Abstract: A coating and developing device comprises a front end module (100), a process station (200), and an interface station (300) that are successively connected, wherein the process station (200) comprises a coating unit (210), a developing unit (220), at least one transversely moving of mobile conveying part (230), and at least one side robot (R0). After a substrate has been processed in the coating unit (210), the substrate is transferred to the mobile conveying part (230) by the at least one side robot (R0), and the substrate is transferred to the interface station (300) by the mobile conveying part (230). After the substrate has been processed in the developing unit (220), the substrate is transferred to the mobile conveying part (230) by the at least one side robot (R0), and the substrate is transferred to the front end module (100) by the mobile conveying part (230).

Abstract: Disclosed is a wafer backside cleaning method, comprising: using a wafer clamping part to hold a wafer, a gap being formed between the wafer clamping part and the wafer; injecting a protective gas into the gap at a first flow rate; adjusting the flow rate of the protective gas from the first flow rate to a second flow rate, and rotating the wafer under the drive of the first rotational speed of the wafer clamping part to clean the backside of the wafer; adjusting the rotational speed of the wafer clamping part from the first rotational speed to a second rotational speed, so that the wafer is driven by the wafer clamping part to rotate for the drying process; stopping rotating the wafer, adjusting the flow rate of the protective gas to the first flow rate again from the second flow rate, and then taking out the wafer; and stopping injecting the protective gas after the wafer is taken out.

Abstract: A drying apparatus is based on supercritical fluid. The drying apparatus includes: an upper cover; a base, arranged below the upper cover and the base and the upper cover; a substrate tray, arranged on the base; a first fluid supply tube, arranged on the top wall of the upper cover; a fluid disturbance plate, arranged below the first fluid supply tube; a second fluid supply tube, arranged on a first side wall of the upper cover; and a fluid discharge tube, arranged on a second side wall of the upper cover. The inner space of the closed chamber can be minimized by using the drying apparatus, thereby saving the usage amount of the supercritical fluid, and reducing the usage costs.

Abstract: An apparatus for cleaning semiconductor wafers includes a plurality of load ports; at least one first tank, containing cleaning chemical, configured to implement batch cleaning process; one or more second tanks, containing cleaning liquid, configured to implement batch cleaning process; and one or more single wafer cleaning modules. The apparatus further includes: a first turnover device, configured to rotate the one or more wafers from horizontal plane to vertical plane so that the one or more wafers can be vertically transferred to the at least one first tank; and a second turnover device, configured to rotate the one or more wafers from vertical plane to horizontal plane so that the one or more wafers can be horizontally transferred to the one or more single wafer cleaning modules.

Abstract: The invention provides an apparatus for cleaning semiconductor wafers. The apparatus includes at least one first tank, containing cleaning chemical, configured to implement batch cleaning process; one or more second tanks, containing cleaning liquid, configured to implement batch cleaning process; one or more single wafer cleaning modules, configured to implement single wafer cleaning and drying processes; a plurality of robots, configured to transfer one or more wafers to the at least one first tank and the one or more second tanks successively, and then to the one or more single wafer cleaning modules; and a controller, configured to control the plurality of robots to transfer the one or more wafers to the at least one first tank and the one or more second tanks successively, and then to the one or more single wafer cleaning modules.

Abstract: Methods and an apparatus for removing particles or photoresist on substrates. In an embodiment, a method comprises the following steps: transferring one or more substrates into a DIO3 solution accommodated in a DIO3 bath; after the one or more substrates are processed in the DIO3 bath, taking the one or more substrates out from the DIO3 bath and transferring the one or more substrates into a SPM solution accommodated in a SPM bath; after the one or more substrates are processed in the SPM bath, taking the one or more substrates out from the SPM bath and rinsing the one or more substrates; and transferring the one or more substrates to one or more single chambers to perform single substrate cleaning and drying process. The method combines DIO3 and SPM in one cleaning sequence, which can remove particles or photoresist, especially remove photoresist treated by medium dose or high dose of ion implantation.

Abstract: Methods and apparatuses for cleaning semiconductor wafers(202).

Abstract: A traditional Chinese medicine immunopotentiator prepared from mulberry leaves polysaccharide and eucommia polysaccharide. The immunopotentiator can stimulate proliferation of chicken lymphocytes in vitro. When used together with newcastle disease vaccine to immunize chickens, the immunopotentiator can increase serum antibody titer, promote proliferation of lymphocytes, and enhance cellular immunity and humoral immunity of the chickens. When used together with porcine productive and respiratory syndrome vaccine to immunize piglets, the immunopotentiator can increase the serum antibody titer. When used together with the porcine productive and respiratory syndrome vaccine to immunize layers, the immunopotentiator can increase porcine productive and respiratory syndrome virus yolk antibody titer and improve immune effects of the vaccine.

Abstract: A traditional Chinese medicine immunopotentiator prepared from mulberry leaves polysaccharide and eucommia polysaccharide. The immunopotentiator can stimulate proliferation of chicken lymphocytes in vitro. When used together with newcastle disease vaccine to immunize chickens, the immunopotentiator can increase serum antibody titer, promote proliferation of lymphocytes, and enhance cellular immunity and humoral immunity of the chickens. When used together with porcine productive and respiratory syndrome vaccine to immunize piglets, the immunopotentiator can increase the serum antibody titer. When used together with the porcine productive and respiratory syndrome vaccine to immunize layers, the immunopotentiator can increase porcine productive and respiratory syndrome virus yolk antibody titer and improve immune effects of the vaccine.

Abstract: The present invention relates to a peptide having one or more stable, internally-constrained HBS ?-helices, where the peptide mimics at least a portion of a class I C-peptide helix or at least a portion of a class I N-peptide helix of a viral (e.g., HIV-I) coiled-coil assembly. Methods of inhibiting viral infectivity of a subject by administering these peptides are also disclosed.

Abstract: Disclosed are inhibitors of retroviral growth of formula (I), that are useful in treatment of retroviral infections such as HIV. Also disclosed are a composition comprising a pharmaceutically acceptable carrier and at least one compound or salt of the invention, a method for inactivating a virus, a method for dissociating a metal ion from a zinc finger-containing protein, and a method for inhibiting the transmission of a virus.

Abstract: The present invention relates to a peptide having one or more stable, internally-constrained HBS ?-helices, where the peptide mimics at least a portion of a class I C-peptide helix or at least a portion of a class I N-peptide helix of a viral (e.g., HIV-I) coiled-coil assembly. Methods of inhibiting viral infectivity of a subject by administering these peptides are also disclosed.