Patents by Inventor Dio Wang

Dio Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9594866
    Abstract: A method includes receiving layout data representing a plurality of patterns. The layout data includes a plurality of layers and spaces identified between adjacent patterns. In at least one layer of the plurality of layers, the adjacent patterns violate a G0-rule. The method further includes determining whether each identified space is a critical G0-space. The identified space is determined to be a critical G0-space if a portion of at least one adjacent pattern that is removed merges two adjacent odd-loops of G0-spaces into a single even loop or G0 spaces or alternatively, if a portion of an adjacent pattern that is removed converts one odd-loop of G0-spaces to a non-loop of G0-spaces. The method further includes receiving a modification of at least one adjacent pattern and updating a spacing of a layer that is adjacent to the layers within the adjacent pattern that violate the G0-rule.
    Type: Grant
    Filed: November 19, 2012
    Date of Patent: March 14, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Dio Wang, Ken-Hsien Hsieh, Huang-Yu Chen, Li-Chun Tien, Ru-Gun Liu, Lee-Chung Lu
  • Patent number: 8365102
    Abstract: A method and system checks a double patterning layout and outputs a representation of G0-rule violations and critical G0-spaces. The method includes receiving layout data having patterns, determining whether each distance between adjacent pattern elements is a G0-space, find all G0-space forming a G0-rule violation, finding all G0-space that are critical G0-spaces, and outputting a representation of G0-rule violations and critical G0-spaces to an output device. By resolving G0-rule violations and critical G0-spaces, a design checker can effectively generate a double patterning technology (DPT) compliant layout.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: January 29, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Dio Wang, Ken-Hsien Hsieh, Huang-Yu Chen, Li-Chun Tien, Ru-Gun Liu, Lee-Chung Lu
  • Publication number: 20110296360
    Abstract: A method and system checks a double patterning layout and outputs a representation of G0-rule violations and critical G0-spaces. The method includes receiving layout data having patterns, determining whether each distance between adjacent pattern elements is a G0-space, find all G0-space forming a G0-rule violation, finding all G0-space that are critical G0-spaces, and outputting a representation of G0-rule violations and critical G0-spaces to an output device. By resolving G0-rule violations and critical G0-spaces, a design checker can effectively generate a double patterning technology (DPT) compliant layout.
    Type: Application
    Filed: May 27, 2010
    Publication date: December 1, 2011
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Dio WANG, Ken-Hsien HSIEH, Huang-Yu CHEN, Li-Chun TIEN, Ru-Gun LIU, Lee-Chung LU