Patents by Inventor Diane Scheele

Diane Scheele has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dynamic multi-purpose compositions for the removal of photoresists and method for its use
    Patent number: 9069259
    Abstract: Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, a secondary solvent, and less than about 3 wt. % water. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: June 30, 2015
    Assignee: Dynaloy, LLC
    Inventors: Michael Phenis, Laurl Johnson, Raymond Chan, Diane Scheele, Kimberly Pollard
  • DYNAMIC MULTI-PURPOSE COMPOSITIONS FOR THE REMOVAL OF PHOTORESISTS AND METHOD FOR ITS USE
    Publication number: 20130172225
    Abstract: Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, a secondary solvent, and less than about 3 wt. % water. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.
    Type: Application
    Filed: February 5, 2013
    Publication date: July 4, 2013
    Applicant: DYNALOY, LLC
    Inventors: Michael Phenis, Lauri Johnson, Raymond Chan, Diane Scheele, Kimberly Pollard
  • DYNAMIC MULTI-PURPOSE COMPOSITION FOR THE REMOVAL OF PHOTORESISTS AND METHODS FOR ITS USE
    Publication number: 20070111912
    Abstract: Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt. % water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.
    Type: Application
    Filed: October 23, 2006
    Publication date: May 17, 2007
    Inventors: Michael Phenis, Diane Scheele, Kimberly Pollard
  • Dynamic multi-purpose composition for the removal of photoresists and method for its use
    Publication number: 20070099805
    Abstract: Improved stripper solutions for removing photoresists from substrates are provided that typically have freezing points below about +15° C. and high loading capacities. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to two different carbon atoms. Some formulation can additionally contain a secondary solvent. Methods for use of the stripping solutions are additionally provided.
    Type: Application
    Filed: October 28, 2005
    Publication date: May 3, 2007
    Inventors: Michael Phenis, Lauri Kirkpatrick, Raymond Chan, Diane Scheele, Kimberly Pollard