Patents by Inventor Dirk Rothweiler

Dirk Rothweiler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7329886
    Abstract: There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength ?193 nm, and an optical element. The first light source illuminates a first area of the optical element and the second light source illuminates a second area of the optical element.
    Type: Grant
    Filed: January 12, 2004
    Date of Patent: February 12, 2008
    Assignee: Carl Zeiss SMT AG
    Inventors: Wolfgang Singer, Martin Antoni, Nils Dieckmann, Dirk Rothweiler, Jörg Schultz
  • Patent number: 7071476
    Abstract: There is provided an illumination system for EUV-wavelengths. The illumination system includes a plurality of EUV-light sources and an optical unit combining the plurality of EUV-light sources.
    Type: Grant
    Filed: May 5, 2003
    Date of Patent: July 4, 2006
    Assignee: Carl Zeiss SMT AG
    Inventors: Dirk Rothweiler, Jörg Schultz
  • Publication number: 20040256575
    Abstract: There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength≦193 nm, and an optical element. The first light source illuminates a first area of the optical element and the second light source illuminates a second area of the optical element.
    Type: Application
    Filed: January 12, 2004
    Publication date: December 23, 2004
    Applicant: Carl Zeiss SMT AG
    Inventors: Wolfgang Singer, Martin Antoni, Nils Dieckmann, Dirk Rothweiler, Jorg Schultz
  • Publication number: 20040036037
    Abstract: There is provided an illumination system for EUV-wavelengths. The illumination system includes a plurality of EUV-light sources and an optical unit combining the plurality of EUV-light sources.
    Type: Application
    Filed: May 5, 2003
    Publication date: February 26, 2004
    Applicant: Carl Zeiss SMT AG,
    Inventors: Dirk Rothweiler, Jorg Schultz
  • Patent number: 6570168
    Abstract: The invention concerns an illumination system for wavelengths<193 nm, especially for EUV-lithography with a plurality of light sources a mirror device for creating secondary light sources comprising several mirrors, said mirrors are comprising raster elements. The invention is characterized in that the plurality of light sources are coupled together in order to illuminate the exit pupil of the illumination system up to a predetermined degree of filling.
    Type: Grant
    Filed: July 27, 2000
    Date of Patent: May 27, 2003
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Jörg Schultz, Dirk Rothweiler