Patents by Inventor Diane C. McCafferty

Diane C. McCafferty has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Interferometric lithographic projection apparatus
    Patent number: 7751030
    Abstract: A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The interchangeable upper optics module receives the beam and includes, sequentially, a beam splitter that splits the beam into portions, an aperture plate, and a plurality of reflecting surfaces. The lower optics module receives portions of the beam from respective ones the reflecting surfaces and directs the portions of the beam onto a substrate. Interference fringes or contact hole patterns are formed on the substrate using the portions of the beam.
    Type: Grant
    Filed: January 30, 2006
    Date of Patent: July 6, 2010
    Assignee: ASML Holding N.V.
    Inventors: Louis Markoya, Aleksandr Khmelichek, Diane C. McCafferty, Harry Sewell, Justin L. Kreuzer