Abstract: Measuring a shape of an optical surface (14) of a test object (12) includes: providing an interferometric measuring device (16) generating a measurement wave (18); arranging the measuring device (16) and the test object (12) consecutively at different measurement positions relative to each other, such that different regions (20) of the optical surface (14) are illuminated by the measurement wave (18); measuring positional coordinates of the measuring device (16) at the different measurement positions in relation to the test object (12); obtaining surface region measurements by interferometrically measuring the wavefront of the measurement wave (18) after interaction with the respective region (20) of the optical surface (14) using the measuring device (16) in each of the measurement positions; and determining the actual shape of the optical surface (14) by computationally combining the sub-surface measurements based on the measured positional coordinates of the measuring device (16) at each of the measurement

Abstract: An optical system, such as a microlithographic projection exposure apparatus, includes a first optical component, a second optical component, and a measurement arrangement for determining the relative position of the first optical component and the second optical component in six degrees of freedom. The measurement arrangement is adapted to determine the relative position of the first optical component and the second optical component over six different length measurement sections. The length measurement sections extend directly between the first optical component and the second optical component.

Abstract: Measuring a shape of an optical surface (14) of a test object (12) includes: providing an interferometric measuring device (16) generating a measurement wave (18); arranging the measuring device (16) and the test object (12) consecutively at different measurement positions relative to each other, such that different regions (20) of the optical surface (14) are illuminated by the measurement wave (18); measuring positional coordinates of the measuring device (16) at the different measurement positions in relation to the test object (12); obtaining surface region measurements by interferometrically measuring the wavefront of the measurement wave (18) after interaction with the respective region (20) of the optical surface (14) using the measuring device (16) in each of the measurement positions; and determining the actual shape of the optical surface (14) by computationally combining the surface region measurements based on the measured positional coordinates of the measuring device (16) at each of the measurem

Abstract: Measuring a shape of an optical surface (14) of a test object (12) includes: providing an interferometric measuring device (16) generating a measurement wave (18); arranging the measuring device (16) and the test object (12) consecutively at different measurement positions relative to each other, such that different regions (20) of the optical surface (14) are illuminated by the measurement wave (18); measuring positional coordinates of the measuring device (16) at the different measurement positions in relation to the test object (12); obtaining surface region measurements by interferometrically measuring the wavefront of the measurement wave (18) after interaction with the respective region (20) of the optical surface (14) using the measuring device (16) in each of the measurement positions; and determining the actual shape of the optical surface (14) by computationally combining the sub-surface measurements based on the measured positional coordinates of the measuring device (16) at each of the measurement

Abstract: A device for measuring lithography masks is provided, comprising a reticle carrier for the lithography mask to be measured, a measurement objective for reproducing on a detector a section of said lithography mask held by said reticle carrier, a measurement module for measuring the position of said reticle carrier relative to said measurement objective, and a correction module by means of which said reticle carrier can be moved in order to bring it into a predetermined position relative to said measurement objective, wherein said measurement objective and said measurement module are fastened directly to an instrument carrier in a locally fixed manner.

Abstract: An optical system, such as a microlithographic projection exposure apparatus, includes a first optical component, a second optical component, and a measurement arrangement for determining the relative position of the first optical component and the second optical component in six degrees of freedom. The measurement arrangement is adapted to determine the relative position of the first optical component and the second optical component over six different length measurement sections. The length measurement sections extend directly between the first optical component and the second optical component.

Abstract: A device for measuring lithography masks is provided, comprising a reticle carrier for the lithography mask to be measured, a measurement objective for reproducing on a detector a section of said lithography mask held by said reticle carrier, a measurement module for measuring the position of said reticle carrier relative to said measurement objective, and a correction module by means of which said reticle carrier can be moved in order to bring it into a predetermined position relative to said measurement objective, wherein said measurement objective and said measurement module are fastened directly to an instrument carrier in a locally fixed manner.

Abstract: The motorcycle frame involves a “bridge frame” in which a motor oil reservoir is incorporated. The bridge frame has two longitudinal tubes arranged at a distance from each other and basically symmetrically to the central longitudinal plane of the motorcycle, the one end of which, respectively, is connected with the steering head bearing tube, and which are connected with each other in the region between the steering head bearing tube and its other end through a front cross tube near the steering head bearing and a rear cross tube. The longitudinal support tubes and the cross tubes form a closed fluid system, which is used as a motor oil reservoir.

Abstract: The motorcycle frame involves a “bridge frame” in which a motor oil reservoir is incorporated. The bridge frame has two longitudinal tubes arranged at a distance from each other and basically symmetrically to the central longitudinal plane of the motorcycle, the one end of which, respectively, is connected with the steering head bearing tube, and which are connected with each other in the region between the steering head bearing tube and its other end through a front cross tube near the steering head bearing and a rear cross tube. The longitudinal support tubes and the cross tubes form a closed fluid system, which is used as a motor oil reservoir.