Patents by Inventor Derk Klunder

Derk Klunder has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070259275
    Abstract: An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.
    Type: Application
    Filed: May 5, 2006
    Publication date: November 8, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Van Herpen, Vadim Banine, Koen Schenau, Derk Klunder
  • Publication number: 20070131878
    Abstract: A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by guiding a gas flow from the inlet through the compartments to the outlet. The cleaning arrangement includes a distribution system configured to divide the gas flow into several sub flows, each of the sub flows corresponding to one or more of the compartments, and a control system configured to control the relative amount of the sub flows.
    Type: Application
    Filed: December 8, 2005
    Publication date: June 14, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Banine, Sonia Skelly, Derk Klunder, Maarten Marinus Wilhelmus Van Herpen
  • Publication number: 20070125963
    Abstract: A radiation system for generating a beam of radiation is disclosed. The radiation system includes a pulsed EUV source for generating EUV radiation, and a spectral filter mounted in front of the EUV source for selectively passing a spectral range of a beam of EUV radiation from the EUV source. The spectral filter is mounted on a movable mount configured to be moved in synchronicity with the pulsed EUV source to prevent debris traveling from the EUV source from impacting the spectral filter. Accordingly, the spectral filter is kept substantially free from contamination by the debris.
    Type: Application
    Filed: December 2, 2005
    Publication date: June 7, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maarten Marinus Johannes Van Herpen, Johannes Moors, Derk Klunder
  • Publication number: 20070125964
    Abstract: An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication with the hydrogen radical source. The cleaning device is configured to provide a flow of hydrogen radicals and the flow tube is arranged to provide a hydrogen radical flow at a predetermined position within the lithographic apparatus, for example for cleaning a collector mirror.
    Type: Application
    Filed: December 2, 2005
    Publication date: June 7, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maarten Marinus Johannes Van Herpen, Derk Klunder
  • Publication number: 20070115443
    Abstract: The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source for generating extreme ultraviolet radiation, a contamination barrier for trapping contamination from the radiation source, and a temperature sensor for sensing a temperature of the contamination barrier.
    Type: Application
    Filed: November 23, 2005
    Publication date: May 24, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wilhelmus Box, Derk Klunder, Maarten Wilhelmus Van Herpen, Niels Driessen
  • Publication number: 20070115445
    Abstract: The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet radiation, a contamination barrier constructed and arranged to trap contamination from the radiation source, and a temperature sensor constructed and arranged to sense a temperature of the contamination barrier.
    Type: Application
    Filed: November 21, 2006
    Publication date: May 24, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wilhelmus Box, Derk Klunder, Maarten Marinus Johannes Van Herpen, Niels Driessen, Hendrikus Schimmel
  • Publication number: 20070040999
    Abstract: A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas and one or more additional compounds selected from the group of hydrocarbon compounds and silane compounds in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.
    Type: Application
    Filed: August 22, 2005
    Publication date: February 22, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Maarten Marinus Wilhelmus Van Herpen, Carolus Ida Spee, Derk Klunder, Antonius De Mol
  • Publication number: 20070023693
    Abstract: A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.
    Type: Application
    Filed: July 27, 2006
    Publication date: February 1, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Levinus Bakker, Derk Klunder, Maarten Marinus Wilhelmus Van Herpen
  • Publication number: 20060278833
    Abstract: A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.
    Type: Application
    Filed: June 13, 2005
    Publication date: December 14, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maarten Marinus Wilhelmus Van Herpen, Vadim Banine, Derk Klunder
  • Publication number: 20060261290
    Abstract: A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates are arranged in an optically closed arrangement so that at least one of the foil plates reflects EUV radiation passing the contamination barrier at least one time.
    Type: Application
    Filed: May 20, 2005
    Publication date: November 23, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maarten Wilhelmus Van Herpen, Vadim Banine, Arnoud Wassink, Derk Klunder
  • Publication number: 20060151717
    Abstract: Particles emitted by a radiation source, and moving from the radiation source towards a processing system for processing the radiation from the radiation source, are filtered out of radiation propagating through a predetermined cross section of the radiation as emitted by the radiation source by a filter system. The filter system includes a plurality of foils and a transporter for transporting the foils along a trajectory which extends within the beam so that the foils intercept the particles within the beam. The transporter is arranged to transport the foils by a substantially translatory movement of the foils along at least a part of the trajectory.
    Type: Application
    Filed: January 10, 2005
    Publication date: July 13, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Derk Klunder, Levinus Bakker, Vadim Banine, Maarten Marinus Johannes Wilhelmus Herpen
  • Publication number: 20060146413
    Abstract: A spectral purity filter includes an aperture, the aperture having a diameter, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting radiation of a first wavelength and allowing at least a portion of radiation of a second wavelength to transmit through the aperture, the first wavelength being larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.
    Type: Application
    Filed: December 30, 2004
    Publication date: July 6, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Derk Klunder, Maarten Marinus Johannes Van Herpen
  • Publication number: 20060138362
    Abstract: A debris trapping system for trapping debris particles released with the generation of radiation by a radiation source in a lithographic apparatus includes first and second sets of channels. Each channel of the first set enables radiation from a radiating source to propagate therethrough and has an inner wall for catching debris particles. The second set of channels is situated downstream of the first set with respect to a propagation direction of the radiation. Each channel of the second set enables radiation from the radiating source to also propagate therethrough and has an inner wall for catching debris particles. A gas supply and a gas exhaust are configured to provide between the first set and the second set of channels a gas flow having a net flow direction substantially across the propagation direction of the radiation from a radiating source.
    Type: Application
    Filed: December 27, 2004
    Publication date: June 29, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Levinus Bakker, Derk Klunder, Maarten Marinus Johannes Van Herpen