Abstract: A method for imaging a mask layer includes reading imaging data for a sequence of at least (C1+C2) pixels, at a first moment, using a group of C1 first imaging beams for imaging substantially simultaneously a first group of C1 pixels of said sequence in accordance with the imaging data, at a second moment, using a group of C2 second imaging beams for imaging substantially simultaneously a second group of C2 pixels of said sequence in accordance with the imaging data, repeating the reading of imaging data, the using of a group of C1 first imaging beams for imaging at a first moment, and the using of a group of C2 second imaging beams for imaging at a second moment for a next sequence of at least (C1+C2) pixels.

Abstract: Apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.

Abstract: A method for writing an imageable material using multiple beams includes preparing subsequent patterns each having Y rows of N pixel locations, said subsequent patterns including first and second patterns; where the first and the second pattern overlap with each other in an overlap area consisting of O columns and Y rows of pixel locations; selecting for each row i of said first pattern Mi1 pixel locations; selecting for each row i of said second pattern Mi2 pixel locations; writing simultaneously, for each row i, said Mi1 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; and moving said N beams relative to said imageable material in a slow scan direction over (N-O) pixel locations; writing simultaneously, for each row i, said Mi2 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material.

Abstract: An exposure unit for exposing a relief plate precursor includes a support structure with a support surface configured for supporting a relief plate precursor, and a plurality of UV light sources arranged next to each other and configured to emit UV light to a side of the relief plate precursor. The plurality of UV light sources cover a light source area parallel to the support surface. A light adjustment structure is configured to block and/or reflect a portion of the light emitted by the plurality of UV light sources so as to render a light intensity measured in the support surface more uniform as compared to a situation without the light adjustment structure. The light adjustment structure is arranged at least partially between the light source area and the support surface.

Abstract: A method of preparing image job data for imaging a mask layer includes receiving at least one raster image file, preparing image job data for imaging the mask layer, the preparing comprising: including data relative to the at least one raster image file in the image job data so as to image at least one corresponding image area of the mask layer; determining a non-functional area of the mask layer outside of the at least one corresponding image area; and including filling imaging data in said image job data for imaging said non-functional area.

Abstract: A method for processing a raster image file includes: receiving a raster image file comprising image data for a plurality of pixels, analyzing the image data of the raster image file, determining control data, and optionally at least one new raster image file, based on the analyzed image data, said control data being data for controlling settings of an imaging device so as to change the physical properties of generated imaged features corresponding with one or more of the plurality of pixels, and outputting the raster image file and/or the new raster image file, with the control data to an imaging device for imaging a relief precursor.

Abstract: A method to determine an exposure time and/or intensity to be used for obtaining a desired feature of a relief structure, in particular a desired floor thickness, includes exposing a first side of a relief precursor with electromagnetic radiation, where the exposure is done in an area having a first position A and a second position B and is performed such that for a plurality of points between said first and second positions A, B the values for the exposure time and the exposure intensity are known, wherein the exposure time and/or the exposure intensity are automatically controlled to be varied at said plurality of points; determining one or more points of said plurality of points representative for the desired feature; and determining the required exposure time and/or exposure intensity for the desired feature based on the determined one or more points and the known values.

Abstract: A method for processing a raster image file, said method comprising the steps: receiving of a raster image file comprising image data for a plurality of pixels, analyzing the image data of the raster image file, determining control data, and optionally at least one new raster image file, based on the analyzed image data, said control data being data for controlling settings of an imaging device so as to change the physical properties of generated imaged features corresponding with one or more of the plurality of pixels; outputting the raster image file and/or the new raster image file, with the control data to an imaging device for imaging a relief precursor.

Abstract: Apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.

Abstract: A method for fixing and treating a flexible plate on a drum includes: providing a flexible plate comprising a support layer made of a first material and at least one additional layer made of a second material which is different from the first material, wherein one or more thin film side wings are connected to one or more sides of the flexible plate. The one or more thin film side wings have a thickness which is at least 5 times smaller than the thickness of the flexible plate. The method further includes positioning the flexible plate on the drum such that the lower face of each thin film side wing of the flexible plate covers at least one vacuum suction opening, and performing a treatment on at least one layer of the flexible plate while rotating the drum.

Abstract: A method for writing an imageable material using multiple beams includes preparing subsequent patterns each having Y rows of N pixel locations, said subsequent patterns including first and second patterns; where the first and the second pattern overlap with each other in an overlap area consisting of O columns and Y rows of pixel locations; selecting for each row i of said first pattern Mi1 pixel locations; selecting for each row i of said second pattern Mi2 pixel locations; writing simultaneously, for each row i, said Mi1 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; and moving said N beams relative to said imageable material in a slow scan direction over (N-O) pixel locations; writing simultaneously, for each row i, said Mi2 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material.

Abstract: A method for applying a pattern on a mask layer includes obtaining an image file representing pixels with a first pixel size in a first direction parallel to an edge of the pixel, and a second pixel size in a second direction perpendicular to the first direction, where the first and second pixel size are the same or different, treating the mask layer such that a plurality of areas with altered physical properties are created in the mask layer, the plurality of areas corresponding to a plurality of pixels of the image file, where the treatment is done such that a first and/or a second area size of an area of said plurality of areas, seen in said first and/or said second direction, is smaller than the first and/or second pixel size, respectively.

Abstract: A method for writing an imageable material using multiple beams includes preparing subsequent patterns each having Y rows of N pixel locations, said subsequent patterns including first and second patterns; where the first and the second pattern overlap with each other in an overlap area consisting of O columns and Y rows of pixel locations; selecting for each row i of said first pattern Mi1 pixel locations; selecting for each row i of said second pattern Mi2 pixel locations; writing simultaneously, for each row i, said Mi1 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; and moving said N beams relative to said imageable material in a slow scan direction over (N?O) pixel locations; writing simultaneously, for each row i, said Mi2 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material.

Abstract: A method for fixing and treating a flexible plate on a drum includes: providing a flexible plate comprising a support layer made of a first material and at least one additional layer made of a second material which is different from the first material, wherein one or more thin film side wings are connected to one or more sides of the flexible plate. The one or more thin film side wings have a thickness which is at least 5 times smaller than the thickness of the flexible plate. The method further includes positioning the flexible plate on the drum such that the lower face of each thin film side wing of the flexible plate covers at least one vacuum suction opening, and performing a treatment on at least one layer of the flexible plate while rotating the drum.

Abstract: A method for writing an imageable material using multiple beams includes preparing subsequent patterns each having Y rows of N pixel locations, said subsequent patterns including first and second patterns; where the first and the second pattern overlap with each other in an overlap area consisting of O columns and Y rows of pixel locations; selecting for each row i of said first pattern Mi1 pixel locations; selecting for each row i of said second pattern Mi2 pixel locations; writing simultaneously, for each row i, said Mi1 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; and moving said N beams relative to said imageable material in a slow scan direction over (N?O) pixel locations; writing simultaneously, for each row i, said Mi2 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material.