Patents by Inventor Dieter Van Den Heuvel

Dieter Van Den Heuvel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9874821
    Abstract: The present disclosure is related to a method for detecting and ranking hotspots in a lithographic mask used for printing a pattern on a substrate. According to example embodiments, the ranking is based on defect detection on a modulated focus wafer or a modulated dose wafer, where the actual de-focus or dose value at defect locations is taken into account, in addition to a de-focus or dose setting applied to a lithographic tool when a mask pattern is printed on the wafer. Additionally or alternatively, lithographic parameters other than the de-focus or dose can be used as a basis for the ranking method.
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: January 23, 2018
    Assignee: IMEC VZW
    Inventors: Sandip Halder, Dieter Van Den Heuvel, Vincent Truffert, Philippe Leray
  • Publication number: 20160313647
    Abstract: The present disclosure is related to a method for detecting and ranking hotspots in a lithographic mask used for printing a pattern on a substrate. According to example embodiments, the ranking is based on defect detection on a modulated focus wafer or a modulated dose wafer, where the actual de-focus or dose value at defect locations is taken into account, in addition to a de-focus or dose setting applied to a lithographic tool when a mask pattern is printed on the wafer. Additionally or alternatively, lithographic parameters other than the de-focus or dose can be used as a basis for the ranking method.
    Type: Application
    Filed: April 21, 2016
    Publication date: October 27, 2016
    Applicant: IMEC VZW
    Inventors: Sandip Halder, Dieter Van Den Heuvel, Vincent Truffert, Philippe Leray