Abstract: A method for making a color filter includes the steps of: (1) providing a removable mold having an intaglio surface with a plurality of groove units formed therein, the groove units being arranged in predetermined pattern; (2) attaching the removable mold to a transparent substrate, thereby the intaglio surface and the transparent substrate cooperatively forming a plurality of channel units; (3) filling the channel units with a photopolymer solution containing colorants; (4) applying an ultraviolet light to the photopolymer solution through the transparent substrate so as to cure the polymer to the transparent substrate; and (5) removing the mold with the patterned polymer layer formed on the transparent substrate. The present method circumvents the conventional troublesome and time-consuming photolithographic process for forming a color filter that has to be unduly repeated three times.

Abstract: A method for making a color filter includes the steps of: (1) providing a removable mold having an intaglio surface with a plurality of groove units formed therein, the groove units being arranged in predetermined pattern; (2) attaching the removable mold to a transparent substrate, thereby the intaglio surface and the transparent substrate cooperatively forming a plurality of channel units; (3) filling the channel units with a photopolymer solution containing colorants; (4) applying an ultraviolet light to the photopolymer solution through the transparent substrate so as to cure the polymer to the transparent substrate; and (5) removing the mold with the patterned polymer layer formed on the transparent substrate. The present method circumvents the conventional troublesome and time-consuming photolithographic process for forming a color filter that has to be unduly repeated three times.

Abstract: An improved method for preparing multiple-exposure photomasks having at least three levels of transmissivity is disclosed. A conventional bi-exposure photomask is first formed which contains a macroscopically exposed area, a microscopically exposed area, and a masked area on a transparent substrate. Then a diffractive-refractive light-scattering optical element is formed above the microscopically exposed area so as to provide an exposure area with an intermediate light transmissivity. In a preferred embodiment, the diffractive-refractive light-scattering optical element above the microscopically exposed area is formed by first forming a transparent positive photoresist above the bi-exposure photomask. The transparent positive photoresist is exposed to an irradiation from the bottom of the transparent substrate, and is developed. Finally, the transparent positive photoresist is heated to cause a melt-flow thereof which forms a concave optical element above the microscopically exposed area.

Abstract: A method of preparing a fine pattern on a substrate characterized by the dry development of a photoimaged, etch resistant pattern on a receiver substrate. The pattern is transferred from a carrier substrate to the receiver substrate via a hardenable liquid adhesive. This method eliminates adverse reflection effects caused from substrate topography in single layer photoresist systems and also avoids time consuming multiple coatings in multilayer photoresist systems used to make fine patterns. The method is particularly useful in the fabrication of integrated circuits and fine dimension patterns.

Abstract: A method of preparing a fine pattern on a substrate characterized by the dry development of a photoimaged, etch resistant pattern on a receiver substrate. The pattern is transferred from a carrier substrate to the receiver substrate via a hardenable liquid adhesive. This method eliminates adverse reflection effects caused from substrate topography in single layer photoresist systems and also avoids time consuming multiple coatings in multilayer photoresist systems used to make fine patterns. The method is particularly useful in the fabrication of integrated circuits and fine dimension patterns.

Abstract: An electrophoretic positive working photosensitive composition for producing a photoresist pattern on metal base plate comprises a photosensitive compound, in which a photosensitive quinone diazide group is grafted on a polyester, and an acrylic copolymer containing carboxyl group, the composition forms a smooth photoresist film on the plate and has a good adhesion to the surface that no pinehole is found.

Abstract: A positively working photosensitive composition is disclosed useful for making positively working lithographic printing plates of exceptional wear, printing and solvent-resistant characteristics. The positively working photosensitive composition essentially contains a .beta.-dicarbonyl group and a quinone diazide group.

Abstract: An alkaline-solution-developable liquid image-producing composition useful as a permanent protective layer for printed circuit boards is disclosed comprising at least: (1) an acrylic copolymer with hyroxy group, carboxyl group and branched unsaturated carbon double bond. Its number average molecular weight is 3,000 to 10,000 and its acid value is at least 30 mg KOH/g; (2) a photo reactive monomer with hydroxy group, the number of the unsaturated carbon double bond functional groups should be not less than 2; (3) a melamine compound; and (4) a free radical photo initiator.

Abstract: An aqueous alkali developable photoresist composition consists of (a) a carboxyl group-containing polymeric binder, (b) 1-15% by weight of a photoinitiator based on the binder, (c) 20-100% by weight based on the binder, of a photo reactive monomer or oligomer containing at least two ethylenically unsaturated double bonds, and (d) 0.05-5% by weight based on the binder of a weak alkali soluble or dispersible thiol compound represented by(X).sub.a R--SH).sub.bwhere a, b are integers equal to or greater than 1, R is an organic moiety of molecular weight less than 500, and X is a carboxyl group-containing moiety or hydrophilic organic polymeric segment with less than 100 repeating unit.