Patents by Inventor Dirk Woll
Dirk Woll has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10488348Abstract: Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to direct pulses of light to an area on a wafer; a scanning subsystem configured to scan the pulses of light across the wafer; a collection subsystem configured to image pulses of light scattered from the area on the wafer to a sensor, wherein the sensor is configured to integrate a number of the pulses of scattered light that is fewer than a number of the pulses of scattered light that can be imaged on the entire area of the sensor, and wherein the sensor is configured to generate output responsive to the integrated pulses of scattered light; and a computer subsystem configured to detect defects on the wafer using the output generated by the sensor.Type: GrantFiled: January 29, 2018Date of Patent: November 26, 2019Assignee: KLA-Tencor Corp.Inventors: Anatoly Romanovsky, Ivan Maleev, Daniel Kavaldjiev, Yury Yuditsky, Dirk Woll, Stephen Biellak, Mehdi Vaez-Iravani, Guoheng Zhao
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Patent number: 10153215Abstract: A cartridge in an oven enclosure includes a pre-heating feature for an incoming purge gas before the purge gas enters the space around an optical component, such as a nonlinear optical crystal, in an oven cell. The incoming purge gas can be pre-heated as it travels along a gas pathway around a cartridge. The cartridge can include a heater. The oven enclosure can have two windows positioned such that a laser beam can enter through one of the windows, pass through the optical component, and exit through another of the windows. A second harmonic beam can be generated with the optical component.Type: GrantFiled: November 22, 2016Date of Patent: December 11, 2018Assignee: KLA-Tencor CorporationInventor: Dirk Woll
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Patent number: 10120262Abstract: A system includes a nonlinear crystal positioned such that a focus of a laser beam is outside the nonlinear crystal in at least one plane perpendicular to a beam propagation direction of the laser beam. The nonlinear crystal is disposed in a crystal mount assembly. A laser beam may be directed at the nonlinear crystal for wavelength conversion. The system may be used as a deep-UV wavelength converter.Type: GrantFiled: November 10, 2017Date of Patent: November 6, 2018Assignee: KLA-Tencor CorporationInventor: Dirk Woll
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Publication number: 20180164228Abstract: Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to direct pulses of light to an area on a wafer; a scanning subsystem configured to scan the pulses of light across the wafer; a collection subsystem configured to image pulses of light scattered from the area on the wafer to a sensor, wherein the sensor is configured to integrate a number of the pulses of scattered light that is fewer than a number of the pulses of scattered light that can be imaged on the entire area of the sensor, and wherein the sensor is configured to generate output responsive to the integrated pulses of scattered light; and a computer subsystem configured to detect defects on the wafer using the output generated by the sensor.Type: ApplicationFiled: January 29, 2018Publication date: June 14, 2018Inventors: Anatoly Romanovsky, Ivan Maleev, Daniel Kavaldjiev, Yury Yuditsky, Dirk Woll, Stephen Biellak, Mehdi Vaez-Iravani, Guoheng Zhao
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Patent number: 9915622Abstract: Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to direct pulses of light to an area on a wafer; a scanning subsystem configured to scan the pulses of light across the wafer; a collection subsystem configured to image pulses of light scattered from the area on the wafer to a sensor, wherein the sensor is configured to integrate a number of the pulses of scattered light that is fewer than a number of the pulses of scattered light that can be imaged on the entire area of the sensor, and wherein the sensor is configured to generate output responsive to the integrated pulses of scattered light; and a computer subsystem configured to detect defects on the wafer using the output generated by the sensor.Type: GrantFiled: August 27, 2015Date of Patent: March 13, 2018Assignee: KLA-Tencor Corp.Inventors: Anatoly Romanovsky, Ivan Maleev, Daniel Kavaldjiev, Yury Yuditsky, Dirk Woll, Stephen Biellak, Mehdi Vaez-Iravani, Guoheng Zhao
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Publication number: 20180067377Abstract: A system includes a nonlinear crystal positioned such that a focus of a laser beam is outside the nonlinear crystal in at least one plane perpendicular to a beam propagation direction of the laser beam. The nonlinear crystal is disposed in a crystal mount assembly. A laser beam may be directed at the nonlinear crystal for wavelength conversion. The system may be used as a deep-UV wavelength converter.Type: ApplicationFiled: November 10, 2017Publication date: March 8, 2018Inventor: Dirk Woll
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Publication number: 20180040518Abstract: A cartridge in an oven enclosure includes a pre-heating feature for an incoming purge gas before the purge gas enters the space around an optical component, such as a nonlinear optical crystal, in an oven cell. The incoming purge gas can be pre-heated as it travels along a gas pathway around a cartridge. The cartridge can include a heater. The oven enclosure can have two windows positioned such that a laser beam can enter through one of the windows, pass through the optical component, and exit through another of the windows. A second harmonic beam can be generated with the optical component.Type: ApplicationFiled: November 22, 2016Publication date: February 8, 2018Inventor: Dirk Woll
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Patent number: 9841655Abstract: A system includes a nonlinear crystal positioned such that a focus of a laser beam is outside the nonlinear crystal in at least one plane perpendicular to a beam propagation direction of the laser beam. The nonlinear crystal is disposed in a crystal mount assembly. A laser beam may be directed at the nonlinear crystal for wavelength conversion. The system may be used as a deep-UV wavelength converter.Type: GrantFiled: June 29, 2016Date of Patent: December 12, 2017Assignee: KLA-Tencor CorporationInventor: Dirk Woll
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Patent number: 9678350Abstract: A method and system for providing illumination is disclosed. The method may include providing a laser having a predetermined wavelength; performing at least one of: beam splitting or beam scanning prior to a frequency conversion; converting a frequency of each output beam of the at least one of: beam splitting or beam scanning; and providing the frequency converted output beam for illumination.Type: GrantFiled: March 18, 2013Date of Patent: June 13, 2017Assignee: KLA-Tencor CorporationInventors: Christian Wolters, Jijen Vazhaeparambil, Dirk Woll, Anatoly Romanovsky, Bret Whiteside, Stephen Biellak, Guoheng Zhao
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Publication number: 20170003572Abstract: A system includes a nonlinear crystal positioned such that a focus of a laser beam is outside the nonlinear crystal in at least one plane perpendicular to a beam propagation direction of the laser beam. The nonlinear crystal is disposed in a crystal mount assembly. A laser beam may be directed at the nonlinear crystal for wavelength conversion. The system may be used as a deep-UV wavelength converter.Type: ApplicationFiled: June 29, 2016Publication date: January 5, 2017Inventor: Dirk Woll
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Patent number: 9279774Abstract: Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to simultaneously form multiple illumination areas on the wafer with substantially no illumination flux between each of the areas. The system also includes a scanning subsystem configured to scan the multiple illumination areas across the wafer. In addition, the system includes a collection subsystem configured to simultaneously and separately image light scattered from each of the areas onto two or more sensors. Characteristics of the two or more sensors are selected such that the scattered light is not imaged into gaps between the two or more sensors. The two or more sensors generate output responsive to the scattered light. The system further includes a computer subsystem configured to detect defects on the wafer using the output of the two or more sensors.Type: GrantFiled: July 9, 2012Date of Patent: March 8, 2016Assignee: KLA-Tencor Corp.Inventors: Anatoly Romanovsky, Ivan Maleev, Daniel Kavaldjiev, Yury Yuditsky, Dirk Woll, Stephen Biellak, Mehdi Vaez-Iravani, Guoheng Zhao
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Publication number: 20150369753Abstract: Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to direct pulses of light to an area on a wafer; a scanning subsystem configured to scan the pulses of light across the wafer; a collection subsystem configured to image pulses of light scattered from the area on the wafer to a sensor, wherein the sensor is configured to integrate a number of the pulses of scattered light that is fewer than a number of the pulses of scattered light that can be imaged on the entire area of the sensor, and wherein the sensor is configured to generate output responsive to the integrated pulses of scattered light; and a computer subsystem configured to detect defects on the wafer using the output generated by the sensor.Type: ApplicationFiled: August 27, 2015Publication date: December 24, 2015Inventors: Anatoly Romanovsky, Ivan Maleev, Daniel Kavaldjiev, Yury Yuditsky, Dirk Woll, Stephen Biellak, Mehdi Vaez-Iravani, Guoheng Zhao
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Publication number: 20130250385Abstract: A method and system for providing illumination is disclosed. The method may include providing a laser having a predetermined wavelength; performing at least one of: beam splitting or beam scanning prior to a frequency conversion; converting a frequency of each output beam of the at least one of: beam splitting or beam scanning; and providing the frequency converted output beam for illumination.Type: ApplicationFiled: March 18, 2013Publication date: September 26, 2013Applicant: KLA-TENCOR CORPORATIONInventors: Christian Wolters, Jijen Vazhaeparambil, Dirk Woll, Anatoly Romanovsky, Bret Whiteside, Stephen Biellak, Guoheng Zhao
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Publication number: 20130016346Abstract: Systems configured to inspect a wafer are provided.Type: ApplicationFiled: July 9, 2012Publication date: January 17, 2013Applicant: KLA-TENCOR CORPORATIONInventors: Anatoly Romanovsky, Ivan Maleev, Daniel Kavaldjiev, Yury Yuditsky, Dirk Woll, Stephen Biellak