Abstract: A metal oxide layer can be deposited onto surface of a structure in-situ, by exposing the surface to a precursor solution at an elevated temperature. The precursor solution contains: an organometallic, an oxidant, a surfactant, a chelating agent and water. The precursor solution is injected into the structure and maintained at a specific temperature, pH level, and pressure for a predetermined period of time. The resulting metal oxide layer is permanently attached to the structure's surface with a molecular interface bond and does not require post deposition heat treatment or additional injections of materials. As a result, the electrochemical corrosion potential of the metal surface decreases to less than ?230 mVSHE and corrosion in the BWR is mitigated.