Patents by Inventor Dieter M. Gruen

Dieter M. Gruen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090092824
    Abstract: One provides nanocrystalline diamond material that comprises a plurality of substantially ordered diamond crystallites that are sized no larger than about 10 nanometers. One then disposes a non-diamond component within the nanocrystalline diamond material which may comprise an electrical conductor that is formed at the grain boundaries that separate the diamond crystallites from one another. One may also instead react the aforementioned crystallites with a metallic component. The reaction process can comprise combining the crystallites with one or more metal salts in an aqueous solution and then heating that aqueous solution to remove the water. This heating can occur in a reducing atmosphere (comprising, for example, hydrogen and/or methane) to also reduce the salt to metal. Metal or metal carbide nanowires and/or quantum dots are produced as a result of the reaction with the ultrananocrystalline diamond. Such material exhibits thermoelectric and other useful properties.
    Type: Application
    Filed: April 24, 2007
    Publication date: April 9, 2009
    Inventor: Dieter M. Gruen
  • Patent number: 7368658
    Abstract: A photovoltaic device and method of making same. A layer of p-doped microcrystalline diamond is deposited on a layer of n-doped ultrananocrystalline diamond such as by providing a substrate in a chamber, providing a first atmosphere containing about 1% by volume CH4 and about 99% by volume H2 with dopant quantities of a boron compound, subjecting the atmosphere to microwave energy to deposit a p-doped microcrystalline diamond layer on the substrate, providing a second atmosphere of about 1% by volume CH4 and about 89% by volume Ar and about 10% by volume N2, subjecting the second atmosphere to microwave energy to deposit a n-doped ultrananocrystalline diamond layer on the p-doped microcrystalline diamond layer. Electrodes and leads are added to conduct electrical energy when the layers are irradiated.
    Type: Grant
    Filed: October 31, 2003
    Date of Patent: May 6, 2008
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventor: Dieter M. Gruen
  • Patent number: 6811612
    Abstract: MEMS structure and a method of fabricating them from ultrananocrystalline diamond films having average grain sizes of less than about 10 nm and feature resolution of less than about one micron . The MEMS structures are made by contacting carbon dimer species with an oxide substrate forming a carbide layer on the surface onto which ultrananocrystalline diamond having average grain sizes of less than about 10 nm is deposited. Thereafter, microfabrication process are used to form a structure of predetermined shape having a feature resolution of less than about one micron.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: November 2, 2004
    Assignee: The University of Chicago
    Inventors: Dieter M. Gruen, Hans-Gerd Busmann, Eva-Maria Meyer, Orlando Auciello, Alan R. Krauss
  • Patent number: 6793849
    Abstract: An electrically conducting n-type ultrananocrystalline diamond (UNCD) having no less than 1019 atoms/cm3 of nitrogen is disclosed. A method of making the n-doped UNCD. A method for predictably controlling the conductivity is also disclosed.
    Type: Grant
    Filed: December 12, 2003
    Date of Patent: September 21, 2004
    Assignee: The University of Chicago
    Inventors: Dieter M. Gruen, Alan R. Krauss, Orlando H. Auciello, John A. Carlisle
  • Publication number: 20040129202
    Abstract: MEMS structure and a method of fabricating them from ultrananocrystalline diamond films having average grain sizes of less than about 10 nm and feature resolution of less than about one micron. The MEMS structures are made by contacting carbon dimer species with an oxide substrate forming a carbide layer on the surface onto which ultrananocrystalline diamond having average grain sizes of less than about 10 nm is deposited. Thereafter, microfabrication process are used to form a structure of predetermined shape having a feature resolution of less than about one micron.
    Type: Application
    Filed: November 8, 2002
    Publication date: July 8, 2004
    Inventors: Dieter M. Gruen, Hans-Gerd Busmann, Eva-Maria Meyer, Orlando Auciello, Alan R. Krauss, Julie R. Krauss
  • Patent number: 6613601
    Abstract: An ultrananocrystalline diamond (UNCD) element formed in a cantilever configuration is used in a highly sensitive, ultra-small sensor for measuring acceleration, shock, vibration and static pressure over a wide dynamic range. The cantilever UNCD element may be used in combination with a single anode, with measurements made either optically or by capacitance. In another embodiment, the cantilever UNCD element is disposed between two anodes, with DC voltages applied to the two anodes. With a small AC modulated voltage applied to the UNCD cantilever element and because of the symmetry of the applied voltage and the anode-cathode gap distance in the Fowler-Nordheim equation, any change in the anode voltage ratio V1/V2 required to maintain a specified current ratio precisely matches any displacement of the UNCD cantilever element from equilibrium. By measuring changes in the anode voltage ratio required to maintain a specified current ratio, the deflection of the UNCD cantilever can be precisely determined.
    Type: Grant
    Filed: May 9, 2002
    Date of Patent: September 2, 2003
    Assignee: The University of Chicago
    Inventors: Alan R. Krauss, Dieter M. Gruen, Michael J. Pellin, Orlando Auciello
  • Patent number: 6592839
    Abstract: A method for controlling the crystallite size and growth rate of plasma-deposited diamond films. A plasma is established at a pressure in excess of about 55 Torr with controlled concentrations of hydrogen up to about 98% by volume, of unsubstituted hydrocarbons up to about 3% by volume and an inert gas of one or more of the noble gases and nitrogen up to about 98% by volume. The volume ratio of inert gas to hydrogen is preferably maintained at greater than about 4, to deposit a diamond film on a suitable substrate. The diamond film is deposited with a predetermined crystallite size and at a predetermined growth rate.
    Type: Grant
    Filed: February 23, 1999
    Date of Patent: July 15, 2003
    Assignee: The University of Chicago
    Inventors: Dieter M. Gruen, Thomas G. McCauley, Dan Zhou, Alan R. Krauss
  • Patent number: 6447851
    Abstract: A method of producing diamond or diamond like films in which a negative bias is established on a substrate with an electrically conductive surface in a microwave plasma chemical vapor deposition system. The atmosphere that is subjected to microwave energy includes a source of carbon, nitrogen and hydrogen. The negative bias is maintained on the substrate through both the nucleation and growth phase of the film until the film is continuous. Biases between −100V and −200 are preferred. Carbon sources may be one or more of CH4, C2H2 other hydrocarbons and fullerenes.
    Type: Grant
    Filed: July 14, 1999
    Date of Patent: September 10, 2002
    Assignee: The University of Chicago
    Inventors: Dieter M. Gruen, Alan R. Krauss, Ming Q. Ding, Orlando Auciello
  • Publication number: 20020114756
    Abstract: A method for controlling the crystallite size and growth rate of plasma-deposited diamond films. A plasma is established at a pressure in excess of about 55 Torr with controlled concentrations of hydrogen up to about 98% by volume, of unsubstituted hydrocarbons up to about 3% by volume and an inert gas of one or more of the noble gases and nitrogen up to about 98% by volume. The volume ratio of inert gas to hydrogen is preferably maintained at greater than about 4, to deposit a diamond film on a suitable substrate. The diamond film is deposited with a predetermined crystallite size and at a predetermined growth rate.
    Type: Application
    Filed: February 23, 1999
    Publication date: August 22, 2002
    Inventors: DIETER M. GRUEN, THOMAS G. MCCAULEY, DAN ZHOU, ALAN R. KRAUSS
  • Patent number: 6422077
    Abstract: An ultrananocrystalline diamond (UNCD) element formed in a cantilever configuration is used in a highly sensitive, ultra-small sensor for measuring acceleration, shock, vibration and static pressure over a wide dynamic range. The cantilever UNCD element may be used in combination with a single anode, with measurements made either optically or by capacitance. In another embodiment, the cantilever UNCD element is disposed between two anodes, with DC voltages applied to the two anodes. With a small AC modulated voltage applied to the UNCD cantilever element and because of the symmetry of the applied voltage and the anode-cathode gap distance in the Fowler-Nordheim equation, any change in the anode voltage ratio V1/N2 required to maintain a specified current ratio precisely matches any displacement of the UNCD cantilever element from equilibrium. By measuring changes in the anode voltage ratio required to maintain a specified current ratio, the deflection of the UNCD cantilever can be precisely determined.
    Type: Grant
    Filed: April 6, 2000
    Date of Patent: July 23, 2002
    Assignee: The University of Chicago
    Inventors: Alan R. Krauss, Dieter M. Gruen, Michael J. Pellin, Orlando Auciello
  • Publication number: 20020048638
    Abstract: A method of producing diamond or diamond like films in which a negative bias is established on a substrate with an electrically conductive surface in a microwave plasma chemical vapor deposition system. The atmosphere that is subjected to microwave energy includes a source of carbon, nitrogen and hydrogen. The negative bias is maintained on the substrate through both the nucleation and growth phase of the film until the film is continuous. Biases between −100V and −200 are preferred. Carbon sources may be one or more of CH4, C2H2 other hydrocarbons and fullerenes.
    Type: Application
    Filed: July 14, 1999
    Publication date: April 25, 2002
    Inventors: DIETER M. GRUEN, ALAN R. KRAUSS, M. Q. DING, ORLANDO AUCIELLO
  • Patent number: 6078600
    Abstract: A 213 nm laser beam is capable of single photon ablative photodecomposition for the removal of a polymer or biological material substrate. Breaking the molecular bonds and displacing the molecules away from the substrate in a very short time period results in most of the laser photon energy being carried away by the displaced molecules, thus minimizing thermal damage to the substrate. The incident laser beam may be unfocussed and is preferably produced by quintupling the 1064 nm radiation from a Nd:YAG solid state laser, i.e., at 213 nm. In one application, the 213 nm laser beam is expanded in cross section and directed through a plurality of small beta barium borate (BBO) crystals for increasing the energy per photon of the laser radiation directed onto the substrate. The BBO crystals are arranged in a crystal matrix array to provide a large laser beam transmission area capable of accommodating high energy laser radiation without damaging the BBO crystals.
    Type: Grant
    Filed: March 20, 1998
    Date of Patent: June 20, 2000
    Assignee: The University of Chicago
    Inventor: Dieter M. Gruen
  • Patent number: 6008491
    Abstract: A method and apparatus for analyzing the surface characteristics of a sample by Secondary Ion Mass Spectroscopy (SIMS) and Mass Spectroscopy of Recoiled Ions (MSRI) is provided. The method includes detecting back scattered primary ions, low energy ejected species, and high energy ejected species by ion beam surface analysis techniques comprising positioning a ToF SIMS/MSRI mass analyzer at a predetermined angle .theta., where .theta. is the angle between the horizontal axis of the mass analyzer and the undeflected primary ion beam line, and applying a specific voltage to the back ring of the analyzer. Preferably, .theta. is less than or equal to about 120.degree. and, more preferably, equal to 74.degree.. For positive ion analysis, the extractor, lens, and front ring of the reflectron are set at negative high voltages (-HV). The back ring of the reflectron is set at greater than about +700V for MSRI measurements and between the range of about +15 V and about +50V for SIMS measurements.
    Type: Grant
    Filed: October 15, 1997
    Date of Patent: December 28, 1999
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Vincent S. Smentkowski, Dieter M. Gruen, Alan R. Krauss, J. Albert Schultz, John C. Holecek
  • Patent number: 5989511
    Abstract: An article and method of manufacture of a nanocrystalline diamond film. The nanocrystalline film is prepared by forming a carbonaceous vapor, providing an inert gas containing gas stream and combining the gas stream with the carbonaceous containing vapor. A plasma of the combined vapor and gas stream is formed in a chamber and fragmented carbon species are deposited onto a substrate to form the nanocrystalline diamond film having a root mean square flatness of about 50 nm deviation from flatness in the as deposited state.
    Type: Grant
    Filed: March 22, 1996
    Date of Patent: November 23, 1999
    Assignee: The University of Chicago
    Inventors: Dieter M. Gruen, Alan R. Krauss, Ali Erdemir, Cuma Bindal, Christopher D. Zuiker
  • Patent number: 5902640
    Abstract: A method of preparing diamond thin films with improved field emission properties. The method includes preparing a diamond thin film on a substrate, such as Mo, W, Si and Ni. An atmosphere of hydrogen (molecular or atomic) can be provided above the already deposited film to form absorbed hydrogen to reduce the work function and enhance field emission properties of the diamond film. In addition, hydrogen can be absorbed on intergranular surfaces to enhance electrical conductivity of the diamond film. The treated diamond film can be part of a microtip array in a flat panel display.
    Type: Grant
    Filed: July 19, 1996
    Date of Patent: May 11, 1999
    Assignee: The University of Chicago
    Inventors: Alan R. Krauss, Dieter M. Gruen
  • Patent number: 5886459
    Abstract: A method and system for manufacturing a field emission cathode having enhanced electron emission properties. The field emission cathode is prepared by providing a field emission substrate, an alkali metal alloy is formed at and below the exposed surface of the substrate, and a surface layer of alkali metal atoms are formed on the exposed surface by Gibbsian diffusion segregation action. If the monolayer, or surface layer, is desorbed, the diffusion action reestablishes the alkali metal surface layer thereby providing a stable alkali metal layer and enhanced electron emission characteristics.
    Type: Grant
    Filed: December 23, 1996
    Date of Patent: March 23, 1999
    Assignee: The University of Chicago
    Inventors: Orlando H. Auciello, Alan R. Krauss, Gary E. McGuire, Dieter M. Gruen
  • Patent number: 5849079
    Abstract: A method and system for manufacturing diamond film. The method involves forming a carbonaceous vapor, providing a gas stream of argon, hydrogen and hydrocarbon and combining the gas with the carbonaceous vapor, passing the combined carbonaceous vapor and gas carrier stream into a chamber, forming a plasma in the chamber causing fragmentation of the carbonaceous and deposition of a diamond film on a substrate.
    Type: Grant
    Filed: April 4, 1995
    Date of Patent: December 15, 1998
    Assignee: The University of Chicago
    Inventors: Dieter M. Gruen, Alan R. Krauss, Shengzhong Liu, Xianzheng Pan, Christopher D. Zuiker
  • Patent number: 5772760
    Abstract: A method and system for manufacturing nanocrystalline diamond film on a substrate such as field emission tips. The method involves forming a carbonaceous vapor, providing a gas stream of argon, hydrocarbon and possibly hydrogen, and combining the gas with the carbonaceous vapor, passing the combined carbonaceous vapor and gas carrier stream into a chamber, forming a plasma in the chamber causing fragmentation of the carbonaceous vapor and deposition of a diamond film on the field emission tip.
    Type: Grant
    Filed: October 11, 1995
    Date of Patent: June 30, 1998
    Assignee: The University Of Chicago
    Inventors: Dieter M. Gruen, Alan R. Krauss
  • Patent number: 5620512
    Abstract: A method and system for manufacturing diamond film. The method involves forming a fullerene vapor, providing a noble gas stream and combining the gas with the fullerene vapor, passing the combined fullerene vapor and noble gas carrier stream into a chamber, forming a plasma in the chamber causing fragmentation of the fullerene and deposition of a diamond film on a substrate.
    Type: Grant
    Filed: October 27, 1993
    Date of Patent: April 15, 1997
    Assignee: University of Chicago
    Inventors: Dieter M. Gruen, Shengzhong Liu, Alan R. Krauss, Xianzheng Pan
  • Patent number: 5462776
    Abstract: A method of forming synthetic diamond or diamond-like films on a substrate surface. The method involves the steps of providing a vapor selected from the group of fullerene molecules or an inert gas/fullerene molecule mixture, providing energy to the fullerene molecules consisting of carbon-carbon bonds, the energized fullerene molecules breaking down to form fragments of fullerene molecules including C.sub.2 molecules and depositing the energized fullerene molecules with C.sub.2 fragments onto the substrate with farther fragmentation occurring and forming a thickness of diamond or diamond-like films on the substrate surface.
    Type: Grant
    Filed: July 6, 1994
    Date of Patent: October 31, 1995
    Inventor: Dieter M. Gruen