Patents by Inventor Dieter Wilk

Dieter Wilk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240076656
    Abstract: Provided in some aspects are methods for light-controlled in situ surface patterning of a substrate comprising a step of blocking or ablating oligonucleotide molecules in a boundary region separating a plurality of spot regions, and attaching oligonucleotides to oligonucleotide molecules in a first one or more of the spot regions.
    Type: Application
    Filed: June 28, 2023
    Publication date: March 7, 2024
    Applicant: 10x Genomics, Inc.
    Inventors: David Michael PATTERSON, Steven William SHORT, Dieter WILK, Pingwei ZHUANG, Solongo Batjargal ZIRALDO
  • Publication number: 20240026444
    Abstract: The present disclosure relates in some aspects to methods and compositions for manufacturing molecular arrays using a hybrid approach comprising using non-contact printing (e.g., using inkjet printing, slot die coating, and/or blade coating) and photolithography-guided oligonucleotide hybridization and ligation. In particular, the molecular arrays can be used for determining spatial patterns of abundance and/or expression of a biological target in a sample.
    Type: Application
    Filed: June 28, 2023
    Publication date: January 25, 2024
    Inventors: Steven William SHORT, Dieter WILK
  • Publication number: 20220228210
    Abstract: Provided in some aspects are methods for light-controlled in situ surface patterning of a substrate. Compositions such as nucleic acid arrays produced by the methods are also disclosed. In some embodiments, a method disclosed herein comprises using photoresist for photocontrollable hybridization and/or ligation of nucleic acid molecules, wherein photoresist removal allows hybridization and/or ligation of nucleic acid molecules at the exposed area. A large diversity of barcodes can be created in molecules on the substrate via sequential rounds of light exposure, hybridization, and ligation.
    Type: Application
    Filed: December 29, 2021
    Publication date: July 21, 2022
    Inventors: David Michael PATTERSON, Denis PRISTINSKI, Preyas SHAH, Steven William SHORT, Dieter WILK, Siyuan XING
  • Patent number: 10088345
    Abstract: The present disclosure is directed to a method for designing an aperture in a mask for inspecting a wafer. The method includes the steps of scanning a collection plane of the wafer at a plurality of points and collecting data for at least a part of the wafer. The method also includes the step of mapping the data. A further step of the method includes configuring the aperture based on the mapped data.
    Type: Grant
    Filed: December 4, 2012
    Date of Patent: October 2, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Chuanyong Huang, Raymond Chu, Gordana Neskovic, Dieter Wilk, Christian Wolters, Tim Mahatdejkul
  • Patent number: 9645093
    Abstract: An inspection system with selectable apodization includes a selectably configurable apodization device disposed along an optical pathway of an optical system. The apodization device includes one or more apodization elements operatively coupled to one or more actuation stages. The one or more actuation stages are configured to selectably actuate the one or more apodization elements along one or more directions. The inspection system includes a control system communicatively coupled to the one or more actuation stages. The control system is configured to selectably control an actuation state of at the one or more apodization elements so as to apply a selected apodization profile formed with the one or more apodization elements.
    Type: Grant
    Filed: November 2, 2015
    Date of Patent: May 9, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Jamie M. Sullivan, Gary Janik, Steve Cui, Rex Runyon, Dieter Wilk, Steve Short, Mikhail Haurylau, Qiang Q. Zhang, Grace Hsiu-Ling Chen, Robert M. Danen, Suwipin Martono, Shobhit Verma, Wenjian Cai, Meier Brender
  • Publication number: 20160054232
    Abstract: An inspection system with selectable apodization includes a selectably configurable apodization device disposed along an optical pathway of an optical system. The apodization device includes one or more apodization elements operatively coupled to one or more actuation stages. The one or more actuation stages are configured to selectably actuate the one or more apodization elements along one or more directions. The inspection system includes a control system communicatively coupled to the one or more actuation stages. The control system is configured to selectably control an actuation state of at the one or more apodization elements so as to apply a selected apodization profile formed with the one or more apodization elements.
    Type: Application
    Filed: November 2, 2015
    Publication date: February 25, 2016
    Inventors: Jamie M. Sullivan, Gary Janik, Steve Cui, Rex Runyon, Dieter Wilk, Steve Short, Mikhail Haurylau, Qiang Q. Zhang, Grace Hsiu-Ling Chen, Robert M. Danen, Suwipin Martono, Shobhit Verma, Wenjian Cai, Meier Brender
  • Patent number: 9176069
    Abstract: An inspection system with selectable apodization includes an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light emanating from the surface of the sample, the illumination source and the detector being optically coupled via an optical pathway of an optical system, a selectably configurable apodization device disposed along the optical pathway, wherein the apodization device includes one or more apodization elements operatively coupled to one or more actuation stages configured to selectably actuate the one or more apodization elements along one or more directions, and a control system communicatively coupled to the one or more actuation and configured to selectably control apodization of illumination transmitted along the optical pathway by controlling an actuation state of the one or more apodization elements.
    Type: Grant
    Filed: February 6, 2013
    Date of Patent: November 3, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Jamie M. Sullivan, Gary Janik, Steve Cui, Rex Runyon, Dieter Wilk, Steve Short, Mikhail Haurylau, Qiang Q. Zhang, Grace Hsiu-Ling Chen, Robert M. Danen, Suwipin Martono, Shobhit Verma, Wenjian Cai, Meier Brender
  • Patent number: 6686994
    Abstract: Disclosed are mechanisms for selectively filtering spatial portions of light emanating from a sample under inspection within an optical system. In one embodiment, a programmable spatial filter (PSF) is constructed from materials that are compatible with light in a portion of the UV wavelength range. In a specific implementation, the PSF is constructed from a UV compatible material, such as a polymer stabilized liquid crystal material. In a further aspect, the PSF also includes a pair of plates that are formed from a UV grade glass. The PSF may also include a relatively thin first and second ITO layer that results in a sheet resistance between about 100 and about 300 &OHgr; per square.
    Type: Grant
    Filed: June 4, 2002
    Date of Patent: February 3, 2004
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Dieter Wilk, Anlun Tang, Eric N. Vella, Rex Runyon, Jamie M. Sullivan