Patents by Inventor Diana Jean Bendz

Diana Jean Bendz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for stripping resist layers from substrates
    Patent number: 4078102
    Abstract: Organic polymer resist layers are stripped from substrates by treating the layers with a mixture of an aldehyde or a ketone and an alcoholic solution of a compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydroxides and carbonates.
    Type: Grant
    Filed: October 29, 1976
    Date of Patent: March 7, 1978
    Assignee: International Business Machines Corporation
    Inventors: Diana Jean Bendz, Gerald Andrei Bendz
  • Resist process
    Patent number: 3930857
    Abstract: A resist mask, whose configuration is changed during processing, is formed by varying the exposure energy across a resist layer and then conducting successive development steps using developers having increasing solvent power to remove progressively more of the resist layer with each step.
    Type: Grant
    Filed: May 3, 1973
    Date of Patent: January 6, 1976
    Assignee: International Business Machines Corporation
    Inventors: Diana Jean Bendz, Gerald Andrei Bendz, Anne Marie Wildman