Patents by Inventor Devika Sil

Devika Sil has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200243383
    Abstract: The present invention provides interconnects with self-forming wrap-all-around graphene barrier layer. In one aspect, a method of forming an interconnect structure is provided. The method includes: patterning at least one trench in a dielectric; forming an interconnect in the at least one trench embedded in the dielectric; and forming a wrap-all-around graphene barrier surrounding the interconnect. An interconnect structure having a wrap-all-around graphene barrier is also provided.
    Type: Application
    Filed: January 30, 2019
    Publication date: July 30, 2020
    Inventors: Huai Huang, Takeshi Nogami, Alfred Grill, Benjamin D. Briggs, Nicholas A. Lanzillo, Christian Lavoie, Devika Sil, Prasad Bhosale, James Kelly
  • Publication number: 20200234949
    Abstract: A method of fabricating a dielectric film includes depositing a first precursor on a substrate. The first precursor includes a cyclic carbosiloxane group comprising a six-membered ring. The method also includes depositing a second precursor on the substrate. The first precursor and the second precursor form a preliminary film on the substrate, and the second precursor includes silicon, carbon, and hydrogen. The method further includes exposing the preliminary film to energy from an energy source to form a porous dielectric film.
    Type: Application
    Filed: January 18, 2019
    Publication date: July 23, 2020
    Inventors: Benjamin D. Briggs, Donald F. Canaperi, Huy Cao, Thomas J. Haigh, JR., Son Nguyen, Hosadurga Shobha, Devika Sil, Han You