Patents by Inventor Dieter W. Meyer

Dieter W. Meyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Magnetron sputtering method and apparatus utilizing a pulsed energy pattern
    Patent number: 6063245
    Abstract: A procedure and apparatus for the application of carbon layers using reactive magnetron sputtering is described. The process includes sputtering of at least two targets made of carbon in a reactive atmosphere with a pulsed energy feed. During a pattern period of the pulses all targets (magnetrons) are once switched on as an anode and at least one target is switched as an anode at all times Various embodiments include detection and limitation of the "microarcs"; executing of regeneration processes according to fixed predetermined time intervals for at least 5 seconds. In one embodiment a microarc is detected on a magnetron and if a next pulse-off time is more than a selected time period away, then the magnetron is connected to a positive pole of the power supply.
    Type: Grant
    Filed: December 12, 1997
    Date of Patent: May 16, 2000
    Assignee: International Business Machines Corporation
    Inventors: Peter Frach, Klaus Goedicke, Michael Junghahnel, Torsten Winkler, Friedel Haese, Dieter W. Meyer, Manfred Muller, Harald Strecker