Abstract: The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 ?m.

Abstract: The present invention relates to an X-ray analysis apparatus and an X-ray analysis method for analysing a sample. The X-ray analysis method involves using a first slit between the sample and a position sensitive X-ray detector to analyse the sample, including calculating a detection angle based on a distance L1 between the first slit and the X-ray detector, and the position of the first detection element in the array of detection elements. The X-ray analysis apparatus comprises a processor that is configured to analyse data from an X-ray detector comprising an array of detection elements. The processor is configured to receive data comprising an X-ray intensity detected at the first detection element of the array of detection elements and calculate the detection angle based on the distance L1 between the first slit and the X-ray detector, and the position of the first detection element in the array of detection elements.

Abstract: The present invention relates to an X-ray analysis apparatus and an X-ray method for analysing a sample. The X-ray analysis apparatus includes an X-ray source comprising an anode and a cathode, and configured to irradiate an irradiated area on a target surface of the anode. The X-ray analysis apparatus further includes a steering arrangement, a processor and a controller. The steering arrangement is configured to position the irradiated area on the target surface of the anode. The processor is configured to receive X-ray analysis information, and to determine a change in position of the irradiated area on the target surface based on the X-ray analysis information. The controller is configured to control the steering arrangement to move the irradiated area on the target surface according to the change in position determined by the processor.

Abstract: The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 ?m.

Abstract: A beam shaping apparatus (10) for use in an X-ray analysis device (40). The beam shaping apparatus processes an input beam (32) from an X-ray beam source (20), and generates an output beam (34) with an output beam shape for irradiating a sample (112) held by a sample holder (22) of the X-ray analysis device. Movement of the output beam shape is controlled in dependence upon a varying tilt angle (?) of the sample (112), this defined by a tilt position of the sample holder (22).

Abstract: The sample mounting system comprises a sample holder and a sample stage having a platform for supporting the sample holder. The sample can be fixed to the sample holder by a mount. The sample holder comprises a holder reference portion, which co-operates with a corresponding reference portion of the sample stage (the stage reference portion) to align the sample holder with the sample stage. When the sample holder is positioned on the platform such that the stage reference portion and the holder reference portion engage each other, the sample holder is aligned with the sample stage.

Abstract: Embodiments of the present invention provide an X-ray collimator for collimating an incident X-ray beam by limiting divergence of the incident X-ray beam, the X-ray collimator having a variable acceptance angle, an X-ray analysis apparatus comprising an X-ray collimator having a variable acceptance angle and a method of using the X-ray analysis apparatus. The X-ray analysis apparatus comprises a position-sensitive X-ray detector, and the X-ray collimator is arranged between the sample and the position-sensitive X-ray detector to limit axial divergence of X-rays from the sample.

Abstract: The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 ?m.

Abstract: The present invention relates to sample holder for holding a sample. The sample holder comprises a body having an incident surface and an opening in the body for receiving a sample. When the sample is irradiated with X-rays the incident surface of the sample holder may also be irradiated, especially at low incident angles. To reduce background scattering from the incident surface, the incident surface comprises a protrusion for blocking X-rays.

Abstract: The sample mounting system comprises a sample holder and a sample stage having a platform for supporting the sample holder. The sample can be fixed to the sample holder by a mount. The sample holder comprises a holder reference portion, which co-operates with a corresponding reference portion of the sample stage (the stage reference portion) to align the sample holder with the sample stage. When the sample holder is positioned on the platform such that the stage reference portion and the holder reference portion engage each other, the sample holder is aligned with the sample stage.

Abstract: A beam shaping apparatus (10) for use in an X-ray analysis device (40). The beam shaping apparatus processes an input N beam (32) from an X-ray beam source (20), and generates an output beam (34) with an output beam shape for irradiating a sample (112) held by a sample holder (22) of the X-ray analysis device. Movement of the output beam shape is controlled in dependence upon a varying tilt angle (?) of the sample (112), this defined by a tilt position of the sample holder (22).

Abstract: An X-ray analysis apparatus comprises an X-ray source configured to irradiate a sample with an incident X-ray beam. A first beam mask component is arranged between the X-ray source and the sample. The first beam mask component has a first opening for limiting the size of the incident X-ray beam. When the first beam mask component is in a first configuration, the first opening is arranged in the incident X-ray beam. The first beam mask component further comprises a second opening. When the first beam mask component is in a second configuration, the second opening is arranged in the incident X-ray beam. The second opening does not limit the size of the incident X-ray beam. A controller is configured to control a first beam mask component actuator to change the configuration of the first beam mask component between the first configuration and the second configuration by moving the first beam mask component in a plane intersected by the incident X-ray beam.

Abstract: The X-ray analysis apparatus of the present invention comprises a sample stage for supporting a sample, a goniometer having an axis of rotation, and an X-ray detector arranged to be rotatable about the axis of rotation of the goniometer, wherein the X-ray detector is arranged to receive X-rays from the sample directed along an X-ray beam path. The X-ray analysis apparatus further comprises a first collimator, a second collimator and a third collimator each having a first configuration and a second configuration. In its first configuration, the collimator is arranged in the X-ray beam path. In its second configuration the collimator is arranged outside of the X-ray beam path. A first actuator arrangement is configured to move the first collimator and the second collimator between the first configuration and the second configuration by moving the first collimator and the second collimator in a lateral direction that intersects the X-ray beam path.

Abstract: An X-ray analysis apparatus and method. The apparatus comprises an adjustable slit (210) between an X-ray source (4) and a sample (6); and optionally a further slit (220, 220a). A controller (17) is configured to control a width of the adjustable slit, between a first width, a larger second width, and an even larger third width. At the first and second widths: the adjustable slit (210) limits the divergence of the incident beam and thereby limits an area of the sample that is irradiated; and the further slit (220) does not limit the divergence of the incident beam. At the third width: the adjustable slit (210) does not limit the divergence of the incident beam, and the further slit (220) limits the divergence of the incident beam and thereby limits the area of the sample that is irradiated. Alternatively, at the third width, the adjustable slit (210) continues to limit the area irradiated.

Abstract: A resource sharing system is for sharing local computing resources on devices within a medical network. The sharing system including a plurality of distributed devices, registered in the system and interconnected by a network. Each device includes at least one module communicating via a device-specific interface for providing a resource locally on the device. The device is provided with a device-specific service host for providing local resources to remote devices and for accessing foreign resources of at least one remote device. Further, a device, a method and a computer program product are disclosed.

Abstract: An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.

Abstract: An X-ray analysis apparatus comprises an X-ray source configured to irradiate a sample with an incident X-ray beam. A first beam mask component is arranged between the X-ray source and the sample. The first beam mask component has a first opening for limiting the size of the incident X-ray beam. When the first beam mask component is in a first configuration, the first opening is arranged in the incident X-ray beam. The first beam mask component further comprises a second opening. When the first beam mask component is in a second configuration, the second opening is arranged in the incident X-ray beam. The second opening does not limit the size of the incident X-ray beam. A controller is configured to control a first beam mask component actuator to change the configuration of the first beam mask component between the first configuration and the second configuration by moving the first beam mask component in a plane intersected by the incident X-ray beam.

Abstract: The X-ray analysis apparatus of the present invention comprises a sample stage for supporting a sample, a goniometer having an axis of rotation, and an X-ray detector arranged to be rotatable about the axis of rotation of the goniometer, wherein the X-ray detector is arranged to receive X-rays from the sample directed along an X-ray beam path. The X-ray analysis apparatus further comprises a first collimator, a second collimator and a third collimator each having a first configuration and a second configuration. In its first configuration, the collimator is arranged in the X-ray beam path. In its second configuration the collimator is arranged outside of the X-ray beam path. A first actuator arrangement is configured to move the first collimator and the second collimator between the first configuration and the second configuration by moving the first collimator and the second collimator in a lateral direction that intersects the X-ray beam path.

Abstract: An X-ray analysis apparatus and method. The apparatus comprises an adjustable slit (210) between an X-ray source (4) and a sample (6); and optionally a further slit (220, 220a). A controller (17) is configured to control a width of the adjustable slit, between a first width, a larger second width, and an even larger third width. At the first and second widths: the adjustable slit (210) limits the divergence of the incident beam and thereby limits an area of the sample that is irradiated; and the further slit (220) does not limit the divergence of the incident beam. At the third width: the adjustable slit (210) does not limit the divergence of the incident beam, and the further slit (220) limits the divergence of the incident beam and thereby limits the area of the sample that is irradiated. Alternatively, at the third width, the adjustable slit (210) continues to limit the area irradiated.

Abstract: A sample holder 2 for holding a capillary 40 for X-ray analysis has a first thermal transport member 36 on the base portion 14 on one side of a longitudinal slit 12 and a second thermal transport member 38 on the base portion 16 on the other side. The thermal transport members 36, 38 are compressed between a frame 30 and the base portion 14, 16 in the transverse direction to urge the edges of the first and second thermal transport members together, to hold a capillary 40 longitudinally aligned with the longitudinal slit 12.