Patents by Inventor Divya SIVASANKARAN

Divya SIVASANKARAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Graph alignment techniques for dimensioning drawings automatically
    Patent number: 11954820
    Abstract: One embodiment of the present invention sets forth a technique for adding dimensions to a target drawing. The technique includes generating a first set of node embeddings for a first set of nodes included in a target graph that represents the target drawing. The technique also includes receiving a second set of node embeddings for a second set of nodes included in a source graph that represents a source drawing, where one or more nodes included in the second set of nodes are associated with one or more source dimensions included in the source drawing. The technique further includes generating a set of mappings between the first and second sets of nodes based similarities between the first set of node embeddings and the second set of node embeddings, and automatically placing the one or more source dimensions within the target drawing based on the set of mappings.
    Type: Grant
    Filed: July 13, 2021
    Date of Patent: April 9, 2024
    Assignee: AUTODESK, INC.
    Inventors: Thomas Ryan Davies, Alexander Ray Carlson, Aditya Sanghi, Tarkeshwar Kumar Shah, Divya Sivasankaran, Anup Bhalchandra Walvekar, Ran Zhang
  • GRAPH ALIGNMENT TECHNIQUES FOR DIMENSIONING DRAWINGS AUTOMATICALLY
    Publication number: 20220318947
    Abstract: One embodiment of the present invention sets forth a technique for adding dimensions to a target drawing. The technique includes generating a first set of node embeddings for a first set of nodes included in a target graph that represents the target drawing. The technique also includes receiving a second set of node embeddings for a second set of nodes included in a source graph that represents a source drawing, where one or more nodes included in the second set of nodes are associated with one or more source dimensions included in the source drawing. The technique further includes generating a set of mappings between the first and second sets of nodes based similarities between the first set of node embeddings and the second set of node embeddings, and automatically placing the one or more source dimensions within the target drawing based on the set of mappings.
    Type: Application
    Filed: July 13, 2021
    Publication date: October 6, 2022
    Inventors: Thomas Ryan DAVIES, Alexander Ray CARLSON, Aditya SANGHI, Tarkeshwar Kumar SHAH, Divya SIVASANKARAN, Anup Bhalchandra WALVEKAR, Ran ZHANG