcrystalline silicon film on a substrate. The method includes the step of disposing the substrate in a chamber, the step of vacuuming the chamber and heating the substrate, the step of introducing reacting gas into the chamber as a precursor and keeping the pressure in the chamber at a predetermined value and the step of using RF energy in the chamber to dissociate the reacting gas to form plasma for growing the microcrystalline silicon film on the substrate. The reacting gas includes SiH4/Ar mixture and H2. The ratio of SiH4/Ar mixture over H2 is 1:1 to 1:20.

Abstract: A hollow-cathode discharge apparatus is disclosed for plasma-based processing. The hollow-cathode discharge apparatus includes a vacuum chamber, a hollow cathode disposed in the center of the vacuum chamber, a carrier for synchronously carrying a plurality of work-pieces in the vacuum chamber and a driving element for driving the carrier.

Abstract: A method for pulsed plasma deposition of titanium dioxide film is revealed. The method includes the steps of: (1) set a substrate into a chamber and the chamber is pumped down to a certain vacuum level. (2) Introduce titanium tetraisopropoxide gas and gas containing oxygen into the chamber and a RF (radio frequency) pulse power supply is turned on to create a glow discharge for generating pulsed plasma. (3) A layer of titanium dioxide film is deposited on the substrate by the pulsed plasma. The TiO2 film is deposited on a substrate such as plastic substrate at low temperature according to the method so that the heat-resistant and conductive requirements of conventional substrates are removed.

Abstract: A protective coating is formed on a stainless interconnecting plate used in solid oxide fuel cell (SOFC). With the protective coating, a contact resistance of the plate is effectively lowered. Anode and cathode of SOFC are also prevented from being poisoned by chromium diffusion from the plate. Therefore, after a long time of use under a high temperature, a degradation rate for power generating of SOFC is reduced; and, thus, a working hour is prolonged. Hence, the SOFC can be mass-produced and large-scaled.