Abstract: A catadioptric lens includes at least two optical elements arranged along an optical axis. Both optical elements are configured as a mirror having a substrate and a highly reflective coating applied to an interface of the substrate. The highly reflective coating extends from the interface of the substrate along a surface normal. At least one of the highly reflective coatings has one or a plurality of layers. The optical total layer thickness of the one layer of the plurality of layers increases radially from the inner area outward.

Abstract: A catadioptric lens includes at least two optical elements arranged along an optical axis. Both optical elements are configured as a mirror having a substrate and a highly reflective coating applied to an interface of the substrate. The highly reflective coating extends from the interface of the substrate along a surface normal. At least one of the highly reflective coatings has one or a plurality of layers. The optical total layer thickness of the one layer of the plurality of layers increases radially from the inner area outward.

Abstract: An illumination apparatus includes a first solid-state-based illumination module, a second solid-state-based illumination module, and a superposition unit, which couples first and the second luminescence radiation into an illumination beam path, in which said radiation is guided up to the end of the illumination beam path in order to illuminate a light modulator. A filter unit which filters light with a second color from the first luminescence radiation with a first color and from the second luminescence radiation such that light with the first and second color is present at the end of the illumination beam path.

Abstract: An optical system (10) for use in an underwater environment is proposed, wherein the optical system (10) comprises a housing which delimits an interior (60) of the optical system (10) with respect to the surroundings (50) in water-tight fashion, and a lens (20) with an outer surface (24), wherein the housing comprises a mount (40), wherein the lens (20) is received in the mount (40) in such a way that the outer surface (24) of the lens (20) is in fluid contact with water of the underwater environment when the optical system (10) is situated in the underwater environment, wherein the outer surface (24) of the lens (20) has an arched form, in particular a convex form, preferably a spherical convex form, wherein the lens (20) has a first arched contact face (28), in particular a spherical contact face, and the mount (40) has a second contact face (48), wherein the lens (20) is arranged in the mount (40) in such a way that the first contact face (28) presses against the second contact face (48) when the pressure

Abstract: An illumination apparatus for a projector that includes a light modulator is provided. The illumination apparatus includes a first illumination module emitting first radiation, a second illumination module emitting second radiation, a light mixing rod extending in the axial direction and a superposition unit, which superposes the first and second radiation and couples this into the light mixing rod. The superposition unit includes a first imaging optical unit which focuses the first radiation into the light mixing rod such that a first focus is present, and a second imaging optical unit which focuses the second radiation into the light mixing rod such that a second focus is present. The first focus is spaced apart from the second focus in the axial direction.

Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.

Abstract: The invention relates to an apparatus and a method for determining a defocussing value (?z, ?z1, ?z2) for at least one image feature in an image, wherein at least one monochromatic image of an object is generated, wherein the defocussing value (?z, ?z1, ?z2) is determined on the basis of the image and depending on the wavelength (?) of the monochromatic image, and a method and apparatus for image-based determination of a dimensional size.

Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.

Abstract: An illumination apparatus includes a first solid-state-based illumination module, a second solid-state-based illumination module, and a superposition unit, which couples first and the second luminescence radiation into an illumination beam path, in which said radiation is guided up to the end of the illumination beam path in order to illuminate a light modulator. A filter unit which filters light with a second color from the first luminescence radiation with a first color and from the second luminescence radiation such that light with the first and second color is present at the end of the illumination beam path.

Abstract: An illumination apparatus for a projector that includes a light modulator is provided. The illumination apparatus includes a first illumination module emitting first radiation, a second illumination module emitting second radiation, a light mixing rod extending in the axial direction and a superposition unit, which superposes the first and second radiation and couples this into the light mixing rod. The superposition unit includes a first imaging optical unit which focuses the first radiation into the light mixing rod such that a first focus is present, and a second imaging optical unit which focuses the second radiation into the light mixing rod such that a second focus is present. The first focus is spaced apart from the second focus in the axial direction.

Abstract: An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

Abstract: A catadioptric lens includes at least two optical elements arranged along an optical axis. Both optical elements are configured as a mirror having a substrate and a highly reflective coating applied to an interface of the substrate. The highly reflective coating extends from the interface of the substrate along a surface normal. At least one of the highly reflective coatings has one or a plurality of layers. The optical total layer thickness of the one layer of the plurality of layers increases radially from the inner area outward.

Abstract: An ophthalmic instrument for the application of laser radiation in a patient's eye, particularly for the examination and/or surgical laser treatment of the cornea and the lens of the eye, includes a femtosecond laser, an objective and optical assemblies. The optical assemblies are arranged in front of the objective, and selectively vary the focus position in the coordinate direction X, Y and Z either within the region of the cornea or within the region of the lens of the eye. The objective or at least one lens group is movable relative to the eye. The variation of the position of the lens group objective shifts the focus position from the cornea to the lens of the eye and vice versa.

Abstract: An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

Abstract: An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

Abstract: An ophthalmic instrument for the application of laser radiation in a patient's eye, particularly for the examination and/or surgical laser treatment of the cornea and the lens of the eye, includes a femtosecond laser, an objective and optical assemblies. The optical assemblies are arranged in front of the objective, and selectively vary the focus position in the coordinate direction X, Y and Z either within the region of the cornea or within the region of the lens of the eye. The objective or at least one lens group is movable relative to the eye. The variation of the position of the lens group objective shifts the focus position from the cornea to the lens of the eye and vice versa.

Abstract: An ophthalmic instrument for the application of laser radiation in a patient's eye, particularly for the examination and/or surgical laser treatment of the cornea and the lens of the eye, includes a femtosecond laser, an objective and optical assemblies. The optical assemblies are arranged in front of the objective, and selectively vary the focus position in the coordinate direction X,Y and Z either within the region of the cornea or within the region of the lens of the eye. The objective or at least one lens group is movable relative to the eye. The variation of the position of the lens group objective shifts the focus position from the cornea to the lens of the eye and vice versa.

Abstract: An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

Abstract: An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.