Abstract: Embodiments of the present invention are video acquisition and processing systems. One embodiment of the present invention, video acquisition and processing systems include a sensor, image signal processor, and video compression and decompression components fully integrated in a single integrated circuit. The integrated sensor and image signal processor feature highly parallel transmission of image data to the video compression and decompression component. This highly parallel, pipelined, special-purpose integrated-circuit implementation offers cost-effective video acquisition and image data processing and an extremely large computational bandwidth with relatively low power consumption and low-latency for processing video signals.

Abstract: An apparatus for low-damage, anisotropic etching of substrates having the substrate mounted upon a mechanical support located within an ac or dc plasma reactor. The mechanical support is independent of the plasma reactor generating apparatus and capable of being electrically biased. The substrate is subjected to a plasma of low-energy electrons and a species reactive with the substrate. An additional structure capable of being electrically biased can be placed within the plasma to control further the extraction or retardation of particles from the plasma.