Abstract: A component for a projection exposure apparatus for semiconductor lithography, comprises an optical element and an actuator, which are force-fittingly connected to each other. The actuator at least locally deforms the optical element. The actuator can be configured to minimize the loss in rigidity at the peripheries delimiting the actuator on the imaging quality. A method for designing a component of projection exposure apparatus is provided.

Abstract: The invention relates to a device combination for protecting electrical networks against overvoltages or overcurrents, comprising an essentially U-shaped base and at least one plug-in module, which can be plugged or pushed onto the base, wherein the base has connection terminals for connecting to the respective network and also has plug-in contacts, which are connected to the connection terminals and are complementary to mating plug-in contacts or contact tongues of the plug-in module, and the plug-in module has a housing which accommodates one or more lightning and/or overvoltage arresters, and the mating plug-in contacts or contact tongues pass through a floor side of the housing.

Abstract: A method for swapping an optical system, such as a DUV mirror, of a projection exposure apparatus, comprises: a) raising the optical system along a centre axis of the optical system so that mount struts of the optical system pass out of contact with frame struts of a frame carrying the optical system; b) rotating the optical system about the centre axis so that the mount struts are arranged between the frame struts; c) lowering the optical system along the centre axis; and d) shifting the optical system perpendicularly to the centre axis so that the optical system is moved out of a housing.

Abstract: The invention relates to a device combination for protecting electrical networks against overvoltages or overcurrents, comprising an essentially U-shaped base and at least one plug-in module, which can be plugged or pushed onto the base, wherein the base has connection terminals for connecting to the respective network and also has plug-in contacts, which are connected to the connection terminals and are complementary to mating plug-in contacts or contact tongues of the plug-in module, and the plug-in module has a housing which accommodates one or more lightning and/or overvoltage arresters, and the mating plug-in contacts or contact tongues pass through a floor side of the housing.

Abstract: A module for a projection exposure apparatus for semiconductor lithography includes at least one optical element arranged in a holder. At least one spacer is arranged between the holder and a further holder or a main body. The spacer is designed to semi-actively vary its extent. A method for positioning at least one holder in a projection exposure apparatus for semiconductor lithography includes using a semi-active spacer is to position the holder.

Abstract: A lithography machine includes an optical element, an interface coupled to the optical element, and a component which is separate from the interface. The interface is directly connected to the optical element. The optical element includes an engaging section. The component has a counter engaging section configured to engage with the engaging section of the optical element to connect the component form-fittingly and/or force-fittingly to the optical element.

Abstract: A lithography machine includes an optical element, an interface coupled to the optical element, and a component which is separate from the interface. The interface is directly connected to the optical element. The optical element includes an engaging section. The component has a counter engaging section configured to engage with the engaging section of the optical element to connect the component form-fittingly and/or force-fittingly to the optical element.