Patents by Inventor Dirk Leinenbach

Dirk Leinenbach has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and device for producing exposed structures
    Patent number: 8027018
    Abstract: In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carr
    Type: Grant
    Filed: March 2, 2005
    Date of Patent: September 27, 2011
    Assignee: KLEO Halbleitertechnik GmbH & Co KG
    Inventors: Hans Opower, Stefan Scharl, Dirk Leinenbach
  • Method and device for producing exposed structures
    Publication number: 20050282087
    Abstract: In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carr
    Type: Application
    Filed: March 2, 2005
    Publication date: December 22, 2005
    Applicant: KLEO Halbleitertechnik GmbH & Co KG
    Inventors: Hans Opower, Stefan Scharl, Dirk Leinenbach