Patents by Inventor Dimitri Janssen

Dimitri Janssen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing patterned thin films
    Patent number: 7468328
    Abstract: The present invention relates to methods for producing a patterned thin film on a substrate. The method comprises the spatially and possibly also temporally modulation of nucleation modes of film growth during the growth of patterned thin films. The nucleation modes are modulated between no or substantially no nucleation, 2D nucleation, and 3D nucleation. The modulation is obtained by adjusting the surface treatment spatially applied over regions of the substrate, the growth conditions for the thin film materials used, and/or the specific thin film materials used. The growth conditions typically comprise the substrate temperature and the deposition flux. The modulation allows for spatially varying the interaction between the substrate material and the thin film materials deposited.
    Type: Grant
    Filed: July 6, 2004
    Date of Patent: December 23, 2008
    Assignee: Interuniversitair Microelektronica Centrum (IMEC)
    Inventors: Paul Heremans, Dimitri Janssen, Sören Steudel, Stijn Verlaak
  • Method for producing patterned thin films
    Publication number: 20050014350
    Abstract: The present invention relates to methods for producing a patterned thin film on a substrate. The method comprises the spatially and possibly also temporally modulation of nucleation modes of film growth during the growth of patterned thin films. The nucleation modes are modulated between no or substantially no nucleation, 2D nucleation, and 3D nucleation. The modulation is obtained by adjusting the surface treatment spatially applied over regions of the substrate, the growth conditions for the thin film materials used, and/or the specific thin film materials used. The growth conditions typically comprise the substrate temperature and the deposition flux. The modulation allows for spatially varying the interaction between the substrate material and the thin film materials deposited.
    Type: Application
    Filed: July 6, 2004
    Publication date: January 20, 2005
    Applicant: Interuniversitair Microelektronica Centrum (IMEC), a Belgium Corporation
    Inventors: Paul Heremans, Dimitri Janssen, Soren Steudel, Stijn Verlaak