Patents by Inventor Diane Elaine MARIKOYA

Diane Elaine MARIKOYA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS, A DRYER AND A METHOD OF REMOVING LIQUID FROM A SURFACE
    Publication number: 20190121247
    Abstract: A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
    Type: Application
    Filed: December 20, 2018
    Publication date: April 25, 2019
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Martinus Hendrikus Antonius LEENDERS, Sjoerd Nicolaas Lambertus DONDERS, Harry SEWELL, Louis John MARKOYA, Marcus Martinus Petrus Adrianus VERMEULEN, Diane Elaine MARIKOYA