Abstract: An electrode for use in electrolytic processes having a substrate of film-forming metal comprises an electrocatalyst incorporated in an integral surface film of the film-forming metal oxide grown from the substrate. The electrocatalyst incorporated in the integral surface film comprises two superimposed layers, a first layer comprising platinum metal and a second layer comprising an oxide of iridium, rhodium, palladium or ruthenium, the first platinum containing layer being next to the substrate and the second iridium, rhodium, palladium or ruthenium oxide containing layer being at the outer surface of the integral surface film of the film-forming metal oxide. The electrode comprising the two superimposed layers may be further coated with another electrochemically active catalytic outer layer in which case said superimposed layers serve as the electrode underlayer. The electrode is particularly useful as an oxygen evolving anode in high speed electroplating (electrogalvanizing).