Patents by Inventor Dirk Heithecker

Dirk Heithecker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060127565
    Abstract: A method for microstructuring by means of locally selective sublimation is disclosed, whereby patterns or images of organic electroluminescent components are produced by application of low molecular weight emission material, provided on a support, to those points of substrate corresponding to the pattern or image for production, by means of sublimation. According to the invention, the method is carried out by firstly completely coating a film support made from temperature-resistant material with the emission material. The coated support and the substrate are then placed adjacent and parallel to each other in a vacuum chamber. The side of the support coated with the emission material faces the substrate. The support is subsequently locally heated for a short period of time on the non-coated side thereof in those positions corresponding to the pattern or image for generation, to a temperature adequate for the sublimation of the emission material.
    Type: Application
    Filed: October 1, 2003
    Publication date: June 15, 2006
    Applicant: NOKIA CORPORATION
    Inventors: Eike Becker, Dirk Heithecker, Dirk Metzdorf, Hermann Johannes, Thomas Dobbertin, Daniel Schneider, Wolfgang Kowalsky