Patents by Inventor Derek Coon
Derek Coon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240131595Abstract: A processing machine (10) for building an object (11) from powder (12) includes a build platform (26A); a powder supply assembly (18) that deposits the powder (12) onto the build platform (26A) to form a powder layer (13); and an energy system (22) that directs an energy beam (22D) at a portion of the powder (12) on the build platform (26A) to form a portion of the object (11). The powder supply assembly (18) can include (i) a powder container (640A) that retains the powder (12); (ii) a supply outlet (639) positioned over the build platform (26A); and (ii) a flow control assembly (642) that selectively controls the flow of the powder (12) from the supply outlet (639).Type: ApplicationFiled: June 30, 2020Publication date: April 25, 2024Inventors: Alton Hugh Phillips, Joseph P. Rossi, Johnathan Agustin Marquez, Yoon Jung Jeong, Lexian Guo, Patrick Shih Chang, Eric Peter Goodwin, Michael Birk Binnard, Brett William Herr, Matthew Parker-McCormick Bjork, Paul Derek Coon, Motofusa Ishikawa
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Publication number: 20220288855Abstract: A processing machine (10) for building an object (11) from material (12) includes (i) a material bed assembly (16) that supports the material (12); (ii) a material supply assembly (18) that positions the material (12); (iii) an energy system (22) that directs an energy beam (22A) at the material (12) to build the object (11); (iv) a housing assembly (24) that defines at least a portion of a build chamber (29) for the energy beam (22A), the housing assembly (24) being spaced apart a housing gap (30A) from the material (12); and (v) a seal assembly (26) that creates a housing seal (26A) between the housing assembly (24) and the material (12) to seal the housing gap (30A).Type: ApplicationFiled: March 3, 2022Publication date: September 15, 2022Inventors: Alton Hugh Phillips, Michael Birk Binnard, Takakuni Goto, Paul Derek Coon, Motofusa Ishikawa, Daniel Gene Smith
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Publication number: 20220252392Abstract: 3D metrology techniques are disclosed for determining a changing topography of a substrate processed in an additive manufacturing system. Techniques include fringe scanning, simultaneous fringe projections, interferometry, and x-ray imaging. The techniques can be applied to 3D printing systems to enable rapid topographical measurements of a 3D printer powder bed, or other rapidly moving, nearly continuous surface to be tested. The techniques act in parallel to the system being measured to provide information about system operation and the topography of the product being processed. A tool is provided for achieving higher precision, increasing throughput, and reducing the cost of operation through early detection and diagnosis of operating problems and printing defects. These techniques work well with any powder bed 3D printing system, providing real-time metrology of the powder bed, the most recently printed layer, or both without reducing throughput.Type: ApplicationFiled: July 2, 2020Publication date: August 11, 2022Applicant: Nikon CorporationInventors: Eric Peter Goodwin, Heather Lynn Durko, Daniel Gene Smith, Johnathan Agustin Marquez, Michael Birk Binnard, Patrick Shih Chang, Matthew Parker-McCormick Bjork, Paul Derek Coon, Brett William Herr, Motofusa Ishikawa
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Publication number: 20220212263Abstract: To improve the operation of 3D printing systems, techniques are disclosed for a rotary 3D printer comprising: a main rotating support table rotating about a first axis and one or more secondary support tables rotating around a non-coaxial secondary axis; a powder supply assembly for distributing powder onto the tables; and an energy system for directing an energy beam at the powder to form a part. The main support table and secondary support tables can rotate in the same or opposite directions. Disclosed techniques include: grooved support table surfaces for improving stability of applied powder; reciprocating bellows for controlling a differential load on actuators that move the support tables; high temperature bearings or bushings for supporting rotary motion at high temperatures; and a mechanism for counterbalancing a weight of the part being built.Type: ApplicationFiled: July 1, 2020Publication date: July 7, 2022Applicant: Nikon CorporationInventors: Alton Hugh Phillips, Patrick Shih Chang, Michael Birk Binnard, Matthew Rosa, Serhad Ketsamanian, Lexian Guo, Brett William Herr, Eric Peter Goodwin, Johnathan Agustin Marquez, Matthew Parker-McCormick Bjork, Paul Derek Coon, Motofusa Ishikawa
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Publication number: 20220088869Abstract: A processing machine (10) for building a three-dimensional object (11) from a material (12) includes a support platform (26A), a platform mover (30), a build bed (28), a bed mover (28C), and an energy system (22). The platform mover (30) moves the support platform (26A) in a platform rotation direction (30C) at a first angular velocity. The build bed (28) is movably coupled to the support platform (26A). The build bed (28) supports at least a portion of the material (12). The bed mover (28C) rotates the build bed (28) relative to the support platform (26A) in a bed rotation direction (28D) at a second angular velocity. The bed rotation direction (28D) is opposite to the platform rotation direction (30C), and the second angular velocity is one-half the first angular velocity. The energy system (22) directs an energy beam (22B) at the material (12) on the build bed (28) to form at least a portion of the object (11).Type: ApplicationFiled: September 17, 2021Publication date: March 24, 2022Inventor: Paul Derek Coon
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Patent number: 11061338Abstract: A position encoder for monitoring position of an object includes a target pattern, an illumination system, an image sensor, and a control system. The illumination system generates (i) a first illumination beam that is directed toward and impinges on the target pattern, the first illumination beam having a first beam characteristic; and (ii) a second illumination beam that is directed toward and impinges on the target pattern, the second illumination beam having a second beam characteristic that is different than the first beam characteristic. The image sensor is coupled to the object and is spaced apart from the target pattern. The image sensor senses a first set of information from the first illumination beam impinging on the target pattern and senses a second set of information from the second illumination beam impinging on the target pattern. The control system analyzes the first set of information and the second set of information to monitor the position of the object.Type: GrantFiled: March 29, 2018Date of Patent: July 13, 2021Inventors: Jonathan Kyle Wells, Paul Derek Coon, Matthew D. Rosa, Johnathan Marquez, Michael B. Binnard, Steven Douglas Slonaker, Daniel Gene Smith, Stephen P. Renwick, Brett Herr
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Patent number: 10884344Abstract: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.Type: GrantFiled: August 4, 2017Date of Patent: January 5, 2021Inventors: Paul Derek Coon, Jonathan K. Wells, Matthew Rosa, Michael Binnard
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Patent number: 10877383Abstract: An exposure apparatus for transferring a pattern from a reticle to a workpiece, a pellicle being positioned near the reticle, includes a heat transfer frame, an illuminator, and a temperature controller. The heat transfer frame is configured to be positioned near the pellicle, the heat transfer frame defining a beam aperture. The illuminator directs a beam through the beam aperture and the pellicle at the reticle. The temperature controller controls the temperature of the heat transfer frame to control the temperature of the pellicle. The illuminator can direct the beam from a beam source, such as an EUV beam source. Additionally, the temperature controller can cryogenically cool the heat transfer frame.Type: GrantFiled: November 21, 2019Date of Patent: December 29, 2020Inventors: Paul Derek Coon, Soichi Owa
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Publication number: 20200346407Abstract: A processing machine (10) for building a part (11) includes: a support device (26) including a support surface (26B); a drive device (28) which moves the support device (26) so as a specific position on the support surface (26B) is moved along a moving direction (25); a powder supply device (18) which supplies a powder (12) to the moving support device (26) to form a powder layer (13); an irradiation device (22) which irradiates at least a portion of the powder layer (13) with an energy beam (22D) to form at least a portion of the part (11) from the powder layer (13) during a first period of time; and a measurement device (20) which measures at least portion of the part (11) during a second period of time. The first period in which the irradiation device (22) irradiates the powder layer (13) with the energy beam (22D) and the second period in which the measurement device (22) measures are overlapped.Type: ApplicationFiled: December 22, 2018Publication date: November 5, 2020Inventors: Eric Peter Goodwin, Johnathan Agustin Marquez, Michael Birk Binnard, Brett Herr, Matthew Parker-McCormick Bjork, Paul Derek Coon, Patrick Chang, Motofusa Ishikawa
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Patent number: 10812695Abstract: A measuring device (233) for monitoring movement of a first object relative to a second object, the first object or the second object including a target surface (13), comprises a first image sensor combination (236), a second image sensor combination (237), and a control system (20A). The image sensor combinations (236, 237) capture first images and second images of the target surface (13) over time. The first image sensor combination (236) includes a first image sensor (236A) and a first lens assembly (236B). The second image sensor combination (237) includes a second image sensor (237A), and a second lens assembly (237B) having a second optical axis (237BX) that is at an angle of between thirty degrees and sixty degrees relative to normal to the target surface (13). The control system (20A) analyzes the first images and the second images to monitor movement of the first object relative to the second object.Type: GrantFiled: September 13, 2016Date of Patent: October 20, 2020Assignee: Nikon CorporationInventors: Jonathan K. Wells, Matthew D. Rosa, Paul Derek Coon, Eric Peter Goodwin
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Publication number: 20200089134Abstract: An exposure apparatus for transferring a pattern from a reticle to a workpiece, a pellicle being positioned near the reticle, includes a heat transfer frame, an illuminator, and a temperature controller. The heat transfer frame is configured to be positioned near the pellicle, the heat transfer frame defining a beam aperture. The illuminator directs a beam through the beam aperture and the pellicle at the reticle. The temperature controller controls the temperature of the heat transfer frame to control the temperature of the pellicle. The illuminator can direct the beam from a beam source, such as an EUV beam source. Additionally, the temperature controller can cryogenically cool the heat transfer frame.Type: ApplicationFiled: November 21, 2019Publication date: March 19, 2020Inventors: Paul Derek Coon, Soichi Owa
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Patent number: 10527956Abstract: An exposure apparatus for transferring a pattern from a reticle to a workpiece, a pellicle being positioned near the reticle, includes a heat transfer frame, an illuminator, and a temperature controller. The heat transfer frame is configured to be positioned near the pellicle, the heat transfer frame defining a beam aperture. The illuminator directs a beam through the beam aperture and the pellicle at the reticle. The temperature controller controls the temperature of the heat transfer frame to control the temperature of the pellicle. The illuminator can direct the beam from a beam source, such as an EUV beam source. Additionally, the temperature controller can cryogenically cool the heat transfer frame.Type: GrantFiled: March 16, 2018Date of Patent: January 7, 2020Assignee: NIKON CORPORATIONInventors: Paul Derek Coon, Soichi Owa
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Patent number: 10394138Abstract: An exposure apparatus (10) for transferring one or more features to a workpiece (22) includes an illumination source (44A); (ii) a chuck (40) that retains the workpiece (22); (iii) a chamber housing (28A) that encircles the chuck and the workpiece; and (iv) a temperature controller (32) (34) that adjusts the temperature of at least one of the chuck (40) and the workpiece (22) so that a predetermined temperature differential (309) exists between the chuck (40) and the workpiece (22) before transferring the features to the workpiece (22).Type: GrantFiled: September 7, 2017Date of Patent: August 27, 2019Assignee: NIKON CORPORATIONInventors: Michael B. Binnard, Paul Derek Coon
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Publication number: 20180275534Abstract: An exposure apparatus for transferring a pattern from a reticle to a workpiece, a pellicle being positioned near the reticle, includes a heat transfer frame, an illuminator, and a temperature controller. The heat transfer frame is configured to be positioned near the pellicle, the heat transfer frame defining a beam aperture. The illuminator directs a beam through the beam aperture and the pellicle at the reticle. The temperature controller controls the temperature of the heat transfer frame to control the temperature of the pellicle. The illuminator can direct the beam from a beam source, such as an EUV beam source. Additionally, the temperature controller can cryogenically cool the heat transfer frame.Type: ApplicationFiled: March 16, 2018Publication date: September 27, 2018Inventors: Paul Derek Coon, Soichi Owa
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Publication number: 20180217510Abstract: A position encoder for monitoring position of an object includes a target pattern, an illumination system, an image sensor, and a control system. The illumination system generates (i) a first illumination beam that is directed toward and impinges on the target pattern, the first illumination beam having a first beam characteristic; and (ii) a second illumination beam that is directed toward and impinges on the target pattern, the second illumination beam having a second beam characteristic that is different than the first beam characteristic. The image sensor is coupled to the object and is spaced apart from the target pattern. The image sensor senses a first set of information from the first illumination beam impinging on the target pattern and senses a second set of information from the second illumination beam impinging on the target pattern. The control system analyzes the first set of information and the second set of information to monitor the position of the object.Type: ApplicationFiled: March 29, 2018Publication date: August 2, 2018Inventors: J. Kyle Wells, Paul Derek Coon, Matthew D. Rosa, Johnathan Marquez, Michael B. Binnard, Steven Douglas Slonaker, Daniel Gene Smith, Stephen P. Renwick, Brett Herr
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Publication number: 20180074417Abstract: An exposure apparatus (10) for transferring one or more features to a workpiece (22) includes an illumination source (44A); (ii) a chuck (40) that retains the workpiece (22); (iii) a chamber housing (28A) that encircles the chuck and the workpiece; and (iv) a temperature controller (32) (34) that adjusts the temperature of at least one of the chuck (40) and the workpiece (22) so that a predetermined temperature differential (309) exists between the chuck (40) and the workpiece (22) before transferring the features to the workpiece (22).Type: ApplicationFiled: September 7, 2017Publication date: March 15, 2018Inventors: Michael B. Binnard, Paul Derek Coon
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Publication number: 20170329236Abstract: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.Type: ApplicationFiled: August 4, 2017Publication date: November 16, 2017Inventors: Paul Derek Coon, Jonathan K. Wells, Matthew Rosa, Michael Binnard
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Patent number: 9726987Abstract: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.Type: GrantFiled: April 17, 2015Date of Patent: August 8, 2017Assignee: Nikon CorporationInventors: Paul Derek Coon, Jonathan K. Wells, Matthew Rosa, Michael Binnard
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Patent number: 9618852Abstract: An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including gas outlets through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlets is controlled so that a pressure of the gas supplied by a first one of the gas outlets is different from a pressure of the gas simultaneously supplied from a second one of the gas outlets.Type: GrantFiled: November 14, 2008Date of Patent: April 11, 2017Assignee: NIKON CORPORATIONInventors: Derek Coon, Andrew J. Hazelton
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Publication number: 20170076439Abstract: A measuring device (233) for monitoring movement of a first object relative to a second object, the first object or the second object including a target surface (13), comprises a first image sensor combination (236), a second image sensor combination (237), and a control system (20A). The image sensor combinations (236, 237) capture first images and second images of the target surface (13) over time. The first image sensor combination (236) includes a first image sensor (236A) and a first lens assembly (236B). The second image sensor combination (237) includes a second image sensor (237A), and a second lens assembly (237B) having a second optical axis (237BX) that is at an angle of between thirty degrees and sixty degrees relative to normal to the target surface (13). The control system (20A) analyzes the first images and the second images to monitor movement of the first object relative to the second object.Type: ApplicationFiled: September 13, 2016Publication date: March 16, 2017Inventors: Jonathan K. Wells, Matthew D. Rosa, Paul Derek Coon, Eric Peter Goodwin