Patents by Inventor Detlef Beckers

Detlef Beckers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11927550
    Abstract: The sample mounting system comprises a sample holder and a sample stage having a platform for supporting the sample holder. The sample can be fixed to the sample holder by a mount. The sample holder comprises a holder reference portion, which co-operates with a corresponding reference portion of the sample stage (the stage reference portion) to align the sample holder with the sample stage. When the sample holder is positioned on the platform such that the stage reference portion and the holder reference portion engage each other, the sample holder is aligned with the sample stage.
    Type: Grant
    Filed: December 10, 2021
    Date of Patent: March 12, 2024
    Assignee: MALVERN PANALYTICAL B.V.
    Inventors: Jaap Boksem, Detlef Beckers
  • Publication number: 20230296536
    Abstract: Embodiments of the present invention provide an X-ray collimator for collimating an incident X-ray beam by limiting divergence of the incident X-ray beam, the X-ray collimator having a variable acceptance angle, an X-ray analysis apparatus comprising an X-ray collimator having a variable acceptance angle and a method of using the X-ray analysis apparatus. The X-ray analysis apparatus comprises a position-sensitive X-ray detector, and the X-ray collimator is arranged between the sample and the position-sensitive X-ray detector to limit axial divergence of X-rays from the sample.
    Type: Application
    Filed: March 16, 2023
    Publication date: September 21, 2023
    Inventors: Vladimir Kogan, Detlef Beckers, Alexander Kharchenko
  • Publication number: 20230270394
    Abstract: The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 ?m.
    Type: Application
    Filed: August 30, 2022
    Publication date: August 31, 2023
    Inventors: Detlef Beckers, Alexander Kharchenko, Milen Gateshki
  • Publication number: 20230258584
    Abstract: The present invention relates to sample holder for holding a sample. The sample holder comprises a body having an incident surface and an opening in the body for receiving a sample. When the sample is irradiated with X-rays the incident surface of the sample holder may also be irradiated, especially at low incident angles. To reduce background scattering from the incident surface, the incident surface comprises a protrusion for blocking X-rays.
    Type: Application
    Filed: August 26, 2021
    Publication date: August 17, 2023
    Inventors: Milen Gateshki, Detlef BECKERS, Jan Vugteveen
  • Publication number: 20220187224
    Abstract: The sample mounting system comprises a sample holder and a sample stage having a platform for supporting the sample holder. The sample can be fixed to the sample holder by a mount. The sample holder comprises a holder reference portion, which co-operates with a corresponding reference portion of the sample stage (the stage reference portion) to align the sample holder with the sample stage. When the sample holder is positioned on the platform such that the stage reference portion and the holder reference portion engage each other, the sample holder is aligned with the sample stage.
    Type: Application
    Filed: December 10, 2021
    Publication date: June 16, 2022
    Inventors: Jaap BOKSEM, Detlef BECKERS
  • Publication number: 20220163466
    Abstract: A beam shaping apparatus (10) for use in an X-ray analysis device (40). The beam shaping apparatus processes an input N beam (32) from an X-ray beam source (20), and generates an output beam (34) with an output beam shape for irradiating a sample (112) held by a sample holder (22) of the X-ray analysis device. Movement of the output beam shape is controlled in dependence upon a varying tilt angle (?) of the sample (112), this defined by a tilt position of the sample holder (22).
    Type: Application
    Filed: April 3, 2020
    Publication date: May 26, 2022
    Inventors: Milen GATESHKI, Alexander KHARCHENKO, Detlef BECKERS, Nicholas NORBERG
  • Patent number: 11035805
    Abstract: An X-ray analysis apparatus comprises an X-ray source configured to irradiate a sample with an incident X-ray beam. A first beam mask component is arranged between the X-ray source and the sample. The first beam mask component has a first opening for limiting the size of the incident X-ray beam. When the first beam mask component is in a first configuration, the first opening is arranged in the incident X-ray beam. The first beam mask component further comprises a second opening. When the first beam mask component is in a second configuration, the second opening is arranged in the incident X-ray beam. The second opening does not limit the size of the incident X-ray beam. A controller is configured to control a first beam mask component actuator to change the configuration of the first beam mask component between the first configuration and the second configuration by moving the first beam mask component in a plane intersected by the incident X-ray beam.
    Type: Grant
    Filed: April 12, 2019
    Date of Patent: June 15, 2021
    Assignee: MALVERN PANALYTICAL B.V.
    Inventors: Detlef Beckers, Milen Gateshki, Jaap Boksem
  • Patent number: 10900912
    Abstract: The X-ray analysis apparatus of the present invention comprises a sample stage for supporting a sample, a goniometer having an axis of rotation, and an X-ray detector arranged to be rotatable about the axis of rotation of the goniometer, wherein the X-ray detector is arranged to receive X-rays from the sample directed along an X-ray beam path. The X-ray analysis apparatus further comprises a first collimator, a second collimator and a third collimator each having a first configuration and a second configuration. In its first configuration, the collimator is arranged in the X-ray beam path. In its second configuration the collimator is arranged outside of the X-ray beam path. A first actuator arrangement is configured to move the first collimator and the second collimator between the first configuration and the second configuration by moving the first collimator and the second collimator in a lateral direction that intersects the X-ray beam path.
    Type: Grant
    Filed: April 15, 2019
    Date of Patent: January 26, 2021
    Assignee: MALVERN PANALYTICAL B.V.
    Inventors: Detlef Beckers, Milen Gateshki, Jaap Boksem, Fabio Masiello
  • Patent number: 10782252
    Abstract: An X-ray analysis apparatus and method. The apparatus comprises an adjustable slit (210) between an X-ray source (4) and a sample (6); and optionally a further slit (220, 220a). A controller (17) is configured to control a width of the adjustable slit, between a first width, a larger second width, and an even larger third width. At the first and second widths: the adjustable slit (210) limits the divergence of the incident beam and thereby limits an area of the sample that is irradiated; and the further slit (220) does not limit the divergence of the incident beam. At the third width: the adjustable slit (210) does not limit the divergence of the incident beam, and the further slit (220) limits the divergence of the incident beam and thereby limits the area of the sample that is irradiated. Alternatively, at the third width, the adjustable slit (210) continues to limit the area irradiated.
    Type: Grant
    Filed: April 12, 2019
    Date of Patent: September 22, 2020
    Assignee: MALVERN PANALYTICAL B.V.
    Inventors: Milen Gateshki, Detlef Beckers
  • Patent number: 10764400
    Abstract: A resource sharing system is for sharing local computing resources on devices within a medical network. The sharing system including a plurality of distributed devices, registered in the system and interconnected by a network. Each device includes at least one module communicating via a device-specific interface for providing a resource locally on the device. The device is provided with a device-specific service host for providing local resources to remote devices and for accessing foreign resources of at least one remote device. Further, a device, a method and a computer program product are disclosed.
    Type: Grant
    Filed: November 27, 2018
    Date of Patent: September 1, 2020
    Assignee: Siemens Healthcare GmbH
    Inventor: Detlef Becker
  • Patent number: 10753890
    Abstract: An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.
    Type: Grant
    Filed: March 6, 2018
    Date of Patent: August 25, 2020
    Assignee: MALVERN PANALYTICAL B.V.
    Inventors: Detlef Beckers, Alexander Kharchenko, Milen Gateshki, Eugene Reuvekamp
  • Publication number: 20190317030
    Abstract: An X-ray analysis apparatus comprises an X-ray source configured to irradiate a sample with an incident X-ray beam. A first beam mask component is arranged between the X-ray source and the sample. The first beam mask component has a first opening for limiting the size of the incident X-ray beam. When the first beam mask component is in a first configuration, the first opening is arranged in the incident X-ray beam. The first beam mask component further comprises a second opening. When the first beam mask component is in a second configuration, the second opening is arranged in the incident X-ray beam. The second opening does not limit the size of the incident X-ray beam. A controller is configured to control a first beam mask component actuator to change the configuration of the first beam mask component between the first configuration and the second configuration by moving the first beam mask component in a plane intersected by the incident X-ray beam.
    Type: Application
    Filed: April 12, 2019
    Publication date: October 17, 2019
    Inventors: Detlef BECKERS, Milen GATESHKI, Jaap BOKSEM
  • Publication number: 20190317029
    Abstract: The X-ray analysis apparatus of the present invention comprises a sample stage for supporting a sample, a goniometer having an axis of rotation, and an X-ray detector arranged to be rotatable about the axis of rotation of the goniometer, wherein the X-ray detector is arranged to receive X-rays from the sample directed along an X-ray beam path. The X-ray analysis apparatus further comprises a first collimator, a second collimator and a third collimator each having a first configuration and a second configuration. In its first configuration, the collimator is arranged in the X-ray beam path. In its second configuration the collimator is arranged outside of the X-ray beam path. A first actuator arrangement is configured to move the first collimator and the second collimator between the first configuration and the second configuration by moving the first collimator and the second collimator in a lateral direction that intersects the X-ray beam path.
    Type: Application
    Filed: April 15, 2019
    Publication date: October 17, 2019
    Inventors: Detlef BECKERS, Milen GATESHKI, Jaap BOKSEM, Fabio MASIELLO
  • Publication number: 20190317031
    Abstract: An X-ray analysis apparatus and method. The apparatus comprises an adjustable slit (210) between an X-ray source (4) and a sample (6); and optionally a further slit (220, 220a). A controller (17) is configured to control a width of the adjustable slit, between a first width, a larger second width, and an even larger third width. At the first and second widths: the adjustable slit (210) limits the divergence of the incident beam and thereby limits an area of the sample that is irradiated; and the further slit (220) does not limit the divergence of the incident beam. At the third width: the adjustable slit (210) does not limit the divergence of the incident beam, and the further slit (220) limits the divergence of the incident beam and thereby limits the area of the sample that is irradiated. Alternatively, at the third width, the adjustable slit (210) continues to limit the area irradiated.
    Type: Application
    Filed: April 12, 2019
    Publication date: October 17, 2019
    Inventors: Milen GATESHKI, Detlef BECKERS
  • Patent number: 10359376
    Abstract: A sample holder 2 for holding a capillary 40 for X-ray analysis has a first thermal transport member 36 on the base portion 14 on one side of a longitudinal slit 12 and a second thermal transport member 38 on the base portion 16 on the other side. The thermal transport members 36, 38 are compressed between a frame 30 and the base portion 14, 16 in the transverse direction to urge the edges of the first and second thermal transport members together, to hold a capillary 40 longitudinally aligned with the longitudinal slit 12.
    Type: Grant
    Filed: July 20, 2016
    Date of Patent: July 23, 2019
    Assignee: MALVERN PANALYTICAL B.V.
    Inventors: Vladimir Kogan, Detlef Beckers
  • Patent number: 10352881
    Abstract: Apparatus for computed tomography is described that is also suitable for X-ray diffraction. The computed tomography measurement uses a line focus 8 and passes the X-rays from the line focus through a perpendicular slit 22 and then through a sample onto a two dimensional detector. A plurality of images are taken, each with the sample rotated about a rotation axis 14 by a different amount, and combined to create a computed tomography image.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: July 16, 2019
    Assignee: MALVERN PANALYTICAL B.V.
    Inventors: Milen Gateshki, Detlef Beckers
  • Publication number: 20190166227
    Abstract: A resource sharing system is for sharing local computing resources on devices within a medical network. The sharing system including a plurality of distributed devices, registered in the system and interconnected by a network. Each device includes at least one module communicating via a device-specific interface for providing a resource locally on the device. The device is provided with a device-specific service host for providing local resources to remote devices and for accessing foreign resources of at least one remote device. Further, a device, a method and a computer program product are disclosed.
    Type: Application
    Filed: November 27, 2018
    Publication date: May 30, 2019
    Applicant: Siemens Healthcare GmbH
    Inventor: Detlef BECKER
  • Publication number: 20180259464
    Abstract: An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.
    Type: Application
    Filed: March 6, 2018
    Publication date: September 13, 2018
    Inventors: Detlef Beckers, Alexander Kharchenko, Milen Gateshki, Eugene Reuvekamp
  • Publication number: 20180180560
    Abstract: Apparatus for computed tomography is described that is also suitable for X-ray diffraction. The computed tomography measurement uses a line focus 8 and passes the X-rays from the line focus through a perpendicular slit 22 and then through a sample onto a two dimensional detector. A plurality of images are taken, each with the sample rotated about a rotation axis 14 by a different amount, and combined to create a computed tomography image.
    Type: Application
    Filed: December 27, 2016
    Publication date: June 28, 2018
    Inventors: Milen GATESHKI, Detlef BECKERS
  • Publication number: 20180024081
    Abstract: A sample holder 2 for holding a capillary 40 for X-ray analysis has a first thermal transport member 36 on the base portion 14 on one side of a longitudinal slit 12 and a second thermal transport member 38 on the base portion 16 on the other side. The thermal transport members 36, 38 are compressed between a frame 30 and the base portion 14, 16 in the transverse direction to urge the edges of the first and second thermal transport members together, to hold a capillary 40 longitudinally aligned with the longitudinal slit 12.
    Type: Application
    Filed: July 20, 2016
    Publication date: January 25, 2018
    Inventors: Vladimir Kogan, Detlef Beckers