Patents by Inventor Derk TEN HOOPEN

Derk TEN HOOPEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for manufacturing damper device, lithographic apparatus, projection system, and device manufacturing method
    Patent number: 11835106
    Abstract: The invention relates a method for manufacturing a damper device including a first part and a second part, said method comprising the following steps: a) providing a damping material in a space in between the first part and the second part, such that the damping material is in a compressed state in the space; and b) heating the device to a predetermined temperature in order to adhere the damping material to the first part and the second part.
    Type: Grant
    Filed: November 15, 2018
    Date of Patent: December 5, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Derk Ten Hoopen, Francois-Xavier Debiesme, Eric Pierre-Yves Vennat
  • Method for Manufacturing Damper Device, Lithographic Apparatus, Projection System, and Device Manufacturing Method
    Publication number: 20210079971
    Abstract: The invention relates a method for manufacturing a damper device including a first part and a second part, said method comprising the following steps: a) providing a damping material in a space in between the first part and the second part, such that the damping material is in a compressed state in the space; and b) heating the device to a predetermined temperature in order to adhere the damping material to the first part and the second part.
    Type: Application
    Filed: November 15, 2018
    Publication date: March 18, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Derk TEN HOOPEN, Francois-Xavier DEBIESME, Eric Pierre-Yves VENNAT
  • Support device, lithographic apparatus and device manufacturing method
    Patent number: 9977349
    Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.
    Type: Grant
    Filed: December 18, 2014
    Date of Patent: May 22, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Ingmar August Kerp, Pieter Johannes Gertrudis Meijers, Jeroen Pieter Starreveld, Derk Ten Hoopen, Martinus Van Duijnhoven, Edward Hage, Evert Hendrik Jan Draaijer, Wesley Ooms
  • SUPPORT DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160334718
    Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.
    Type: Application
    Filed: December 18, 2014
    Publication date: November 17, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, INgmar August KERP, Pieter Johannes Gertrudis MEIJERS, Jeroen Pieter STARREVELD, Derk TEN HOOPEN, Martinus VAN DUIJNHOVEN, Edward HAGE, Evert Hendrik Jan DRAAIJER, Wesley OOMS