Patents by Inventor Dimitry Dinega

Dimitry Dinega has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9303187
    Abstract: The present invention provides a chemical mechanical polishing method for polishing a substrate comprising silicon dioxide, silicon nitride, and polysilicon. The method comprises abrading a surface of the substrate with a CMP composition to remove at least some silicon dioxide, silicon nitride and polysilicon therefrom. The CMP composition comprising a particulate ceria abrasive suspended in an aqueous carrier having a pH of about 3 to 9.5 and containing a cationic polymer; wherein the cationic polymer consists of a quaternary methacryloyloxyalkylammonium polymer.
    Type: Grant
    Filed: July 22, 2013
    Date of Patent: April 5, 2016
    Assignee: Cabot Microelectronics Corporation
    Inventors: Dimitry Dinega, Kevin Moeggenborg, William Ward, Daniel Mateja
  • Publication number: 20150024595
    Abstract: The present invention provides a chemical mechanical polishing method for polishing a substrate comprising silicon dioxide, silicon nitride, and polysilicon. The method comprises abrading a surface of the substrate with a CMP composition to remove at least some silicon dioxide, silicon nitride and polysilicon therefrom. The CMP composition comprising a particulate ceria abrasive suspended in an aqueous carrier having a pH of about 3 to 9.5 and containing a cationic polymer; wherein the cationic polymer consists of a quaternary methacryloyloxyalkylammonium polymer.
    Type: Application
    Filed: July 22, 2013
    Publication date: January 22, 2015
    Inventors: Dimitry Dinega, Kevin Moeggenborg, William Ward, Daniel Mateja