Patents by Inventor Dieter Munz

Dieter Munz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4428809
    Abstract: The invention concerns a method of and apparatus for forming electrically conductive transparent oxide coatings on water-containing substrates by magnetic-field reinforced cathodic atomization of a target hot-pressed from powdered oxide ceramic materials. The coatings formed have electrical conductivity.When the atomization process is carried out using direct-current voltages of between 150 and 600 volts and a power density of 3 to 15 and preferably 5 to 10 watts/cm.sup.2, the degree of pressing of the target is at least 75% of the density of the solid material and the atomization atmosphere is maintained at between 1.times.10.sup.-3 and 5.times.10.sup.-2 mbars with a composition of 2 to 20% oxygen, 40 to 70% hydrogen, and the remainder argon. Based upon the speed of travel of the web, a thickness of coating of between 10 and 100 mm and a specific resistance of between 100 and 10,000 .mu..OMEGA.cm are achieved.
    Type: Grant
    Filed: March 26, 1982
    Date of Patent: January 31, 1984
    Assignee: Leybold Heraeus GmbH
    Inventors: Klaus J. Heimbach, Wolf-Dieter Munz, Rolf Adam, Heinz Wenzl
  • Patent number: 4426264
    Abstract: The invention concerns an array of cathodes for sputtering apparatus that contains first, a target plate made out of the material to be sputtered, second, a system of magnets with poles of opposite signs positioned behind the target plate so that at least some of the lines of magnetic force emerging from the poles pass through and reenter the target plate, and third, a device that can be adjusted to alter the relative positions of the magnets and the target plate. The array is also set up so that at least some of the magnetic lines of force run from the poles through the target plate and back.The purpose of maintaining largely constant sputtering conditions as the target plate is consumed is achieved in accordance with the invention by moving the adjusting device essentially perpendicular to the largest surface of the target plate.
    Type: Grant
    Filed: December 14, 1981
    Date of Patent: January 17, 1984
    Assignee: Leybold Heraeus GmbH
    Inventors: Wolf-Dieter Munz, Hans Wolf
  • Patent number: 4200502
    Abstract: A method is disclosed for producing an electric thin layer circuit comprising at least one capacitor and a conductor path and/or a resistor. The number of masks required for the production of such a thin layer circuit is reduced. First and second layers of tantalum-aluminum alloy where the second layer has a tantalum share lower than the first, are applied on an insulating base. In a first masking and etching technique, areas of the first and second layers are etched off outside the circuit elements. At least the second layer is anodically oxidized and the anodically oxidized surface is covered with a silicon dioxide layer so as to form a two layer dielectric for the capacitor. In a second masking and etching technique, not-required areas of the silicon dioxide layer external to the capacitor are removed. By utilizing the silicon dioxide layer remaining as an etching mask, the not-required areas of the tantalum-aluminum oxide layer and the second tantalum-aluminum layer external to the capacitor are removed.
    Type: Grant
    Filed: March 12, 1979
    Date of Patent: April 29, 1980
    Assignee: Siemens Aktiengesellschaft
    Inventors: Wolf-Dieter Munz, Siegfried Bock, Hans W. Potzlberger