Patents by Inventor Dietrich Toennies

Dietrich Toennies has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and device for curing at least in part a photoresist applied to a substrate
    Patent number: 9960061
    Abstract: A method for curing at least in part a photoresist applied to a substrate comprises the following steps: The substrate coated with the photoresist is arranged on a support. The photoresist is subjected to a suitable temperature for curing the photoresist for a first predetermined time period. After the first predetermined time period has passed, the substrate is lifted from the support, rotated, re-placed onto the support and subjected to a suitable temperature for curing the photoresist for a second predetermined time period. This method can be performed with a device for curing at least in part a photoresist applied to a substrate, comprising a chamber, a support which is arranged in the chamber and on which the substrate can be arranged, and a rotating device for rotating the substrate between a first and a second phase of the curing of the photoresist.
    Type: Grant
    Filed: April 12, 2016
    Date of Patent: May 1, 2018
    Assignee: SUSS MicroTec Lithography GmbH
    Inventors: Omar Fakhr, Dietrich Toennies
  • Method and Device for Curing at least in Part a Photoresist Applied to a Substrate
    Publication number: 20160306280
    Abstract: A method for curing at least in part a photoresist applied to a substrate comprises the following steps: The substrate coated with the photoresist is arranged on a support. The photoresist is subjected to a suitable temperature for curing the photoresist for a first predetermined time period. After the first predetermined time period has passed, the substrate is lifted from the support, rotated, re-placed onto the support and subjected to a suitable temperature for curing the photoresist for a second predetermined time period. This method can be performed with a device for curing at least in part a photoresist applied to a substrate, comprising a chamber, a support which is arranged in the chamber and on which the substrate can be arranged, and a rotating device for rotating the substrate between a first and a second phase of the curing of the photoresist.
    Type: Application
    Filed: April 12, 2016
    Publication date: October 20, 2016
    Inventors: Omar Fakhr, Dietrich Toennies