Patents by Inventor Dimitre KARPUZOV

Dimitre KARPUZOV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate for a controlled implantation of ions and method of preparing a substrate for a controlled implantation of ions
    Patent number: 11798987
    Abstract: The present invention is related to a substrate (10) for a controlled implantation of ions (80) into a bulk (20), the substrate (10) comprising the bulk (20) composed of a crystalline first material (70), the bulk (20) comprising an implantation region (28) and a surface (22), wherein the implantation region (28) is located within the bulk (20) and along an implantation direction (82) at an implantation depth (26) below an implantation area (24) on the surface (10) of the bulk (20).
    Type: Grant
    Filed: January 8, 2020
    Date of Patent: October 24, 2023
    Assignee: PARCAN NANOTECH CO., LTD.
    Inventors: Ivo Rangelow, Xiang-Qian Zhou, Dimitre Karpuzov
  • SUBSTRATE FOR A CONTROLLED IMPLANTATION OF IONS AND METHOD OF PREPARING A SUBSTRATE FOR A CONTROLLED IMPLANTATION OF IONS
    Publication number: 20220069080
    Abstract: The present invention is related to a substrate (10) for a controlled implantation of ions (80) into a bulk (20), the substrate (10) comprising the bulk (20) composed of a crystalline first material (70), the bulk (20) comprising an implantation region (28) and a surface (22), wherein the implantation region (28) is located within the bulk (20) and along an implantation direction (82) at an implantation depth (26) below an implantation area (24) on the surface (10) of the bulk (20).
    Type: Application
    Filed: January 8, 2020
    Publication date: March 3, 2022
    Applicant: PARCAN NANOTECH CO., LTD.
    Inventors: Ivo RANGELOW, Larisa CHAKAROV, Xiang-Qian ZHOU, Dimitre KARPUZOV