Patents by Inventor Dirk Basting

Dirk Basting has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7308013
    Abstract: A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.
    Type: Grant
    Filed: November 3, 2003
    Date of Patent: December 11, 2007
    Assignee: Lambda Physik AG
    Inventors: Dirk Basting, Sergei Govorkov, Rainer Paetzel, Igor Bragin, Andreas Targsdorf
  • Patent number: 7075963
    Abstract: A line-narrowing module for a laser includes a prism beam expander and a grating preferably attached to a heat sink. A pressure-controlled enclosure filled with an inert gas seals the grating and/or other elements of the line-narrowing module. The pressure in the enclosure is adjusted for tuning the wavelength. Preferably, the pressure is controlled by controlling the flow of an inert gas through the enclosure. A pump may be used, or an overpressure flow may be used. Alternatively, a prism of the beam expander or an etalon may be rotatable for tuning the wavelength.
    Type: Grant
    Filed: January 25, 2001
    Date of Patent: July 11, 2006
    Assignee: Lambda Physik AG
    Inventors: Dirk Basting, Wolfgang Zschocke, Thomas Schröeder, Juergen Kleinschmidt, Matthias Kramer, Uwe Stamm
  • Publication number: 20050031004
    Abstract: A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.
    Type: Application
    Filed: November 3, 2003
    Publication date: February 10, 2005
    Inventors: Dirk Basting, Sergei Govorkov, Rainer Paetzel, Igor Bragin, Andreas Targsdorf
  • Patent number: 6717973
    Abstract: A F2-laser includes a discharge chamber filled with a gas mixture including molecular fluorine for generating a spectral emission in a wavelength range between 157 nm and 158 nm including a primary line and a secondary line, multiple electrodes coupled with a power supply circuit for producing a pulsed discharge to energize the molecular fluorine, a resonator including the discharge chamber and an interferometric device for generating a laser beam having a bandwidth of less than 1 pm, and a wavelength monitor coupled in a feedback loop with a processor for monitoring a spectral distribution of the laser beam. The processor controls an interferometric spectrum of the interferometric device based on the monitored spectral distribution such that sidebands within the spectral distribution are substantially minimized.
    Type: Grant
    Filed: June 13, 2001
    Date of Patent: April 6, 2004
    Assignee: Lambda Physik AG
    Inventors: Dirk Basting, Sergei Govorkov, Juergen Kleinschmidt, Peter Lokai, Uwe Stamm
  • Patent number: 6650679
    Abstract: A preionization device for a gas laser comprises an internal preionization electrode having a dielectric housing around it and an external preionization electrode displaced from the dielectric housing by a small gap. The dielectric housing includes two cylindrical regions of differing outer radii of curvature. An open end of the housing has a larger radius of curvature than the other end which is closed. The internal electrode connects to circuitry external to the discharge chamber via a conductive feedthrough which penetrates through the housing. The external circuitry prevents voltage oscillations caused by residual energy stored as capacitance in the dielectric housing. The external preionization electrode, which is connected electrically to one of the main discharge electrodes, is formed to shield the internal preionization electrode from the other main discharge electrode to prevent arcing therebetween.
    Type: Grant
    Filed: February 10, 1999
    Date of Patent: November 18, 2003
    Assignee: Lambda Physik AG
    Inventors: Igor Bragin, Ulrich Rebhan, Uwe Stamm, Dirk Basting
  • Patent number: 6618422
    Abstract: A preionization device for a gas laser comprises an internal preionization electrode having a dielectric housing around it and an external preionization electrode displaced from the dielectric housing by a small gap. The dielectric housing includes two cylindrical regions of differing outer radii of curvature. An open end of the housing has a larger radius of curvature than the other end which is closed. The internal electrode connects to circuitry external to the discharge chamber via a conductive feedthrough which penetrates through the housing. The external circuitry prevents voltage oscillations caused by residual energy stored as capacitance in the dielectric housing. The external preionization electrode, which is connected electrically to one of the main discharge electrodes, is formed to shield the internal preionization electrode from the other main discharge electrode to prevent arcing therebetween.
    Type: Grant
    Filed: May 22, 2001
    Date of Patent: September 9, 2003
    Assignee: Lambda Physik AG
    Inventors: Igor Bragin, Ulrich Rebhan, Uwe Stamm, Dirk Basting
  • Patent number: 6614828
    Abstract: A tunable laser is provided having a gain medium and a resonator for generating a laser beam, and an angular dispersion element. The laser further includes a beam expander with adjustable magnification for adjusting an angular dispersion provided by the dispersion element. The adjustable beam expander preferably includes one or two rotatable prisms. When two prisms are used, the prisms are preferably synchronously rotatable according to a preset ratio such that any changes in refraction angle due to the rotation of the first prism are automatically compensated by the rotation of the second prism. A single prism may serve both as a dispersion element and as a beam expansion element. A processor preferably monitors the linewidth and wavelength of the output beam and adjusts an orientation of the prism or prisms of the expansion unit, and the tilt of either a reflection grating or a highly reflective mirror of the resonator in a feedback loop.
    Type: Grant
    Filed: July 31, 2001
    Date of Patent: September 2, 2003
    Assignee: Lambda Physik AG
    Inventors: Dirk Basting, Sergei V. Govorkov
  • Patent number: 6426966
    Abstract: A molecular fluorine (F2) laser is provided wherein the gas mixture comprises molecular fluorine for generating a spectral emission including two or three closely spaced lines around 157 nm. An etalon provides line selection such that the output beam only includes one of these lines. The etalon may also serve to outcouple the beam and/or narrow the selected line. Alternatively, a prism provides the line selection and the etalon narrows the selected line. The etalon may be a resonator reflector which also selects a line, while another element outcouples the beam. The etalon plates comprise a material that is substantially transparent at 157 nm, such as CaF2, MgF2, LiF2, BaF2, LiF, SrF2, quartz and fluorine doped quartz. The etalon plates are separated by spacers comprising a material having a low thermal expansion constant, such as invar, zerodur®, ultra low expansion glass, and quartz.
    Type: Grant
    Filed: September 8, 2000
    Date of Patent: July 30, 2002
    Assignee: Lambda Physik AG
    Inventors: Dirk Basting, Sergei V. Govorkov, Uwe Stamm
  • Patent number: 6393037
    Abstract: A tunable laser is provided having a gain medium and a resonator for generating a laser beam, and an angular dispersion element. The laser further includes a beam expander with adjustable magnification for adjusting an angular dispersion provided by the dispersion element. The adjustable beam expander preferably includes one or two rotatable prisms. When two prisms are used, the prisms are preferably synchronously rotatable according to a preset ratio such that any changes in refraction angle due to the rotation of the first prism are automatically compensated by the rotation of the second prism. A single prism may serve both as a dispersion element and as a beam expansion element. A processor preferably monitors the linewidth and wavelength of the output beam and adjusts an orientation of the prism or prisms of the expansion unit, and the tilt of either a reflection grating or a highly reflective mirror of the resonator in a feedback loop.
    Type: Grant
    Filed: February 3, 1999
    Date of Patent: May 21, 2002
    Assignee: Lambda Physik AG
    Inventors: Dirk Basting, Sergei V. Govorkov
  • Publication number: 20020018505
    Abstract: A F2-laser includes a discharge chamber filled with a gas mixture including molecular fluorine for generating a spectral emission in a wavelength range between 157 nm and 158 nm including a primary line and a secondary line, multiple electrodes coupled with a power supply circuit for producing a pulsed discharge to energize the molecular fluorine, a resonator including the discharge chamber and an interferometric device for generating a laser beam having a bandwidth of less than 1 pm, and a wavelength monitor coupled in a feedback loop with a processor for monitoring a spectral distribution of the laser beam. The processor controls an interferometric spectrum of the interferometric device based on the monitored spectral distribution such that sidebands within the spectral distribution are substantially minimized.
    Type: Application
    Filed: June 13, 2001
    Publication date: February 14, 2002
    Applicant: Lambda Physik AG
    Inventors: Dirk Basting, Sergei Govorkov, Juergen Kleinschmidt, Peter Lokai, Uwe Stamm
  • Publication number: 20020012374
    Abstract: A line-narrowing module for a laser includes a prism beam expander and a grating preferably attached to a heat sink. A pressure-controlled enclosure filled with an inert gas seals the grating and/or other elements of the line-narrowing module. The pressure in the enclosure is adjusted for tuning the wavelength. Preferably, the pressure is controlled by controlling the flow of an inert gas through the enclosure. A pump may be used, or an overpressure flow may be used. Alternatively, a prism of the beam expander or an etalon may be rotatable for tuning the wavelength.
    Type: Application
    Filed: January 25, 2001
    Publication date: January 31, 2002
    Inventors: Dirk Basting, Wolfgang Zchocke, Thomas Schroeder, Juergen Kleinschmidt, Matthias Kramer, Uwe Stamm
  • Publication number: 20010036216
    Abstract: A preionization device for a gas laser comprises an internal preionization electrode having a dielectric housing around it and an external preionization electrode displaced from the dielectric housing by a small gap. The dielectric housing includes two cylindrical regions of differing outer radii of curvature. An open end of the housing has a larger radius of curvature than the other end which is closed. The internal electrode connects to circuitry external to the discharge chamber via a conductive feedthrough which penetrates through the housing. The external circuitry prevents voltage oscillations caused by residual energy stored as capacitance in the dielectric housing. The external preionization electrode, which is connected electrically to one of the main discharge electrodes, is formed to shield the internal preionization electrode from the other main discharge electrode to prevent arcing therebetween.
    Type: Application
    Filed: May 22, 2001
    Publication date: November 1, 2001
    Inventors: Igor Bragin, Ulrich Rebhan, Uwe Stamm, Dirk Basting
  • Patent number: 6154470
    Abstract: A molecular fluorine (F.sub.2) laser is provided wherein the gas mixture comprises molecular fluorine for generating a spectral emission including two or three closely spaced lines around 157 nm. An etalon provides line selection such that the output beam only includes one of these lines. The etalon may also serve to outcouple the beam and/or narrow the selected line. Alternatively, a prism provides the line selection and the etalon narrows the selected line. The etalon may be a resonator reflector which also selects a line, while another element outcouples the beam. The etalon plates, preferably uncoated, comprise a material that is transparent at 157 nm, such as CaF.sub.2, MgF.sub.2, LiF.sub.2, BaF.sub.2, SrF.sub.2, quartz and fluorine doped quartz. The etalon plates are separated by spacers comprising a material having a low thermal expansion constant, such as invar, zerodur.RTM., ultra low expansion glass, and quartz. A gas such as helium or a solid such as CaF.sub.
    Type: Grant
    Filed: May 24, 1999
    Date of Patent: November 28, 2000
    Assignee: Lamba Physik GmbH
    Inventors: Dirk Basting, Sergei V. Govorkov, Uwe Stamm
  • Patent number: 6061382
    Abstract: A laser system, and method of operating the same, that includes a resonant cavity that terminates at one end with a mirror and at the other end with a dispersive wavelength selector, a gain medium disposed in the resonant cavity, and a power supply that excites the gain medium to generate a laser beam that oscillates along an optical axis of the resonant cavity. The dispersive wavelength selector disperses the laser beam at different angles in a critical plane as a function of wavelength so that only a particular range of wavelengths in the beam are aligned to the optical axis and oscillate in the resonant cavity. The critical plane is parallel to the laser beam. The resonant cavity further includes a wavefront curvature compensating lens that is selectively rotatable about an axis of rotation that is perpendicular to the critical plane.
    Type: Grant
    Filed: May 4, 1998
    Date of Patent: May 9, 2000
    Assignee: Lambda Physik GmbH
    Inventors: Sergei V. Govorkov, Dirk Basting
  • Patent number: 6014206
    Abstract: The present invention is an apparatus and method for stabilization of laser output beam characteristics by automatically adjusting the angular and the lateral positions of the output beam. A component of the output beam is detected at a far field location and also at a near field location along an optical path of the component. Both the angular and the lateral positions of the output beam are determined, as well as characteristics of the output beam, after the component is detected at both the near and the far field locations. Both the angular position and the lateral position of the output beam are automatically adjusted to optimize the output beam. The adjustment of both the angular position and the lateral position are made possible by using a beam steering device preferably including two mirrors.
    Type: Grant
    Filed: September 28, 1998
    Date of Patent: January 11, 2000
    Assignee: Lambda Physik GmbH
    Inventors: Dirk Basting, Uwe Stamm, Klaus Mann, Jens Ohlenbusch
  • Patent number: 6005880
    Abstract: An apparatus and method for providing accurate sub-nanosecond timing control between the voltage outputs of branches of an excitation circuit which are driven by a common switch. This invention allows for the introduction of variable timing delays between the branches of the circuit, and eliminates relative timing jitter. Using saturable inductors with variable bias in the high-voltage excitation circuit, this invention provides a continuously tuneable delay on the subnanosecond time scale between two or more excitation circuit branches.
    Type: Grant
    Filed: March 21, 1997
    Date of Patent: December 21, 1999
    Assignee: Lambda Physik GmbH
    Inventors: Dirk Basting, Hubertus Von Bergmann
  • Patent number: 5559816
    Abstract: A narrow-band laser apparatus comprises an optical resonator including first and second reflectors for reflecting radiation, a laser medium for amplifying radiation in said resonator and an etalon for selecting a given wavelength component from said radiation. A polarizing beam splitter is provided for linearly polarizing said radiation and also for acting as an output coupler. In order to obtain very narrow bandwidth radiation of high intensity, a Faraday rotator is provided for rotating the plane of polarization while maintaining the linear polarization thereby allowing a second wavelength selection element (such as a grating) to be efficiently employed to further narrow the output of the laser.
    Type: Grant
    Filed: May 30, 1995
    Date of Patent: September 24, 1996
    Assignee: Lambda Physik Gesellschaft Zur Herstellung Von Lasern mbH
    Inventors: Dirk Basting, Jurgen Kleinschmidt
  • Patent number: 5430752
    Abstract: An apparatus for purifying laser gas, in particular for excimer and F.sub.2 lasers, employs liquid nitrogen (12) for freezing impurities out of the laser gas, the freeze-out temperature being set by means of the pressure above the surface (14) of the liqid nitrogen (12).
    Type: Grant
    Filed: June 9, 1994
    Date of Patent: July 4, 1995
    Assignee: Lambda Physik Gesellschaft zur Herstellung von Lasern MbH
    Inventors: Dirk Basting, Gerd Steinfuhrer, Frank Voss
  • Patent number: 5220574
    Abstract: An excimer laser having a chamber (10) in which a gas-discharge is performed with participation of hydrogen-chloride comprises means with which the hydrogen chloride is formed by hydrolysis.
    Type: Grant
    Filed: November 19, 1991
    Date of Patent: June 15, 1993
    Assignee: Lambda Physik Gesellschaft zur Herstellung von Lasern mbH
    Inventors: Frank Voss, Dirk Basting, A. Meller
  • Patent number: 5136605
    Abstract: An apparatus for purifying laser gas, in particular for excimer and F.sub.2 lasers, employs liquid nitrogen (12) for freezing impurities out of the laser gas, the freeze-out temperature being set by means of the pressure above the surface (14) of the liquid nitrogen (12).
    Type: Grant
    Filed: March 15, 1991
    Date of Patent: August 4, 1992
    Assignee: Lambda Physik Gesellschaft zur Herstellung von Lasern mbH
    Inventors: Dirk Basting, Gerd Steinfuhrer, Frank Voss