Patents by Inventor Dieter Kraus

Dieter Kraus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9272408
    Abstract: A hand-held machine tool is provided. The hand-held machine tool includes a striking element that is accelerated along a working axis, and a guide for the striking element. A cushioning damper limits a motion of the striking element along the working axis and has an elastic damping ring. The damping ring has grooves running on at least one face side radial to the working axis.
    Type: Grant
    Filed: November 16, 2011
    Date of Patent: March 1, 2016
    Assignee: HILTI AKTIENGESELLSCHAFT
    Inventors: Olaf Koch, Matthias Keith, Dieter Kraus, Ali Shadavakhsh
  • Patent number: 9046794
    Abstract: In order to clean optical components (35) inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, (33) arranged to apply an electric and/or magnetic field, downstream of the heating filament (29) in the direction of flow of the hydrogen (31, 32). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam (32).
    Type: Grant
    Filed: September 16, 2010
    Date of Patent: June 2, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Hembacher, Dieter Kraus, Dirk Heinrich Ehm, Stefan-Wolfgang Schmidt, Stefan Koehler, Almut Czap, Stefan Wiesner, Hin Yiu Anthony Chung
  • Patent number: 8953145
    Abstract: An EUV (extreme ultraviolet) lithography apparatus (1) including: a housing (1a) enclosing an interior (15), at least one reflective optical element (5, 6, 8, 9, 10, 14.1 to 14.6) arranged in the interior (15), a vacuum generating unit (1b) generating a residual gas atmosphere in the interior (15), and a residual gas analyzer (18a, 18b) detecting at least one contaminating substance (17a) in the residual gas atmosphere. The residual gas analyzer (18a) has a storage device (21) having an ion trap for storing the contaminating substance (17a). Additionally, a method for detecting at least one contaminating substance by residual gas analysis of a residual gas atmosphere of an EUV lithography apparatus (1) having a housing (1a) having an interior (15), in which at least one reflective optical element (5, 6, 8, 9, 10, 14.1 to 14.6), is arranged, wherein the contaminating substance (17a) is stored in a storage device (21) in order to carry out the residual gas analysis.
    Type: Grant
    Filed: February 25, 2011
    Date of Patent: February 10, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Dieter Kraus, Dirk Heinrich Ehm, Stefan-Wolfgang Schmidt
  • Patent number: 8885141
    Abstract: An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device (15) for processing an optical element (6a), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (27), the processing device (15) includes a particle generator (30) for generating a particle beam, in particular an electron beam (30a), and/or a high-frequency generator.
    Type: Grant
    Filed: April 15, 2011
    Date of Patent: November 11, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Wolfgang Singer, Yim-Bun-Patrick Kwan, Stefan-Wolfgang Schmidt, Dirk Heinrich Ehm, Dieter Kraus, Stefan Wiesner, Stefan Koehler, Almut Czap, Hin Yiu Anthony Chung
  • Patent number: 8717531
    Abstract: A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: May 6, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Severin Waldis, Florian Bach, Daniel Benz, Armin Werber, Wilfried Noell, Dirk Heinrich Ehm, Stefan Wiesner, Dieter Kraus
  • Patent number: 8585224
    Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
    Type: Grant
    Filed: February 10, 2013
    Date of Patent: November 19, 2013
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands b.V.
    Inventors: Dirk Heinrich Ehm, Stephan Muellender, Thomas Stein, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dieter Kraus, Richard Versluis, Marcus Gerhardus Hendrikus Meijerink
  • Patent number: 8382301
    Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: February 26, 2013
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Dirk Heinrich Ehm, Stephan Muellender, Thomas Stein, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dieter Kraus, Richard Versluis, Marcus Gerhardus Hendrikus Meijerink
  • Publication number: 20120125650
    Abstract: A hand-held machine tool is provided. The hand-held machine tool includes a striking element that is accelerated along a working axis, and a guide for the striking element. A cushioning damper limits a motion of the striking element along the working axis and has an elastic damping ring. The damping ring has grooves running on at least one face side radial to the working axis.
    Type: Application
    Filed: November 16, 2011
    Publication date: May 24, 2012
    Inventors: Olaf Koch, Matthias Keith, Dieter Kraus, Ali Shadavakhsh
  • Publication number: 20120086925
    Abstract: A method for preventing contaminating gaseous substances (18) from passing through an opening (17b) in a housing (4a) of an EUV lithography apparatus (1), wherein at least one optical element for guiding EUV radiation (6) is arranged in the housing (4a). The method involves: generating at least one gas flow (21a, 21b) which deflects the contaminating substances (18, 18?), and in particular is directed counter to the flow direction (Z) thereof, in the region of the opening (17b). The gas flow (21a, 21b) and the EUV radiation (6) are generated in pulsed fashion and the pulse rate of the gas flow (21a, 21b) is defined in a manner dependent on the pulse rate of the contaminating substances (18, 18?) released under the action of the pulsed EUV radiation (6), wherein both pulse rates are preferably equal in magnitude, and wherein, in the region of the opening (17b), the gas pulses temporally overlap the pulses of the contaminating substances (18, 18?).
    Type: Application
    Filed: October 6, 2011
    Publication date: April 12, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Dieter KRAUS, Dirk Heinrich EHM, Stefan-Wolfgang SCHMIDT, Stefan WIESNER, Almut CZAP, Stefan KOEHLER, Hin Yiu Anthony CHUNG
  • Publication number: 20110279799
    Abstract: An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device (15) for processing an optical element (6a), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (27), the processing device (15) comprises a particle generator (30) for generating a particle beam, in particular an electron beam (30a), and/or a high-frequency generator.
    Type: Application
    Filed: April 15, 2011
    Publication date: November 17, 2011
    Applicant: CARL ZEISS SMT GmbH
    Inventors: Wolfgang Singer, Yim-Bun-Patrick Kwan, Stefan-Wolfgang Schmidt, Dirk Heinrich Ehm, Dieter Kraus, Stefan Wiesner, Stefan Koehler, Almut Czap, Hin Yiu Anthony Chung
  • Patent number: 8054446
    Abstract: The invention relates to an EUV lithography apparatus with at least one EUV-reflective optical surface and a cavity ringdown reflectometer adapted to determine the contamination status of the EUV-reflective optical surface for at least one contaminating substance by determining the reflectivity of the EUV-reflective optical surface for radiation at a measuring wavelength (?m). The invention further relates to a method for determining the contamination status of at least one EUV-reflective optical surface arranged in an EUV lithography apparatus for at least one contaminating substance comprising determining the reflectivity of the EUV-reflective optical surface for radiation at a measuring wavelength (?m) using a cavity ringdown reflectometer.
    Type: Grant
    Filed: August 21, 2008
    Date of Patent: November 8, 2011
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Dieter Kraus, Dirk Heinrich Ehm, Stefan-Wolfgang Schmidt
  • Publication number: 20110211179
    Abstract: An EUV (extreme ultraviolet) lithography apparatus (1) including: a housing (1a) enclosing an interior (15), at least one reflective optical element (5, 6, 8, 9, 10, 14.1 to 14.6) arranged in the interior (15), a vacuum generating unit (1b) generating a residual gas atmosphere in the interior (15), and a residual gas analyzer (18a, 18b) detecting at least one contaminating substance (17a) in the residual gas atmosphere. The residual gas analyzer (18a) has a storage device (21) having an ion trap for storing the contaminating substance (17a). Additionally, a method for detecting at least one contaminating substance by residual gas analysis of a residual gas atmosphere of an EUV lithography apparatus (1) having a housing (1a) having an interior (15), in which at least one reflective optical element (5, 6, 8, 9, 10, 14.1 to 14.6), is arranged, wherein the contaminating substance (17a) is stored in a storage device (21) in order to carry out the residual gas analysis.
    Type: Application
    Filed: February 25, 2011
    Publication date: September 1, 2011
    Applicant: CARL ZEISS SMT GmbH
    Inventors: Dieter KRAUS, Dirk Heinrich EHM, Stefan-Wolfgang SCHMIDT
  • Patent number: 7911598
    Abstract: Components (30) in the interior of an EUV lithography device for extreme ultraviolet and soft X-ray wavelength range are cleaned by igniting a plasma, adjacent to the component (30) to be cleaned, using electrodes (29), wherein the electrodes (29) are adapted to the form of the component (30) to be cleaned. The residual gas atmosphere is measured spectroscopically on the basis of the plasma. An emission spectrum is preferably recorded in order to monitor the degree of cleaning. An optical fiber cable (31) with a coupling-in optical unit (32) is advantageously used for this purpose. Moreover, in order to monitor the contamination in the gas phase within the vacuum chambers during the operation of an EUV lithography device, it is proposed to provide modules configured to initiate a gas discharge and to detect radiation emitted on account of the gas discharge. The contamination in the gas phase can be deduced from the analysis of the measured spectrum.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: March 22, 2011
    Assignee: Carl Zeiss Smt AG
    Inventors: Dieter Kraus, Dirk Heinrich Ehm, Thomas Stein, Harald Woelfle, Stefan-Wolfgang Schmidt
  • Publication number: 20110058147
    Abstract: A cleaning module for an EUV lithography device with a supply (206) for molecular hydrogen, a heating filament (210) and a line (212) for atomic and/or molecular hydrogen. The line (212) has at least one bend with a bending angle of less than 120 degrees, and has a material on its inner surface which has a low recombination rate for atomic hydrogen. The supply (206) is of flared shape at its end, which faces the heating filament (210). A gentler cleaning of optical elements is achieved with such a cleaning module, or also by exciting a cleaning gas with a cold cathode or a plasma, or by filtering out charged particles via of electrical and/or magnetic fields.
    Type: Application
    Filed: September 29, 2010
    Publication date: March 10, 2011
    Applicant: Carl Zeiss SMT AG
    Inventors: Dirk Heinrich Ehm, Julian Kaller, Stefan Schmidt, Dieter Kraus, Stefan Wiesner, Almut Czap, Hin-Yiu Anthony Chung, Stefan Koehler
  • Publication number: 20110043774
    Abstract: In order to clean optical components (35) inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, (33) arranged to apply an electric and/or magnetic field, downstream of the heating filament (29) in the direction of flow of the hydrogen (31, 32). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam (32).
    Type: Application
    Filed: September 16, 2010
    Publication date: February 24, 2011
    Applicant: Carl Zeiss SMT AG
    Inventors: Stefan HEMBACHER, Dieter Kraus, Dirk Heinrich EHM, Stefan-Wolfgang Schmidt, Stefan Koehler, Almut Czap, Stefan Wiesner, Hin Yiu Anthony Chung
  • Patent number: 7868263
    Abstract: An electrical hand-held power tool includes an assembly (2) vibrating along a vibration axis (A) during operation of the power tool, at least one, transversely projecting, vibration-decoupled pivotal side handle (3), a manual switch (4) having an actuation element (5) arranged in the side handle (3) and switchingly connectable with at least one sensor switch (8) which is located in the assembly (2) in vicinity of the handle pivot point (G), by a switching rod (7) having a switching element (6) and being pivotally supported on the side handle at a switching pivot point (S) spaced from the handle pivot point (G) and from the vibration axis (A).
    Type: Grant
    Filed: August 14, 2008
    Date of Patent: January 11, 2011
    Assignee: Hilti Aktiengesellschaft
    Inventors: Stefan Hammerstingl, Holger Cecchin, Dieter Kraus, Johann Augustin, Uto Plank
  • Publication number: 20100261120
    Abstract: A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.
    Type: Application
    Filed: February 18, 2010
    Publication date: October 14, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Severin Waldis, Florian Bach, Daniel Benz, Armin Werber, Wilfried Noell, Dirk Heinrich Ehm, Stefan Wiesner, Dieter Kraus
  • Publication number: 20100112494
    Abstract: An apparatus and method for measuring an outgassing in a EUV lithography apparatus. The method includes activating a surface within the EUV lithography apparatus, inducing the outgassing, analyzing a residual gas. Defining a maximum partial pressure, recording a mass spectrum of the residual gas, converting the highest-intensity peaks of the mass spectrum into sub-partial pressures, summing the sub-partial pressures, and comparing the summed result with the defined maximum partial pressure. An EUV lithography apparatus includes a residual gas analyzer and a stimulation unit comprised of at least on of an electron source, an ion source, a photon source, and a plasma source. A measurement setup for measuring the outgassing from components by analyzing the residual gas includes a residual gas analyzer, a vacuum chamber, and a stimulation unit comprised of at least on of an electron source, an ion source, a photon source, and a plasma source.
    Type: Application
    Filed: September 2, 2009
    Publication date: May 6, 2010
    Applicants: Carl Zeiss SMT AG, ASML Netherlands B.V
    Inventors: Dieter Kraus, Dirk Heinrich Ehm, Theodoor Bastiaan Wolschrijn, Johannes Hubertus Josephina Moors
  • Publication number: 20100071720
    Abstract: Inside a vacuum chamber 200 a cleaning unit 204 provides atomic hydrogen or atomic deuterium for cleaning a surface 202 at a pressure of less than 10?4 Torr or of more than 10?3 Torr. The surface 202 is heated by the heating unit 203 to a temperature of at least 50° C. This allows achieving cleaning rates of more than 60 ?/h. Preferably, the surface 202 is the surface of a multilayer mirror 201 as used in an EUV lithography apparatus.
    Type: Application
    Filed: September 19, 2008
    Publication date: March 25, 2010
    Applicant: Carl Zeiss SMT AG
    Inventors: Dirk Heinrich Ehm, Stefan Schmidt, Dieter Kraus, Stefan Wiesner, Stefan Koehler, Almut Czap, Hin Yiu Anthony Chung
  • Publication number: 20100045948
    Abstract: The invention relates to an EUV lithography apparatus with at least one EUV-reflective optical surface and a cavity ringdown reflectometer adapted to determine the contamination status of the EUV-reflective optical surface for at least one contaminating substance by determining the reflectivity of the EUV-reflective optical surface for radiation at a measuring wavelength (?m). The invention further relates to a method for determining the contamination status of at least one EUV-reflective optical surface arranged in an EUV lithography apparatus for at least one contaminating substance comprising determining the reflectivity of the EUV-reflective optical surface for radiation at a measuring wavelength (?m) using a cavity ringdown reflectometer.
    Type: Application
    Filed: August 21, 2008
    Publication date: February 25, 2010
    Applicant: Carl Zeiss SMT AG
    Inventors: Dieter KRAUS, Dirk Heinrich Ehm, Stefan-Wolfgang Schmidt