Patents by Inventor Devin SCHMITT

Devin SCHMITT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Effect pigments having a reflective core and semiconductor layers
    Patent number: 12290579
    Abstract: Disclosed herein is an effect pigment having a layer stack which comprises a highly reflective metallic flake having a first major interface and opposed to this first interface a second major interface, and at least one side surface and directly adjacent on one or of both of these major interfaces a layer of a semiconducting material having an average atomic composition of: a) Si(1-x)Snx, wherein 0<x<0.90 or b) Ge(1-y)Sny, wherein 0<y?0.80 or c) Si(1-m-n)GemSnn, wherein 0<m<1.00, 0<n<1.00 and with the proviso that m+n<1.00.
    Type: Grant
    Filed: December 6, 2022
    Date of Patent: May 6, 2025
    Assignee: ECKART AMERICA CORPORATION
    Inventors: Devin Schmitt, Jonglak Choi
  • RADAR TRANSPARENT, OPTICALLY REFLECTIVE SEMICONDUCTOR EFFECT PIGMENTS
    Publication number: 20250122380
    Abstract: This invention deal with a flaky effect pigment comprising as optical active layer a single platelet consisting of a semiconductor material with a band gap in a range of 0.1 to 2.5 eV and having an average atomic composition of: a) Si(1-x)Gex, wherein 0<x<1.00 or b) Si(1-y)Sny, wherein 0<y<0.90 or c) Ge(1-z)Sn2, wherein 0<z?0.60 or d) Si(1-m-n)GemSnn, wherein 0<m<1.00, 0<n<1.00 with the provisos that x<1.00; y<1.00, z<1.00 and m+n<1.00. These effect pigments exhibit attractive optical properties and are radartransparent.
    Type: Application
    Filed: September 29, 2022
    Publication date: April 17, 2025
    Inventors: Devin Schmitt, Christopher Hilbrich, Jonglak Choi
  • DIFFRACTIVE EFFECT PIGMENTS HAVING A REFLECTIVE CORE AND SEMICONDUCTOR COATINGS
    Publication number: 20250073135
    Abstract: Disclosed herein is a flaky diffractive effect pigment having a diffractive structure and comprising a flake of a highly reflective material having a first major interface and opposed to this first interface a second major interface, and at least one side surface and directly adjacent on one or of both of these major interfaces a layer of a semiconducting material having a bandgap of 0.7 to 2.5 eV. The diffractive effect pigment may be further coated with a coating which is optically non-active in the visible wavelength region.
    Type: Application
    Filed: December 6, 2022
    Publication date: March 6, 2025
    Inventor: Devin Schmitt
  • EFFECT PIGMENTS HAVING A REFLECTIVE CORE AND SEMICONDUCTOR LAYERS
    Publication number: 20250049650
    Abstract: Disclosed herein is an effect pigment having a layer stack which comprises a highly reflective metallic flake having a first major interface and opposed to this first interface a second major interface, and at least one side surface and directly adjacent on one or of both of these major interfaces a layer of a semiconducting material having an average atomic composition of: a) Si(1-x)Snx, wherein 0<x<0.90 or b) Ge(1-y)Sny, wherein 0<y?0.80 or c) Si(1-m-n)GemSnn, wherein 0<m<1.00, 0<n<1.00 and with the proviso that m+n<1.00.
    Type: Application
    Filed: December 6, 2022
    Publication date: February 13, 2025
    Inventors: Devin Schmitt, Jonglak Choi
  • CHEMICAL MECHANICAL PLANARIZATION PADS WITH CONSTANT GROOVE VOLUME
    Publication number: 20240238937
    Abstract: A chemical mechanical polishing pad includes a surface portion of a first material. The surface portion includes a plurality of grooves. A first portion of the grooves are exposed grooves located at a surface of the chemical mechanical polishing pad. A second portion of the grooves are buried grooves embedded below the surface of the chemical mechanical polishing pad, such that, during use of the chemical mechanical polishing pad, one or more of the buried grooves are exposed at the surface.
    Type: Application
    Filed: March 5, 2024
    Publication date: July 18, 2024
    Inventors: Paul Andre LEFEVRE, Devin SCHMITT, Jaeseok LEE, Eric S. MOYER, Holland HODGES
  • Chemical mechanical planarization pads with constant groove volume
    Patent number: 11938584
    Abstract: A chemical mechanical polishing pad includes a surface portion of a first material. The surface portion includes a plurality of grooves. A first portion of the grooves are exposed grooves located at a surface of the chemical mechanical polishing pad. A second portion of the grooves are buried grooves embedded below the surface of the chemical mechanical polishing pad, such that, during use of the chemical mechanical polishing pad, one or more of the buried grooves are exposed at the surface.
    Type: Grant
    Filed: May 7, 2020
    Date of Patent: March 26, 2024
    Assignee: CMC MATERIALS LLC
    Inventors: Paul Andre Lefevre, Devin Schmitt, Jaeseok Lee, Eric S. Moyer, Holland Hodges
  • EFFECT PIGMENTS HAVING A REFLECTIVE CORE
    Publication number: 20230287219
    Abstract: The present invention relates to an effect pigment having optically active layers consisting of a flake of a highly reflective material with directly adjacent on one side or on both sides a layer of a semiconducting material having a bandgap of 0.1 to 3.5 eV. The effect pigment may be further coated with a coating which is optically non-active in the visible wavelength region.
    Type: Application
    Filed: June 21, 2021
    Publication date: September 14, 2023
    Inventor: Devin Schmitt
  • CHEMICAL MECHANICAL PLANARIZATION PADS WITH CONSTANT GROOVE VOLUME
    Publication number: 20200353588
    Abstract: A chemical mechanical polishing pad includes a surface portion of a first material. The surface portion includes a plurality of grooves. A first portion of the grooves are exposed grooves located at a surface of the chemical mechanical polishing pad. A second portion of the grooves are buried grooves embedded below the surface of the chemical mechanical polishing pad, such that, during use of the chemical mechanical polishing pad, one or more of the buried grooves are exposed at the surface.
    Type: Application
    Filed: May 7, 2020
    Publication date: November 12, 2020
    Inventors: Paul Andre LEFEVRE, Devin SCHMITT, Jaeseok LEE, Eric S. MOYER, Holland HODGES