Patents by Inventor Dewei CHU

Dewei CHU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240097242
    Abstract: A functional layer for a moisture electric generating battery cell wherein the functional layer includes graphene oxide having a ratio of C?O bonds to C—C bonds of more than 1:9. The functional layer include treated graphene oxide having an interlayer spacing that is greater than the interlayer spacing of graphene oxide from which the treated graphene oxide is prepared. The functional layer consists of graphene oxide and a polymer binder that is selected to bond with an electrically conductive substrate. The polymer binder may be one or more of: PVA, PVB, PMMA or PVP. The graphene oxide and polymer binder are treated with acid such as HCl, H2SO4 or HNO3. The electrically conductive substrate forming an electrode may be mounted onto a further substrate, for use as a moist-electric generation (MEG) in an electronic device. The electronic device is configured to have a surface positioned in contact with the skin of a subject when in use.
    Type: Application
    Filed: January 25, 2022
    Publication date: March 21, 2024
    Inventors: Dewei CHU, Tao WAN
  • Publication number: 20230048493
    Abstract: Methods for the manufacture of stable strontium titanate nanocube sols are disclosed. The sols are useful in the manufacture of switchable layers suitable for RRAM applications and the switching performance is stable and reproducible. The RRAM layers comprise a mixture of strontium titanate nanocubes and surfactant.
    Type: Application
    Filed: July 3, 2020
    Publication date: February 16, 2023
    Inventors: Dewei Chu, Tao Wan, Sean Suixiang Li
  • Patent number: 10529921
    Abstract: A memory structure for use in a memory device comprising at least one first layer and at least one second layer: the at least one first layer comprises a plurality of a first element, and the at least one second layer comprises a plurality of a second element; and, wherein the memory structure has an electrical resistive state that can be changed in response to an electromotive force being applied thereto.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: January 7, 2020
    Assignee: Australian Advanced Materials Pty Ltd
    Inventors: Dewei Chu, Sean Suixiang Li
  • Publication number: 20190341549
    Abstract: Non-volatile Resistive RAM devices are described prepared using various nanocube dispersions and dispersion based deposition techniques including ink jet printing. Stretchable Resistive RAM devices are described that retain their switching properties after repeated stretch and relaxation cycles and show highly stable ON/OFF ratios after each cycle in the stretched and relaxed state.
    Type: Application
    Filed: December 7, 2017
    Publication date: November 7, 2019
    Applicant: Australian Advanced Materials Pty Ltd
    Inventors: Charles Murphy, Sean Suixiang Li, Dewei Chu, Nicholas John White
  • Publication number: 20180201831
    Abstract: A method of forming oxide quantum dots is disclosed. The method may provide for the highly controlled formation of the oxide quantum dots. A composition comprising oxide quantum dots is also disclosed. The oxide quantum dots may be considered to be highly crystalline, allowing the oxide quantum dots and composition to be utilised at ambient conditions without requiring subsequent high temperature calcination. The transparent and conductive oxide quantum dots may find particular application in the large scale coating of a variety of substrates, including silicon, glass, polymers, or composites, etc., and may be used in windscreens, or windows of vehicles (such as automobiles, trains, aeroplanes, etc.) and/or buildings, etc., which require conductive capabilities, such as for the purposes of de-fogging or de-icing.
    Type: Application
    Filed: July 29, 2016
    Publication date: July 19, 2018
    Applicants: Newsouth Innovations Pty Limited, Fuzhou Danlaw Xicheng Electronic Technology Co. Ltd.
    Inventors: Sean Suixiang LI, Dewei CHU, James Robert HENDERSON
  • Publication number: 20180175291
    Abstract: A memory structure for use in a memory device comprising at least one first layer and at least one second layer: the at least one first layer comprises a plurality of a first element, and the at least one second layer comprises a plurality of a second element; and, wherein the memory structure has an electrical resistive state that can be changed in response to an electromotive force being applied thereto.
    Type: Application
    Filed: June 3, 2016
    Publication date: June 21, 2018
    Inventors: Dewei CHU, Sean Suixiang LI