Patents by Inventor Diana M. Xiaobing

Diana M. Xiaobing has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etching aluminum and its alloys using HC1, C1-containing etchant and N.sub. 2
    Patent number: 5387556
    Abstract: A process for etching aluminum from a substrate, where portions of the aluminum are protected by a resist material, is described. The substrate is placed into a chamber and a process gas comprising HCl, Cl-containing etchant and N.sub.2 is introduced in the chamber. A plasma is generated in the chamber to generate from the process gas an etch gas that etches aluminum from the substrate at fast rates, with good selectivity, reduced profile microloading, and substantially only anisotropic etching.
    Type: Grant
    Filed: February 24, 1993
    Date of Patent: February 7, 1995
    Assignee: Applied Materials, Inc.
    Inventors: Diana M. Xiaobing, Charles S. Rhoades