Patents by Inventor Deuk Rak LEE

Deuk Rak LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • NOVEL NAPHTHALIMIDE SULFONATE DERIVATIVE, AND PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION EACH COMPRISING SAME
    Publication number: 20240085786
    Abstract: The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition each comprising same and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition each comprising same, wherein the compound has excellent absorbance for light of i-line (365 nm) wavelength, is greatly easy to prepare into a polymerizable composition due to very high solubility in an organic solvent, has good thermal stability, and shows a favorable acid generation rate.
    Type: Application
    Filed: December 28, 2021
    Publication date: March 14, 2024
    Applicant: SAMYANG CORPORATION
    Inventors: Chun Rim OH, Dae Hyuk CHOI, Yu Na CHOI, Deuk Rak LEE, Ji Eun CHOI, Ki Tae KANG, Min Jung KIM, Won Jung LEE, Chi Wan LEE
  • Method for the synthesis of 2,5-furandicarboxylic acid
    Patent number: 11795154
    Abstract: The present invention relates to a method for the synthesis of 2,5-furandicarboxylic acid, and more specifically, the present invention relates to a more efficient and economical method capable of preparing 2,5-furandicarboxylic acid having various functions with high purity and high yield, even without using a transition metal catalyst.
    Type: Grant
    Filed: March 20, 2020
    Date of Patent: October 24, 2023
    Assignees: SAMYANG CORPORATION, RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Chun Rim Oh, Deuk Rak Lee, Won Jung Lee, Chi Wan Lee, Ji Eun Choi, Young Sug Kim, Jung Woon Yang, Tae Woo Lee
  • NOVEL NAPHTHALIMIDE SULFONATE DERIVATIVE, AND PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION WHICH COMPRISE SAME
    Publication number: 20230331680
    Abstract: The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition which comprise same, and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition which comprise same, the compound having an excellent absorbance of light with an i-line wavelength (365 nm), having a high solubility in an organic solvent, having excellent thermal stability, and exhibiting a good acid generation rate.
    Type: Application
    Filed: September 29, 2021
    Publication date: October 19, 2023
    Applicant: SAMYANG CORPORATION
    Inventors: Chun Rim OH, Dae Hyuk CHOI, Min Jung KIM, Deuk Rak LEE, Won Jung LEE, Yu Na CHOI, Ji Eun CHOI
  • METHOD FOR THE SYNTHESIS OF 2,5-FURANDICARBOXYLIC ACID
    Publication number: 20220162179
    Abstract: The present invention relates to a method for the synthesis of 2,5-furandicarboxylic acid, and more specifically, the present invention relates to a more efficient and economical method capable of preparing 2,5-furandicarboxylic acid having various functions with high purity and high yield, even without using a transition metal catalyst.
    Type: Application
    Filed: March 20, 2020
    Publication date: May 26, 2022
    Applicants: SAMYANG CORPORATION, RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Chun Rim OH, Deuk Rak LEE, Won Jung LEE, Chi Wan LEE, Ji Eun CHOI, Young Sug KIM, Jung Woon YANG, Tae Woo LEE