Patents by Inventor Dirk-Jan KERNKAMP

Dirk-Jan KERNKAMP has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of modelling systems for performing predictive maintenance of systems, such as lithographic systems
    Patent number: 12204298
    Abstract: A method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method includes obtaining a function including at least a first function of first prediction model parameters associated with the at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.
    Type: Grant
    Filed: February 4, 2021
    Date of Patent: January 21, 2025
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Carlo Lancia, Anjan Prasad Gantapara, Dirk-Jan Kernkamp, Seyed Iman Mossavat, Alexander Ypma
  • METHODS OF MODELLING SYSTEMS FOR PERFORMING PREDICTIVE MAINTENANCE OF SYSTEMS, SUCH AS LITHOGRAPHIC SYSTEMS
    Publication number: 20230138469
    Abstract: A method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method includes obtaining a function including at least a first function of first prediction model parameters associated with the at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.
    Type: Application
    Filed: February 4, 2021
    Publication date: May 4, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Carlo LANCIA, Anjan Prasad Gantapara, Dirk-Jan KERNKAMP, Seyed Iman MOSSAVAT, Alexander YPMA