Abstract: A process for the determination and correction of laser induced damages of the optical and electronic components within the beam path of a monitor module of a 193 nm excimer lasers is provided herein. Especially state of the art detectors like CCD cameras degrade under UV radiation. With a special correction of the sensitivity of each camera pixel this problem can be solved.

Abstract: A process for the determination and correction of laser induced damages of the optical and electronic components within the beam path of a monitor module of a 193 nm excimer lasers is provided herein. Especially state of the art detectors like CCD cameras degrade under UV radiation. With a special correction of the sensitivity of each camera pixel this problem can be solved.

Abstract: A sub-310 nm lithography radiation source includes first and second beam generating modules for generating first and second pulsed beams, a beam combiner optic for producing a single combined beam from the first and second pulsed beams, and optics for directing each of the first and second pulsed beams to be incident upon the beam combiner.

Abstract: An apparatus and method for testing the quality of a line narrowing and/or selection module that has been particularly assembled for use with a line-narrowed excimer or molecular fluorine laser is described. The method includes providing a test beam which has been previously line-narrowed using an installed line-narrowing and/or selection module. Then, the test beam is directed into the test module. Next, the one or more properties of the retroreflected beam are measured, i.e., after the beam has traversed the test module. The quality of the test module and one or more of its components may be determined based on the measurements. Such properties as wavefront distortions, excessive scattering, total reflectivity, total dispersion and aging of components of the test module may be measured for making this quality determination.